A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains

Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, s...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Chenying Gao [verfasserIn] Dandan Shi [verfasserIn] Cheng Li [verfasserIn] Xiaobo Yu [verfasserIn] Xisha Zhang [verfasserIn] Zitong Liu [verfasserIn] Guanxin Zhang [verfasserIn] Deqing Zhang [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2022

Schlagwörter:	conjugated polymers cross‐linking organic field‐effect transistors photo‐patterning semiconducting photoresists

Übergeordnetes Werk:	In: Advanced Science - Wiley, 2015, 9(2022), 15, Seite n/a-n/a
Übergeordnetes Werk:	volume:9 ; year:2022 ; number:15 ; pages:n/a-n/a

Links:	Link aufrufen Link aufrufen Link aufrufen Journal toc

DOI / URN:	10.1002/advs.202106087

Katalog-ID:	DOAJ029589614

Internformat


LEADER	01000caa a22002652 4500
001	DOAJ029589614
003	DE-627
005	20230307135823.0
007	cr uuu---uuuuu
008	230226s2022 xx \|\|\|\|\|o 00\| \|\|eng c
024	7		\|a 10.1002/advs.202106087 \|2 doi
035			\|a (DE-627)DOAJ029589614
035			\|a (DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837
040			\|a DE-627 \|b ger \|c DE-627 \|e rakwb
041			\|a eng
100	0		\|a Chenying Gao \|e verfasserin \|4 aut
245	1	2	\|a A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains
264		1	\|c 2022
336			\|a Text \|b txt \|2 rdacontent
337			\|a Computermedien \|b c \|2 rdamedia
338			\|a Online-Ressource \|b cr \|2 rdacarrier
520			\|a Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography.
650		4	\|a conjugated polymers
650		4	\|a cross‐linking
650		4	\|a organic field‐effect transistors
650		4	\|a photo‐patterning
650		4	\|a semiconducting photoresists
653		0	\|a Science
653		0	\|a Q
700	0		\|a Dandan Shi \|e verfasserin \|4 aut
700	0		\|a Cheng Li \|e verfasserin \|4 aut
700	0		\|a Xiaobo Yu \|e verfasserin \|4 aut
700	0		\|a Xisha Zhang \|e verfasserin \|4 aut
700	0		\|a Zitong Liu \|e verfasserin \|4 aut
700	0		\|a Guanxin Zhang \|e verfasserin \|4 aut
700	0		\|a Deqing Zhang \|e verfasserin \|4 aut
773	0	8	\|i In \|t Advanced Science \|d Wiley, 2015 \|g 9(2022), 15, Seite n/a-n/a \|w (DE-627)817357777 \|w (DE-600)2808093-2 \|x 21983844 \|7 nnns
773	1	8	\|g volume:9 \|g year:2022 \|g number:15 \|g pages:n/a-n/a
856	4	0	\|u https://doi.org/10.1002/advs.202106087 \|z kostenfrei
856	4	0	\|u https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837 \|z kostenfrei
856	4	0	\|u https://doi.org/10.1002/advs.202106087 \|z kostenfrei
856	4	2	\|u https://doaj.org/toc/2198-3844 \|y Journal toc \|z kostenfrei
912			\|a GBV_USEFLAG_A
912			\|a SYSFLAG_A
912			\|a GBV_DOAJ
912			\|a GBV_ILN_11
912			\|a GBV_ILN_20
912			\|a GBV_ILN_22
912			\|a GBV_ILN_23
912			\|a GBV_ILN_24
912			\|a GBV_ILN_31
912			\|a GBV_ILN_39
912			\|a GBV_ILN_40
912			\|a GBV_ILN_60
912			\|a GBV_ILN_62
912			\|a GBV_ILN_63
912			\|a GBV_ILN_65
912			\|a GBV_ILN_69
912			\|a GBV_ILN_70
912			\|a GBV_ILN_73
912			\|a GBV_ILN_95
912			\|a GBV_ILN_105
912			\|a GBV_ILN_110
912			\|a GBV_ILN_151
912			\|a GBV_ILN_161
912			\|a GBV_ILN_170
912			\|a GBV_ILN_171
912			\|a GBV_ILN_213
912			\|a GBV_ILN_224
912			\|a GBV_ILN_230
912			\|a GBV_ILN_285
912			\|a GBV_ILN_293
912			\|a GBV_ILN_370
912			\|a GBV_ILN_602
912			\|a GBV_ILN_636
912			\|a GBV_ILN_2004
912			\|a GBV_ILN_2005
912			\|a GBV_ILN_2006
912			\|a GBV_ILN_2007
912			\|a GBV_ILN_2009
912			\|a GBV_ILN_2010
912			\|a GBV_ILN_2011
912			\|a GBV_ILN_2014
912			\|a GBV_ILN_2026
912			\|a GBV_ILN_2027
912			\|a GBV_ILN_2034
912			\|a GBV_ILN_2037
912			\|a GBV_ILN_2038
912			\|a GBV_ILN_2044
912			\|a GBV_ILN_2048
912			\|a GBV_ILN_2049
912			\|a GBV_ILN_2050
912			\|a GBV_ILN_2055
912			\|a GBV_ILN_2056
912			\|a GBV_ILN_2057
912			\|a GBV_ILN_2059
912			\|a GBV_ILN_2061
912			\|a GBV_ILN_2068
912			\|a GBV_ILN_2088
912			\|a GBV_ILN_2106
912			\|a GBV_ILN_2108
912			\|a GBV_ILN_2110
912			\|a GBV_ILN_2111
912			\|a GBV_ILN_2118
912			\|a GBV_ILN_2122
912			\|a GBV_ILN_2143
912			\|a GBV_ILN_2144
912			\|a GBV_ILN_2147
912			\|a GBV_ILN_2148
912			\|a GBV_ILN_2152
912			\|a GBV_ILN_2153
912			\|a GBV_ILN_2232
912			\|a GBV_ILN_2336
912			\|a GBV_ILN_2470
912			\|a GBV_ILN_2507
912			\|a GBV_ILN_2522
912			\|a GBV_ILN_4012
912			\|a GBV_ILN_4035
912			\|a GBV_ILN_4037
912			\|a GBV_ILN_4046
912			\|a GBV_ILN_4112
912			\|a GBV_ILN_4125
912			\|a GBV_ILN_4126
912			\|a GBV_ILN_4242
912			\|a GBV_ILN_4249
912			\|a GBV_ILN_4251
912			\|a GBV_ILN_4305
912			\|a GBV_ILN_4306
912			\|a GBV_ILN_4307
912			\|a GBV_ILN_4313
912			\|a GBV_ILN_4322
912			\|a GBV_ILN_4323
912			\|a GBV_ILN_4324
912			\|a GBV_ILN_4325
912			\|a GBV_ILN_4326
912			\|a GBV_ILN_4333
912			\|a GBV_ILN_4334
912			\|a GBV_ILN_4335
912			\|a GBV_ILN_4336
912			\|a GBV_ILN_4338
912			\|a GBV_ILN_4367
912			\|a GBV_ILN_4700
951			\|a AR
952			\|d 9 \|j 2022 \|e 15 \|h n/a-n/a

Indexfelder

author_variant	c g cg d s ds c l cl x y xy x z xz z l zl g z gz d z dz
matchkey_str	article:21983844:2022----::dafntoadktprooyrlbsdojgtdoyeasnlcmoeteiodcightrssba
hierarchy_sort_str	2022
publishDate	2022
allfields	10.1002/advs.202106087 doi (DE-627)DOAJ029589614 (DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837 DE-627 ger DE-627 rakwb eng Chenying Gao verfasserin aut A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains 2022 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography. conjugated polymers cross‐linking organic field‐effect transistors photo‐patterning semiconducting photoresists Science Q Dandan Shi verfasserin aut Cheng Li verfasserin aut Xiaobo Yu verfasserin aut Xisha Zhang verfasserin aut Zitong Liu verfasserin aut Guanxin Zhang verfasserin aut Deqing Zhang verfasserin aut In Advanced Science Wiley, 2015 9(2022), 15, Seite n/a-n/a (DE-627)817357777 (DE-600)2808093-2 21983844 nnns volume:9 year:2022 number:15 pages:n/a-n/a https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837 kostenfrei https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/toc/2198-3844 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2022 15 n/a-n/a
spelling	10.1002/advs.202106087 doi (DE-627)DOAJ029589614 (DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837 DE-627 ger DE-627 rakwb eng Chenying Gao verfasserin aut A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains 2022 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography. conjugated polymers cross‐linking organic field‐effect transistors photo‐patterning semiconducting photoresists Science Q Dandan Shi verfasserin aut Cheng Li verfasserin aut Xiaobo Yu verfasserin aut Xisha Zhang verfasserin aut Zitong Liu verfasserin aut Guanxin Zhang verfasserin aut Deqing Zhang verfasserin aut In Advanced Science Wiley, 2015 9(2022), 15, Seite n/a-n/a (DE-627)817357777 (DE-600)2808093-2 21983844 nnns volume:9 year:2022 number:15 pages:n/a-n/a https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837 kostenfrei https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/toc/2198-3844 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2022 15 n/a-n/a
allfields_unstemmed	10.1002/advs.202106087 doi (DE-627)DOAJ029589614 (DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837 DE-627 ger DE-627 rakwb eng Chenying Gao verfasserin aut A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains 2022 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography. conjugated polymers cross‐linking organic field‐effect transistors photo‐patterning semiconducting photoresists Science Q Dandan Shi verfasserin aut Cheng Li verfasserin aut Xiaobo Yu verfasserin aut Xisha Zhang verfasserin aut Zitong Liu verfasserin aut Guanxin Zhang verfasserin aut Deqing Zhang verfasserin aut In Advanced Science Wiley, 2015 9(2022), 15, Seite n/a-n/a (DE-627)817357777 (DE-600)2808093-2 21983844 nnns volume:9 year:2022 number:15 pages:n/a-n/a https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837 kostenfrei https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/toc/2198-3844 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2022 15 n/a-n/a
allfieldsGer	10.1002/advs.202106087 doi (DE-627)DOAJ029589614 (DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837 DE-627 ger DE-627 rakwb eng Chenying Gao verfasserin aut A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains 2022 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography. conjugated polymers cross‐linking organic field‐effect transistors photo‐patterning semiconducting photoresists Science Q Dandan Shi verfasserin aut Cheng Li verfasserin aut Xiaobo Yu verfasserin aut Xisha Zhang verfasserin aut Zitong Liu verfasserin aut Guanxin Zhang verfasserin aut Deqing Zhang verfasserin aut In Advanced Science Wiley, 2015 9(2022), 15, Seite n/a-n/a (DE-627)817357777 (DE-600)2808093-2 21983844 nnns volume:9 year:2022 number:15 pages:n/a-n/a https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837 kostenfrei https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/toc/2198-3844 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2022 15 n/a-n/a
allfieldsSound	10.1002/advs.202106087 doi (DE-627)DOAJ029589614 (DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837 DE-627 ger DE-627 rakwb eng Chenying Gao verfasserin aut A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains 2022 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography. conjugated polymers cross‐linking organic field‐effect transistors photo‐patterning semiconducting photoresists Science Q Dandan Shi verfasserin aut Cheng Li verfasserin aut Xiaobo Yu verfasserin aut Xisha Zhang verfasserin aut Zitong Liu verfasserin aut Guanxin Zhang verfasserin aut Deqing Zhang verfasserin aut In Advanced Science Wiley, 2015 9(2022), 15, Seite n/a-n/a (DE-627)817357777 (DE-600)2808093-2 21983844 nnns volume:9 year:2022 number:15 pages:n/a-n/a https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837 kostenfrei https://doi.org/10.1002/advs.202106087 kostenfrei https://doaj.org/toc/2198-3844 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 9 2022 15 n/a-n/a
language	English
source	In Advanced Science 9(2022), 15, Seite n/a-n/a volume:9 year:2022 number:15 pages:n/a-n/a
sourceStr	In Advanced Science 9(2022), 15, Seite n/a-n/a volume:9 year:2022 number:15 pages:n/a-n/a
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	conjugated polymers cross‐linking organic field‐effect transistors photo‐patterning semiconducting photoresists Science Q
isfreeaccess_bool	true
container_title	Advanced Science
authorswithroles_txt_mv	Chenying Gao @@aut@@ Dandan Shi @@aut@@ Cheng Li @@aut@@ Xiaobo Yu @@aut@@ Xisha Zhang @@aut@@ Zitong Liu @@aut@@ Guanxin Zhang @@aut@@ Deqing Zhang @@aut@@
publishDateDaySort_date	2022-01-01T00:00:00Z
hierarchy_top_id	817357777
id	DOAJ029589614
language_de	englisch
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">DOAJ029589614</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230307135823.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">230226s2022 xx \|\|\|\|\|o 00\| \|\|eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1002/advs.202106087</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)DOAJ029589614</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="100" ind1="0" ind2=" "><subfield code="a">Chenying Gao</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="2"><subfield code="a">A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2022</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">conjugated polymers</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">cross‐linking</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">organic field‐effect transistors</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">photo‐patterning</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">semiconducting photoresists</subfield></datafield><datafield tag="653" ind1=" " ind2="0"><subfield code="a">Science</subfield></datafield><datafield tag="653" ind1=" " ind2="0"><subfield code="a">Q</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Dandan Shi</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Cheng Li</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Xiaobo Yu</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Xisha Zhang</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Zitong Liu</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Guanxin Zhang</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Deqing Zhang</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">In</subfield><subfield code="t">Advanced Science</subfield><subfield code="d">Wiley, 2015</subfield><subfield code="g">9(2022), 15, Seite n/a-n/a</subfield><subfield code="w">(DE-627)817357777</subfield><subfield code="w">(DE-600)2808093-2</subfield><subfield code="x">21983844</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:9</subfield><subfield code="g">year:2022</subfield><subfield code="g">number:15</subfield><subfield code="g">pages:n/a-n/a</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1002/advs.202106087</subfield><subfield code="z">kostenfrei</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837</subfield><subfield code="z">kostenfrei</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1002/advs.202106087</subfield><subfield code="z">kostenfrei</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="u">https://doaj.org/toc/2198-3844</subfield><subfield code="y">Journal toc</subfield><subfield code="z">kostenfrei</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_DOAJ</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_11</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_20</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_22</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_23</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_24</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_31</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_39</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_40</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_60</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_62</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_63</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_65</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_69</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_73</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_95</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_105</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_110</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_151</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_161</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_170</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_171</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_213</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_224</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_230</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_285</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_293</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_370</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_602</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_636</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2005</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2006</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2007</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2009</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2010</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2011</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2014</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2026</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2027</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2034</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2037</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2038</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2044</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2048</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2049</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2050</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2055</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2056</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2057</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2059</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2061</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2068</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2088</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2106</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2108</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2110</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2111</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2118</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2122</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2143</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2144</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2147</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2148</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2152</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2153</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2232</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2336</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2470</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2507</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2522</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4012</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4035</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4037</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4046</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4112</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4125</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4126</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4242</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4249</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4251</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4305</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4306</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4307</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4313</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4322</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4323</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4324</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4325</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4326</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4333</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4334</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4335</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4336</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4338</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4367</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4700</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">9</subfield><subfield code="j">2022</subfield><subfield code="e">15</subfield><subfield code="h">n/a-n/a</subfield></datafield></record></collection>
author	Chenying Gao
spellingShingle	Chenying Gao misc conjugated polymers misc cross‐linking misc organic field‐effect transistors misc photo‐patterning misc semiconducting photoresists misc Science misc Q A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains
authorStr	Chenying Gao
ppnlink_with_tag_str_mv	@@773@@(DE-627)817357777
format	electronic Article
delete_txt_mv	keep
author_role	aut aut aut aut aut aut aut aut
collection	DOAJ
remote_str	true
illustrated	Not Illustrated
issn	21983844
topic_title	A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains conjugated polymers cross‐linking organic field‐effect transistors photo‐patterning semiconducting photoresists
topic	misc conjugated polymers misc cross‐linking misc organic field‐effect transistors misc photo‐patterning misc semiconducting photoresists misc Science misc Q
topic_unstemmed	misc conjugated polymers misc cross‐linking misc organic field‐effect transistors misc photo‐patterning misc semiconducting photoresists misc Science misc Q
topic_browse	misc conjugated polymers misc cross‐linking misc organic field‐effect transistors misc photo‐patterning misc semiconducting photoresists misc Science misc Q
format_facet	Elektronische Aufsätze Aufsätze Elektronische Ressource
format_main_str_mv	Text Zeitschrift/Artikel
carriertype_str_mv	cr
hierarchy_parent_title	Advanced Science
hierarchy_parent_id	817357777
hierarchy_top_title	Advanced Science
isfreeaccess_txt	true
familylinks_str_mv	(DE-627)817357777 (DE-600)2808093-2
title	A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains
ctrlnum	(DE-627)DOAJ029589614 (DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837
title_full	A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains
author_sort	Chenying Gao
journal	Advanced Science
journalStr	Advanced Science
lang_code	eng
isOA_bool	true
recordtype	marc
publishDateSort	2022
contenttype_str_mv	txt
author_browse	Chenying Gao Dandan Shi Cheng Li Xiaobo Yu Xisha Zhang Zitong Liu Guanxin Zhang Deqing Zhang
container_volume	9
format_se	Elektronische Aufsätze
author-letter	Chenying Gao
doi_str_mv	10.1002/advs.202106087
author2-role	verfasserin
title_sort	dual functional diketopyrrolopyrrole‐based conjugated polymer as single component semiconducting photoresist by appending azide groups in the side chains
title_auth	A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains
abstract	Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography.
abstractGer	Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography.
abstract_unstemmed	Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography.
collection_details	GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700
container_issue	15
title_short	A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains
url	https://doi.org/10.1002/advs.202106087 https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837 https://doaj.org/toc/2198-3844
remote_bool	true
author2	Dandan Shi Cheng Li Xiaobo Yu Xisha Zhang Zitong Liu Guanxin Zhang Deqing Zhang
author2Str	Dandan Shi Cheng Li Xiaobo Yu Xisha Zhang Zitong Liu Guanxin Zhang Deqing Zhang
ppnlink	817357777
mediatype_str_mv	c
isOA_txt	true
hochschulschrift_bool	false
doi_str	10.1002/advs.202106087
up_date	2024-07-03T23:34:23.506Z
_version_	1803602795961516032
fullrecord_marcxml	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">DOAJ029589614</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230307135823.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">230226s2022 xx \|\|\|\|\|o 00\| \|\|eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1002/advs.202106087</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)DOAJ029589614</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)DOAJ8b26ae0c0e1d4a498945b98a53ae7837</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="100" ind1="0" ind2=" "><subfield code="a">Chenying Gao</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="2"><subfield code="a">A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2022</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Molecular systems that can function as photoresists are essential for the fabrication of flexible electronics through all‐photolithographic processes. Most of the reported molecular systems for photo‐patterning of polymeric semiconductors contain binary or multi‐components. In comparison, single component semiconducting photoresist is advantageous since it will circumvent the optimization of phase separation and ensure the patterned semiconducting thin films to be more uniform. In this paper, a single component semiconducting photoresist (PDPP4T‐N3) by incorporating azide groups into the branching alkyl chains of a diketopyrrolopyrrole‐based conjugated polymer is reported. The results reveal that i) the azide groups make the side chains to be photo‐cross‐linkable; ii) uniform patterns with size as small as 5 µm form under mild UV irradiation (365 nm, 85 mW cm−2) at ambient conditions; iii) such photo‐induced cross‐linking does not affect the inter‐chain packing; iv) benefiting from the single component feature, field‐effect transistors (FETs) with the individual patterned thin films display satisfactorily uniform performances with average charge mobility of 0.61 ± 0.10 cm2 V–1 s–1 and threshold voltage of 3.49 ± 1.43 V. These results offer a simple yet effective design strategy for high‐performance single component semiconducting photoresists, which hold great potentials for flexible electronics processed by all‐photolithography.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">conjugated polymers</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">cross‐linking</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">organic field‐effect transistors</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">photo‐patterning</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">semiconducting photoresists</subfield></datafield><datafield tag="653" ind1=" " ind2="0"><subfield code="a">Science</subfield></datafield><datafield tag="653" ind1=" " ind2="0"><subfield code="a">Q</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Dandan Shi</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Cheng Li</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Xiaobo Yu</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Xisha Zhang</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Zitong Liu</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Guanxin Zhang</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="0" ind2=" "><subfield code="a">Deqing Zhang</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">In</subfield><subfield code="t">Advanced Science</subfield><subfield code="d">Wiley, 2015</subfield><subfield code="g">9(2022), 15, Seite n/a-n/a</subfield><subfield code="w">(DE-627)817357777</subfield><subfield code="w">(DE-600)2808093-2</subfield><subfield code="x">21983844</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:9</subfield><subfield code="g">year:2022</subfield><subfield code="g">number:15</subfield><subfield code="g">pages:n/a-n/a</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1002/advs.202106087</subfield><subfield code="z">kostenfrei</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doaj.org/article/8b26ae0c0e1d4a498945b98a53ae7837</subfield><subfield code="z">kostenfrei</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1002/advs.202106087</subfield><subfield code="z">kostenfrei</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="u">https://doaj.org/toc/2198-3844</subfield><subfield code="y">Journal toc</subfield><subfield code="z">kostenfrei</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_DOAJ</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_11</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_20</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_22</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_23</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_24</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_31</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_39</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_40</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_60</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_62</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_63</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_65</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_69</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_73</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_95</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_105</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_110</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_151</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_161</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_170</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_171</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_213</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_224</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_230</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_285</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_293</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_370</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_602</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_636</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2005</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2006</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2007</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2009</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2010</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2011</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2014</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2026</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2027</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2034</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2037</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2038</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2044</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2048</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2049</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2050</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2055</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2056</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2057</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2059</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2061</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2068</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2088</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2106</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2108</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2110</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2111</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2118</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2122</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2143</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2144</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2147</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2148</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2152</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2153</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2232</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2336</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2470</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2507</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2522</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4012</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4035</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4037</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4046</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4112</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4125</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4126</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4242</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4249</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4251</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4305</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4306</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4307</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4313</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4322</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4323</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4324</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4325</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4326</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4333</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4334</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4335</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4336</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4338</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4367</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4700</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">9</subfield><subfield code="j">2022</subfield><subfield code="e">15</subfield><subfield code="h">n/a-n/a</subfield></datafield></record></collection>
score	7.402135

Nicht das Richtige dabei?

Schreiben Sie uns!

A Dual Functional Diketopyrrolopyrrole‐Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains

Nicht das Richtige dabei?

Zugang & Verfügbarkeit

Vorhandene Bände

Nicht das Richtige dabei?