Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology

In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control...
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Autor*in:	Ting Wu [verfasserIn] Libing Zhang [verfasserIn] Haijun Song [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2021

Übergeordnetes Werk:	In: AIP Advances - AIP Publishing LLC, 2011, 11(2021), 11, Seite 115120-115120-8
Übergeordnetes Werk:	volume:11 ; year:2021 ; number:11 ; pages:115120-115120-8

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DOI / URN:	10.1063/5.0074069

Katalog-ID:	DOAJ052430219

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520			\|a In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern.
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allfields	10.1063/5.0074069 doi (DE-627)DOAJ052430219 (DE-599)DOAJ1053fb4569da4b82b8acf477a28f444c DE-627 ger DE-627 rakwb eng QC1-999 Ting Wu verfasserin aut Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern. Physics Libing Zhang verfasserin aut Haijun Song verfasserin aut In AIP Advances AIP Publishing LLC, 2011 11(2021), 11, Seite 115120-115120-8 (DE-627)641391706 (DE-600)2583909-3 21583226 nnns volume:11 year:2021 number:11 pages:115120-115120-8 https://doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/article/1053fb4569da4b82b8acf477a28f444c kostenfrei http://dx.doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/toc/2158-3226 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 11 2021 11 115120-115120-8
spelling	10.1063/5.0074069 doi (DE-627)DOAJ052430219 (DE-599)DOAJ1053fb4569da4b82b8acf477a28f444c DE-627 ger DE-627 rakwb eng QC1-999 Ting Wu verfasserin aut Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern. Physics Libing Zhang verfasserin aut Haijun Song verfasserin aut In AIP Advances AIP Publishing LLC, 2011 11(2021), 11, Seite 115120-115120-8 (DE-627)641391706 (DE-600)2583909-3 21583226 nnns volume:11 year:2021 number:11 pages:115120-115120-8 https://doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/article/1053fb4569da4b82b8acf477a28f444c kostenfrei http://dx.doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/toc/2158-3226 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 11 2021 11 115120-115120-8
allfields_unstemmed	10.1063/5.0074069 doi (DE-627)DOAJ052430219 (DE-599)DOAJ1053fb4569da4b82b8acf477a28f444c DE-627 ger DE-627 rakwb eng QC1-999 Ting Wu verfasserin aut Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern. Physics Libing Zhang verfasserin aut Haijun Song verfasserin aut In AIP Advances AIP Publishing LLC, 2011 11(2021), 11, Seite 115120-115120-8 (DE-627)641391706 (DE-600)2583909-3 21583226 nnns volume:11 year:2021 number:11 pages:115120-115120-8 https://doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/article/1053fb4569da4b82b8acf477a28f444c kostenfrei http://dx.doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/toc/2158-3226 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 11 2021 11 115120-115120-8
allfieldsGer	10.1063/5.0074069 doi (DE-627)DOAJ052430219 (DE-599)DOAJ1053fb4569da4b82b8acf477a28f444c DE-627 ger DE-627 rakwb eng QC1-999 Ting Wu verfasserin aut Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern. Physics Libing Zhang verfasserin aut Haijun Song verfasserin aut In AIP Advances AIP Publishing LLC, 2011 11(2021), 11, Seite 115120-115120-8 (DE-627)641391706 (DE-600)2583909-3 21583226 nnns volume:11 year:2021 number:11 pages:115120-115120-8 https://doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/article/1053fb4569da4b82b8acf477a28f444c kostenfrei http://dx.doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/toc/2158-3226 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 11 2021 11 115120-115120-8
allfieldsSound	10.1063/5.0074069 doi (DE-627)DOAJ052430219 (DE-599)DOAJ1053fb4569da4b82b8acf477a28f444c DE-627 ger DE-627 rakwb eng QC1-999 Ting Wu verfasserin aut Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern. Physics Libing Zhang verfasserin aut Haijun Song verfasserin aut In AIP Advances AIP Publishing LLC, 2011 11(2021), 11, Seite 115120-115120-8 (DE-627)641391706 (DE-600)2583909-3 21583226 nnns volume:11 year:2021 number:11 pages:115120-115120-8 https://doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/article/1053fb4569da4b82b8acf477a28f444c kostenfrei http://dx.doi.org/10.1063/5.0074069 kostenfrei https://doaj.org/toc/2158-3226 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 11 2021 11 115120-115120-8
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source	In AIP Advances 11(2021), 11, Seite 115120-115120-8 volume:11 year:2021 number:11 pages:115120-115120-8
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topic_title	QC1-999 Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology
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title	Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology
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title_full	Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology
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title_sort	control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology
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title_auth	Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology
abstract	In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern.
abstractGer	In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern.
abstract_unstemmed	In the process of fabricating micro-patterns using the near-field electrohydrodynamic (EHD) direct-writing technology, the voltage error and the dynamic responsiveness of applied voltage have an effect on the jetting shape and the direct-writing pattern. To solve these problems, an iterative control method was proposed to compensate the voltage error between the expected voltage and the actual voltage of the near-field EHD direct-writing setup, which was controlled by the idea of iteration, and a control method based on feedforward and feedback was proposed to enhance the dynamic response of applied voltage in the process of the near-field EHD direct-writing micro-pattern, which was controlled by the idea of the feedforward and feedback. Software algorithms of the voltage error compensation and improved dynamic response of applied voltage were implemented in the near-field EHD direct-writing setup. The experimental results show that the proposed method of voltage error compensation can effectively improve the precision of applied voltage and the presented control method of improving dynamic response capability can effectively shorten the delay time of applied voltage. Finally, two groups of contrast experiments were carried out in the near-field EHD direct-writing equipment, and the experimental results demonstrate that the proposed control methods can effectively improve the jetting shape and the quality of the direct-writing micro-pattern.
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title_short	Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology
url	https://doi.org/10.1063/5.0074069 https://doaj.org/article/1053fb4569da4b82b8acf477a28f444c http://dx.doi.org/10.1063/5.0074069 https://doaj.org/toc/2158-3226
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Control method of applied voltage for fabricating micro-pattern using near-field electrohydrodynamic direct-writing technology

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