High-throughput characterization of film thickness in thin film materials libraries by digital holographic microscopy

A high-throughput characterization technique based on digital holography for mapping film thickness in thin-film materials libraries was developed. Digital holographic microscopy is used for fully automatic measurements of the thickness of patterned films with nanometer resolution. The method has se...
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Autor*in:	Yiu Wai Lai, Michael Krause, Alan Savan, Sigurd Thienhaus, Nektarios Koukourakis, Martin R Hofmann and Alfred Ludwig [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2011

Übergeordnetes Werk:	In: Science and Technology of Advanced Materials - Taylor & Francis Group, 2002, 12(2011), 5, p 054201
Übergeordnetes Werk:	volume:12 ; year:2011 ; number:5, p 054201

Links:	Link aufrufen Link aufrufen Journal toc Journal toc

Katalog-ID:	DOAJ060200928

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callnumber-first	T - Technology
author	Yiu Wai Lai, Michael Krause, Alan Savan, Sigurd Thienhaus, Nektarios Koukourakis, Martin R Hofmann and Alfred Ludwig
spellingShingle	Yiu Wai Lai, Michael Krause, Alan Savan, Sigurd Thienhaus, Nektarios Koukourakis, Martin R Hofmann and Alfred Ludwig misc TA401-492 misc TP248.13-248.65 misc Materials of engineering and construction. Mechanics of materials misc Biotechnology High-throughput characterization of film thickness in thin film materials libraries by digital holographic microscopy
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topic_title	TA401-492 TP248.13-248.65 High-throughput characterization of film thickness in thin film materials libraries by digital holographic microscopy
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title	High-throughput characterization of film thickness in thin film materials libraries by digital holographic microscopy
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title_full	High-throughput characterization of film thickness in thin film materials libraries by digital holographic microscopy
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author-letter	Yiu Wai Lai, Michael Krause, Alan Savan, Sigurd Thienhaus, Nektarios Koukourakis, Martin R Hofmann and Alfred Ludwig
title_sort	high-throughput characterization of film thickness in thin film materials libraries by digital holographic microscopy
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title_auth	High-throughput characterization of film thickness in thin film materials libraries by digital holographic microscopy
abstract	A high-throughput characterization technique based on digital holography for mapping film thickness in thin-film materials libraries was developed. Digital holographic microscopy is used for fully automatic measurements of the thickness of patterned films with nanometer resolution. The method has several significant advantages over conventional stylus profilometry: it is contactless and fast, substrate bending is compensated, and the experimental setup is simple. Patterned films prepared by different combinatorial thin-film approaches were characterized to investigate and demonstrate this method. The results show that this technique is valuable for the quick, reliable and high-throughput determination of the film thickness distribution in combinatorial materials research. Importantly, it can also be applied to thin films that have been structured by shadow masking.
abstractGer	A high-throughput characterization technique based on digital holography for mapping film thickness in thin-film materials libraries was developed. Digital holographic microscopy is used for fully automatic measurements of the thickness of patterned films with nanometer resolution. The method has several significant advantages over conventional stylus profilometry: it is contactless and fast, substrate bending is compensated, and the experimental setup is simple. Patterned films prepared by different combinatorial thin-film approaches were characterized to investigate and demonstrate this method. The results show that this technique is valuable for the quick, reliable and high-throughput determination of the film thickness distribution in combinatorial materials research. Importantly, it can also be applied to thin films that have been structured by shadow masking.
abstract_unstemmed	A high-throughput characterization technique based on digital holography for mapping film thickness in thin-film materials libraries was developed. Digital holographic microscopy is used for fully automatic measurements of the thickness of patterned films with nanometer resolution. The method has several significant advantages over conventional stylus profilometry: it is contactless and fast, substrate bending is compensated, and the experimental setup is simple. Patterned films prepared by different combinatorial thin-film approaches were characterized to investigate and demonstrate this method. The results show that this technique is valuable for the quick, reliable and high-throughput determination of the film thickness distribution in combinatorial materials research. Importantly, it can also be applied to thin films that have been structured by shadow masking.
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