Passive Control of Silane Diffusion for Gradient Application of Surface Properties

Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape...
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Gespeichert in:

Autor*in:	Riley L. Howard [verfasserIn] Francesca Bernardi [verfasserIn] Matthew Leff [verfasserIn] Emma Abele [verfasserIn] Nancy L. Allbritton [verfasserIn] Daniel M. Harris [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2021

Schlagwörter:	liquid lithography silanization Monte Carlo gradient wettability micropillar

Übergeordnetes Werk:	In: Micromachines - MDPI AG, 2010, 12(2021), 11, p 1360
Übergeordnetes Werk:	volume:12 ; year:2021 ; number:11, p 1360

Links:	Link aufrufen Link aufrufen Link aufrufen Journal toc

DOI / URN:	10.3390/mi12111360

Katalog-ID:	DOAJ061938750

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spelling	10.3390/mi12111360 doi (DE-627)DOAJ061938750 (DE-599)DOAJa715802d20d84dc68a5b2302a0410aaf DE-627 ger DE-627 rakwb eng TJ1-1570 Riley L. Howard verfasserin aut Passive Control of Silane Diffusion for Gradient Application of Surface Properties 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo. liquid lithography silanization Monte Carlo gradient wettability micropillar Mechanical engineering and machinery Francesca Bernardi verfasserin aut Matthew Leff verfasserin aut Emma Abele verfasserin aut Nancy L. Allbritton verfasserin aut Daniel M. Harris verfasserin aut In Micromachines MDPI AG, 2010 12(2021), 11, p 1360 (DE-627)665016069 (DE-600)2620864-7 2072666X nnns volume:12 year:2021 number:11, p 1360 https://doi.org/10.3390/mi12111360 kostenfrei https://doaj.org/article/a715802d20d84dc68a5b2302a0410aaf kostenfrei https://www.mdpi.com/2072-666X/12/11/1360 kostenfrei https://doaj.org/toc/2072-666X Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 12 2021 11, p 1360
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allfieldsSound	10.3390/mi12111360 doi (DE-627)DOAJ061938750 (DE-599)DOAJa715802d20d84dc68a5b2302a0410aaf DE-627 ger DE-627 rakwb eng TJ1-1570 Riley L. Howard verfasserin aut Passive Control of Silane Diffusion for Gradient Application of Surface Properties 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo. liquid lithography silanization Monte Carlo gradient wettability micropillar Mechanical engineering and machinery Francesca Bernardi verfasserin aut Matthew Leff verfasserin aut Emma Abele verfasserin aut Nancy L. Allbritton verfasserin aut Daniel M. Harris verfasserin aut In Micromachines MDPI AG, 2010 12(2021), 11, p 1360 (DE-627)665016069 (DE-600)2620864-7 2072666X nnns volume:12 year:2021 number:11, p 1360 https://doi.org/10.3390/mi12111360 kostenfrei https://doaj.org/article/a715802d20d84dc68a5b2302a0410aaf kostenfrei https://www.mdpi.com/2072-666X/12/11/1360 kostenfrei https://doaj.org/toc/2072-666X Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 12 2021 11, p 1360
language	English
source	In Micromachines 12(2021), 11, p 1360 volume:12 year:2021 number:11, p 1360
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topic_facet	liquid lithography silanization Monte Carlo gradient wettability micropillar Mechanical engineering and machinery
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authorswithroles_txt_mv	Riley L. Howard @@aut@@ Francesca Bernardi @@aut@@ Matthew Leff @@aut@@ Emma Abele @@aut@@ Nancy L. Allbritton @@aut@@ Daniel M. Harris @@aut@@
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callnumber-first	T - Technology
author	Riley L. Howard
spellingShingle	Riley L. Howard misc TJ1-1570 misc liquid lithography misc silanization misc Monte Carlo misc gradient misc wettability misc micropillar misc Mechanical engineering and machinery Passive Control of Silane Diffusion for Gradient Application of Surface Properties
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topic_title	TJ1-1570 Passive Control of Silane Diffusion for Gradient Application of Surface Properties liquid lithography silanization Monte Carlo gradient wettability micropillar
topic	misc TJ1-1570 misc liquid lithography misc silanization misc Monte Carlo misc gradient misc wettability misc micropillar misc Mechanical engineering and machinery
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title	Passive Control of Silane Diffusion for Gradient Application of Surface Properties
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title_sort	passive control of silane diffusion for gradient application of surface properties
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title_auth	Passive Control of Silane Diffusion for Gradient Application of Surface Properties
abstract	Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo.
abstractGer	Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo.
abstract_unstemmed	Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo.
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container_issue	11, p 1360
title_short	Passive Control of Silane Diffusion for Gradient Application of Surface Properties
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