Fabrication of Multifocal Microlens Array by One Step Exposure Process
Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is n...
Ausführliche Beschreibung
Autor*in: |
Wei Yuan [verfasserIn] Yajuan Cai [verfasserIn] Cheng Xu [verfasserIn] Hui Pang [verfasserIn] Axiu Cao [verfasserIn] Yongqi Fu [verfasserIn] Qiling Deng [verfasserIn] |
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Sprache: |
Englisch |
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2021 |
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In: Micromachines - MDPI AG, 2010, 12(2021), 9, p 1097 |
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Übergeordnetes Werk: |
volume:12 ; year:2021 ; number:9, p 1097 |
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DOI / URN: |
10.3390/mi12091097 |
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Katalog-ID: |
DOAJ07093312X |
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10.3390/mi12091097 doi (DE-627)DOAJ07093312X (DE-599)DOAJa7b29adacf3740d5b88edac8e9b63a1a DE-627 ger DE-627 rakwb eng TJ1-1570 Wei Yuan verfasserin aut Fabrication of Multifocal Microlens Array by One Step Exposure Process 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is no longer applicable. To solve this problem, a fabrication method of multifocal MLA by a one step exposure process is proposed. Through the analyses and research of photoresist AZ9260, the nonlinear relationship between exposure dose and exposure depth is established. In the design of the mask, the mask pattern is corrected according to the nonlinear relationship to obtain the final mask. The continuous surface of the multifocal MLA is fabricated by the mask moving exposure. The experimental results show that the prepared multifocal MLA has high filling factor and surface fidelity. What is more, this method is simple and efficient to use in practical applications. integrated micro-optical system mask moving exposure microlens array multifocal Mechanical engineering and machinery Yajuan Cai verfasserin aut Cheng Xu verfasserin aut Hui Pang verfasserin aut Axiu Cao verfasserin aut Yongqi Fu verfasserin aut Qiling Deng verfasserin aut In Micromachines MDPI AG, 2010 12(2021), 9, p 1097 (DE-627)665016069 (DE-600)2620864-7 2072666X nnns volume:12 year:2021 number:9, p 1097 https://doi.org/10.3390/mi12091097 kostenfrei https://doaj.org/article/a7b29adacf3740d5b88edac8e9b63a1a kostenfrei https://www.mdpi.com/2072-666X/12/9/1097 kostenfrei https://doaj.org/toc/2072-666X Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 12 2021 9, p 1097 |
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10.3390/mi12091097 doi (DE-627)DOAJ07093312X (DE-599)DOAJa7b29adacf3740d5b88edac8e9b63a1a DE-627 ger DE-627 rakwb eng TJ1-1570 Wei Yuan verfasserin aut Fabrication of Multifocal Microlens Array by One Step Exposure Process 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is no longer applicable. To solve this problem, a fabrication method of multifocal MLA by a one step exposure process is proposed. Through the analyses and research of photoresist AZ9260, the nonlinear relationship between exposure dose and exposure depth is established. In the design of the mask, the mask pattern is corrected according to the nonlinear relationship to obtain the final mask. The continuous surface of the multifocal MLA is fabricated by the mask moving exposure. The experimental results show that the prepared multifocal MLA has high filling factor and surface fidelity. What is more, this method is simple and efficient to use in practical applications. integrated micro-optical system mask moving exposure microlens array multifocal Mechanical engineering and machinery Yajuan Cai verfasserin aut Cheng Xu verfasserin aut Hui Pang verfasserin aut Axiu Cao verfasserin aut Yongqi Fu verfasserin aut Qiling Deng verfasserin aut In Micromachines MDPI AG, 2010 12(2021), 9, p 1097 (DE-627)665016069 (DE-600)2620864-7 2072666X nnns volume:12 year:2021 number:9, p 1097 https://doi.org/10.3390/mi12091097 kostenfrei https://doaj.org/article/a7b29adacf3740d5b88edac8e9b63a1a kostenfrei https://www.mdpi.com/2072-666X/12/9/1097 kostenfrei https://doaj.org/toc/2072-666X Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 12 2021 9, p 1097 |
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10.3390/mi12091097 doi (DE-627)DOAJ07093312X (DE-599)DOAJa7b29adacf3740d5b88edac8e9b63a1a DE-627 ger DE-627 rakwb eng TJ1-1570 Wei Yuan verfasserin aut Fabrication of Multifocal Microlens Array by One Step Exposure Process 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is no longer applicable. To solve this problem, a fabrication method of multifocal MLA by a one step exposure process is proposed. Through the analyses and research of photoresist AZ9260, the nonlinear relationship between exposure dose and exposure depth is established. In the design of the mask, the mask pattern is corrected according to the nonlinear relationship to obtain the final mask. The continuous surface of the multifocal MLA is fabricated by the mask moving exposure. The experimental results show that the prepared multifocal MLA has high filling factor and surface fidelity. What is more, this method is simple and efficient to use in practical applications. integrated micro-optical system mask moving exposure microlens array multifocal Mechanical engineering and machinery Yajuan Cai verfasserin aut Cheng Xu verfasserin aut Hui Pang verfasserin aut Axiu Cao verfasserin aut Yongqi Fu verfasserin aut Qiling Deng verfasserin aut In Micromachines MDPI AG, 2010 12(2021), 9, p 1097 (DE-627)665016069 (DE-600)2620864-7 2072666X nnns volume:12 year:2021 number:9, p 1097 https://doi.org/10.3390/mi12091097 kostenfrei https://doaj.org/article/a7b29adacf3740d5b88edac8e9b63a1a kostenfrei https://www.mdpi.com/2072-666X/12/9/1097 kostenfrei https://doaj.org/toc/2072-666X Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 12 2021 9, p 1097 |
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10.3390/mi12091097 doi (DE-627)DOAJ07093312X (DE-599)DOAJa7b29adacf3740d5b88edac8e9b63a1a DE-627 ger DE-627 rakwb eng TJ1-1570 Wei Yuan verfasserin aut Fabrication of Multifocal Microlens Array by One Step Exposure Process 2021 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is no longer applicable. To solve this problem, a fabrication method of multifocal MLA by a one step exposure process is proposed. Through the analyses and research of photoresist AZ9260, the nonlinear relationship between exposure dose and exposure depth is established. In the design of the mask, the mask pattern is corrected according to the nonlinear relationship to obtain the final mask. The continuous surface of the multifocal MLA is fabricated by the mask moving exposure. The experimental results show that the prepared multifocal MLA has high filling factor and surface fidelity. What is more, this method is simple and efficient to use in practical applications. integrated micro-optical system mask moving exposure microlens array multifocal Mechanical engineering and machinery Yajuan Cai verfasserin aut Cheng Xu verfasserin aut Hui Pang verfasserin aut Axiu Cao verfasserin aut Yongqi Fu verfasserin aut Qiling Deng verfasserin aut In Micromachines MDPI AG, 2010 12(2021), 9, p 1097 (DE-627)665016069 (DE-600)2620864-7 2072666X nnns volume:12 year:2021 number:9, p 1097 https://doi.org/10.3390/mi12091097 kostenfrei https://doaj.org/article/a7b29adacf3740d5b88edac8e9b63a1a kostenfrei https://www.mdpi.com/2072-666X/12/9/1097 kostenfrei https://doaj.org/toc/2072-666X Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 12 2021 9, p 1097 |
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Fabrication of Multifocal Microlens Array by One Step Exposure Process |
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Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is no longer applicable. To solve this problem, a fabrication method of multifocal MLA by a one step exposure process is proposed. Through the analyses and research of photoresist AZ9260, the nonlinear relationship between exposure dose and exposure depth is established. In the design of the mask, the mask pattern is corrected according to the nonlinear relationship to obtain the final mask. The continuous surface of the multifocal MLA is fabricated by the mask moving exposure. The experimental results show that the prepared multifocal MLA has high filling factor and surface fidelity. What is more, this method is simple and efficient to use in practical applications. |
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Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is no longer applicable. To solve this problem, a fabrication method of multifocal MLA by a one step exposure process is proposed. Through the analyses and research of photoresist AZ9260, the nonlinear relationship between exposure dose and exposure depth is established. In the design of the mask, the mask pattern is corrected according to the nonlinear relationship to obtain the final mask. The continuous surface of the multifocal MLA is fabricated by the mask moving exposure. The experimental results show that the prepared multifocal MLA has high filling factor and surface fidelity. What is more, this method is simple and efficient to use in practical applications. |
abstract_unstemmed |
Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is no longer applicable. To solve this problem, a fabrication method of multifocal MLA by a one step exposure process is proposed. Through the analyses and research of photoresist AZ9260, the nonlinear relationship between exposure dose and exposure depth is established. In the design of the mask, the mask pattern is corrected according to the nonlinear relationship to obtain the final mask. The continuous surface of the multifocal MLA is fabricated by the mask moving exposure. The experimental results show that the prepared multifocal MLA has high filling factor and surface fidelity. What is more, this method is simple and efficient to use in practical applications. |
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|
score |
7.401162 |