Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns

In nanoparticle-based printed electronic devices, the printability of the patterns constituting the device are crucial factors. Although many studies have investigated the printability of patterns, only a few have analyzed and established international standards for measuring the dimensions and prin...
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Autor*in:	Jongsu Lee [verfasserIn] Chung Hwan Kim [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2023

Schlagwörter:	printed electronics printing geometry printability quantification

Übergeordnetes Werk:	In: Nanomaterials - MDPI AG, 2012, 13(2023), 10, p 1597
Übergeordnetes Werk:	volume:13 ; year:2023 ; number:10, p 1597

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DOI / URN:	10.3390/nano13101597

Katalog-ID:	DOAJ09432994X

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520			\|a In nanoparticle-based printed electronic devices, the printability of the patterns constituting the device are crucial factors. Although many studies have investigated the printability of patterns, only a few have analyzed and established international standards for measuring the dimensions and printability of shape patterns. This study introduces an advanced algorithm for accurate measurement of the geometry and printability of shape patterns to establish an international standard for pattern dimensions and printability. The algorithm involves three core concepts: extraction of edges of printed patterns and identification of pixel positions, identification of reference edges via the best-fitting of the shape pattern, and calculation of different pixel positions of edges related to reference edges. This method enables the measurement of the pattern geometry and printability, including edge waviness and widening, while considering all pixels comprising the edges of the patterns. The study results revealed that the rectangle and circle patterns exhibited an average widening of 3.55% and a maximum deviation of 1.58%, based on an average of 1662 data points. This indicates that the algorithm has potential applications in real-time pattern quality evaluation, process optimization using statistical or AI-based methods, and foundation of International Electrotechnical Commission standards for shape patterns.
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allfieldsSound	10.3390/nano13101597 doi (DE-627)DOAJ09432994X (DE-599)DOAJ516175e8529b420bbf775ab1736a9ebe DE-627 ger DE-627 rakwb eng QD1-999 Jongsu Lee verfasserin aut Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns 2023 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier In nanoparticle-based printed electronic devices, the printability of the patterns constituting the device are crucial factors. Although many studies have investigated the printability of patterns, only a few have analyzed and established international standards for measuring the dimensions and printability of shape patterns. This study introduces an advanced algorithm for accurate measurement of the geometry and printability of shape patterns to establish an international standard for pattern dimensions and printability. The algorithm involves three core concepts: extraction of edges of printed patterns and identification of pixel positions, identification of reference edges via the best-fitting of the shape pattern, and calculation of different pixel positions of edges related to reference edges. This method enables the measurement of the pattern geometry and printability, including edge waviness and widening, while considering all pixels comprising the edges of the patterns. The study results revealed that the rectangle and circle patterns exhibited an average widening of 3.55% and a maximum deviation of 1.58%, based on an average of 1662 data points. This indicates that the algorithm has potential applications in real-time pattern quality evaluation, process optimization using statistical or AI-based methods, and foundation of International Electrotechnical Commission standards for shape patterns. printed electronics printing geometry printability quantification Chemistry Chung Hwan Kim verfasserin aut In Nanomaterials MDPI AG, 2012 13(2023), 10, p 1597 (DE-627)718627199 (DE-600)2662255-5 20794991 nnns volume:13 year:2023 number:10, p 1597 https://doi.org/10.3390/nano13101597 kostenfrei https://doaj.org/article/516175e8529b420bbf775ab1736a9ebe kostenfrei https://www.mdpi.com/2079-4991/13/10/1597 kostenfrei https://doaj.org/toc/2079-4991 Journal toc kostenfrei GBV_USEFLAG_A SYSFLAG_A GBV_DOAJ GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_95 GBV_ILN_105 GBV_ILN_110 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_602 GBV_ILN_2014 GBV_ILN_2055 GBV_ILN_2108 GBV_ILN_2119 GBV_ILN_4012 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4249 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4700 AR 13 2023 10, p 1597
language	English
source	In Nanomaterials 13(2023), 10, p 1597 volume:13 year:2023 number:10, p 1597
sourceStr	In Nanomaterials 13(2023), 10, p 1597 volume:13 year:2023 number:10, p 1597
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	printed electronics printing geometry printability quantification Chemistry
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authorswithroles_txt_mv	Jongsu Lee @@aut@@ Chung Hwan Kim @@aut@@
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callnumber-first	Q - Science
author	Jongsu Lee
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topic_title	QD1-999 Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns printed electronics printing geometry printability quantification
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title	Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns
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title_full	Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns
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title_sort	advanced algorithm for reliable quantification of the geometry and printability of printed patterns
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title_auth	Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns
abstract	In nanoparticle-based printed electronic devices, the printability of the patterns constituting the device are crucial factors. Although many studies have investigated the printability of patterns, only a few have analyzed and established international standards for measuring the dimensions and printability of shape patterns. This study introduces an advanced algorithm for accurate measurement of the geometry and printability of shape patterns to establish an international standard for pattern dimensions and printability. The algorithm involves three core concepts: extraction of edges of printed patterns and identification of pixel positions, identification of reference edges via the best-fitting of the shape pattern, and calculation of different pixel positions of edges related to reference edges. This method enables the measurement of the pattern geometry and printability, including edge waviness and widening, while considering all pixels comprising the edges of the patterns. The study results revealed that the rectangle and circle patterns exhibited an average widening of 3.55% and a maximum deviation of 1.58%, based on an average of 1662 data points. This indicates that the algorithm has potential applications in real-time pattern quality evaluation, process optimization using statistical or AI-based methods, and foundation of International Electrotechnical Commission standards for shape patterns.
abstractGer	In nanoparticle-based printed electronic devices, the printability of the patterns constituting the device are crucial factors. Although many studies have investigated the printability of patterns, only a few have analyzed and established international standards for measuring the dimensions and printability of shape patterns. This study introduces an advanced algorithm for accurate measurement of the geometry and printability of shape patterns to establish an international standard for pattern dimensions and printability. The algorithm involves three core concepts: extraction of edges of printed patterns and identification of pixel positions, identification of reference edges via the best-fitting of the shape pattern, and calculation of different pixel positions of edges related to reference edges. This method enables the measurement of the pattern geometry and printability, including edge waviness and widening, while considering all pixels comprising the edges of the patterns. The study results revealed that the rectangle and circle patterns exhibited an average widening of 3.55% and a maximum deviation of 1.58%, based on an average of 1662 data points. This indicates that the algorithm has potential applications in real-time pattern quality evaluation, process optimization using statistical or AI-based methods, and foundation of International Electrotechnical Commission standards for shape patterns.
abstract_unstemmed	In nanoparticle-based printed electronic devices, the printability of the patterns constituting the device are crucial factors. Although many studies have investigated the printability of patterns, only a few have analyzed and established international standards for measuring the dimensions and printability of shape patterns. This study introduces an advanced algorithm for accurate measurement of the geometry and printability of shape patterns to establish an international standard for pattern dimensions and printability. The algorithm involves three core concepts: extraction of edges of printed patterns and identification of pixel positions, identification of reference edges via the best-fitting of the shape pattern, and calculation of different pixel positions of edges related to reference edges. This method enables the measurement of the pattern geometry and printability, including edge waviness and widening, while considering all pixels comprising the edges of the patterns. The study results revealed that the rectangle and circle patterns exhibited an average widening of 3.55% and a maximum deviation of 1.58%, based on an average of 1662 data points. This indicates that the algorithm has potential applications in real-time pattern quality evaluation, process optimization using statistical or AI-based methods, and foundation of International Electrotechnical Commission standards for shape patterns.
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title_short	Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns
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code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">13</subfield><subfield code="j">2023</subfield><subfield code="e">10, p 1597</subfield></datafield></record></collection>
score	7.4002657

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Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns

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