Formation of submicron relief structures on the surface of sapphire substrates

An analysis of technologies that allow creating microrelief structures on the surface of sapphire substrates has been carried out. It is shown that the most effective method of forming relief structures with submicron dimensions is ion beam etching through a protective mask formed by photolithogra...
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Autor*in:	V.V. Petrov [verfasserIn] A.A. Kryuchyn [verfasserIn] I.V. Gorbov [verfasserIn] A.V. Pankratova [verfasserIn] D.Yu. Manko [verfasserIn] Yu.O. Borodin [verfasserIn] O.V. Shikhovets [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch ; Ukrainisch

Erschienen:	2023

Schlagwörter:	sapphire substrates selective etching microrelief structures protective mask direct laser recording

Übergeordnetes Werk:	In: Фізика і хімія твердого тіла - Vasyl Stefanyk Precarpathian National University, 2018, 24(2023), 2, Seite 298-303
Übergeordnetes Werk:	volume:24 ; year:2023 ; number:2 ; pages:298-303

Links:	Link aufrufen Link aufrufen Link aufrufen Journal toc Journal toc

DOI / URN:	10.15330/pcss.24.2.298-303

Katalog-ID:	DOAJ099495457

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callnumber-first	Q - Science
author	V.V. Petrov
spellingShingle	V.V. Petrov misc QC1-999 misc sapphire substrates misc selective etching misc microrelief structures misc protective mask misc direct laser recording misc Physics Formation of submicron relief structures on the surface of sapphire substrates
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topic_title	QC1-999 Formation of submicron relief structures on the surface of sapphire substrates sapphire substrates selective etching microrelief structures protective mask direct laser recording
topic	misc QC1-999 misc sapphire substrates misc selective etching misc microrelief structures misc protective mask misc direct laser recording misc Physics
topic_unstemmed	misc QC1-999 misc sapphire substrates misc selective etching misc microrelief structures misc protective mask misc direct laser recording misc Physics
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title	Formation of submicron relief structures on the surface of sapphire substrates
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title_full	Formation of submicron relief structures on the surface of sapphire substrates
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title_sort	formation of submicron relief structures on the surface of sapphire substrates
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title_auth	Formation of submicron relief structures on the surface of sapphire substrates
abstract	An analysis of technologies that allow creating microrelief structures on the surface of sapphire substrates has been carried out. It is shown that the most effective method of forming relief structures with submicron dimensions is ion beam etching through a protective mask formed by photolithography. The main problems in creating a microrelief on the surface of sapphire substrates are the removal of static electric charge in the process of ion beam etching of the substrates, as well as obtaining a protective mask with windows of specified sizes, through which etching of the sapphire substrate is performed.
abstractGer	An analysis of technologies that allow creating microrelief structures on the surface of sapphire substrates has been carried out. It is shown that the most effective method of forming relief structures with submicron dimensions is ion beam etching through a protective mask formed by photolithography. The main problems in creating a microrelief on the surface of sapphire substrates are the removal of static electric charge in the process of ion beam etching of the substrates, as well as obtaining a protective mask with windows of specified sizes, through which etching of the sapphire substrate is performed.
abstract_unstemmed	An analysis of technologies that allow creating microrelief structures on the surface of sapphire substrates has been carried out. It is shown that the most effective method of forming relief structures with submicron dimensions is ion beam etching through a protective mask formed by photolithography. The main problems in creating a microrelief on the surface of sapphire substrates are the removal of static electric charge in the process of ion beam etching of the substrates, as well as obtaining a protective mask with windows of specified sizes, through which etching of the sapphire substrate is performed.
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title_short	Formation of submicron relief structures on the surface of sapphire substrates
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score	7.401023

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Formation of submicron relief structures on the surface of sapphire substrates

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Zugang & Verfügbarkeit

Vorhandene Bände

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