The behavior of helium atoms in He

Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Chen, Huaican [verfasserIn] Zhan, Xiaozhi [verfasserIn] Liu, Xiao [verfasserIn] Hai, Yang [verfasserIn] Xu, Juping [verfasserIn] Zhu, Tao [verfasserIn] Yin, Wen [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2019

Schlagwörter:	Bilayer nanocomposite Interface Helium behavior Neutron reflectometry (NR) Density functional theory (DFT)

Übergeordnetes Werk:	Enthalten in: Applied surface science - Amsterdam : Elsevier, 1985, 486, Seite 274-280
Übergeordnetes Werk:	volume:486 ; pages:274-280

DOI / URN:	10.1016/j.apsusc.2019.05.007

Katalog-ID:	ELV002459795

Internformat


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245	1	0	\|a The behavior of helium atoms in He
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520			\|a Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials.
650		4	\|a Bilayer nanocomposite
650		4	\|a Interface
650		4	\|a Helium behavior
650		4	\|a Neutron reflectometry (NR)
650		4	\|a Density functional theory (DFT)
700	1		\|a Zhan, Xiaozhi \|e verfasserin \|4 aut
700	1		\|a Liu, Xiao \|e verfasserin \|4 aut
700	1		\|a Hai, Yang \|e verfasserin \|4 aut
700	1		\|a Xu, Juping \|e verfasserin \|4 aut
700	1		\|a Zhu, Tao \|e verfasserin \|4 aut
700	1		\|a Yin, Wen \|e verfasserin \|4 aut
773	0	8	\|i Enthalten in \|t Applied surface science \|d Amsterdam : Elsevier, 1985 \|g 486, Seite 274-280 \|h Online-Ressource \|w (DE-627)312151128 \|w (DE-600)2002520-8 \|w (DE-576)094476985 \|7 nnns
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912			\|a GBV_ILN_65
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912			\|a GBV_ILN_70
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912			\|a GBV_ILN_74
912			\|a GBV_ILN_90
912			\|a GBV_ILN_95
912			\|a GBV_ILN_100
912			\|a GBV_ILN_101
912			\|a GBV_ILN_105
912			\|a GBV_ILN_110
912			\|a GBV_ILN_150
912			\|a GBV_ILN_151
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912			\|a GBV_ILN_702
912			\|a GBV_ILN_2003
912			\|a GBV_ILN_2004
912			\|a GBV_ILN_2005
912			\|a GBV_ILN_2011
912			\|a GBV_ILN_2014
912			\|a GBV_ILN_2015
912			\|a GBV_ILN_2020
912			\|a GBV_ILN_2021
912			\|a GBV_ILN_2025
912			\|a GBV_ILN_2027
912			\|a GBV_ILN_2034
912			\|a GBV_ILN_2038
912			\|a GBV_ILN_2044
912			\|a GBV_ILN_2048
912			\|a GBV_ILN_2049
912			\|a GBV_ILN_2050
912			\|a GBV_ILN_2056
912			\|a GBV_ILN_2059
912			\|a GBV_ILN_2061
912			\|a GBV_ILN_2064
912			\|a GBV_ILN_2065
912			\|a GBV_ILN_2068
912			\|a GBV_ILN_2111
912			\|a GBV_ILN_2112
912			\|a GBV_ILN_2113
912			\|a GBV_ILN_2118
912			\|a GBV_ILN_2122
912			\|a GBV_ILN_2129
912			\|a GBV_ILN_2143
912			\|a GBV_ILN_2147
912			\|a GBV_ILN_2148
912			\|a GBV_ILN_2152
912			\|a GBV_ILN_2153
912			\|a GBV_ILN_2190
912			\|a GBV_ILN_2336
912			\|a GBV_ILN_2507
912			\|a GBV_ILN_2522
912			\|a GBV_ILN_4035
912			\|a GBV_ILN_4037
912			\|a GBV_ILN_4112
912			\|a GBV_ILN_4125
912			\|a GBV_ILN_4126
912			\|a GBV_ILN_4242
912			\|a GBV_ILN_4251
912			\|a GBV_ILN_4305
912			\|a GBV_ILN_4313
912			\|a GBV_ILN_4323
912			\|a GBV_ILN_4324
912			\|a GBV_ILN_4325
912			\|a GBV_ILN_4326
912			\|a GBV_ILN_4333
912			\|a GBV_ILN_4334
912			\|a GBV_ILN_4335
912			\|a GBV_ILN_4338
912			\|a GBV_ILN_4393
936	b	k	\|a 33.68 \|j Oberflächen \|j Dünne Schichten \|j Grenzflächen \|x Physik
936	b	k	\|a 35.18 \|j Kolloidchemie \|j Grenzflächenchemie
936	b	k	\|a 52.78 \|j Oberflächentechnik \|j Wärmebehandlung
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952			\|d 486 \|h 274-280

Indexfelder

author_variant	h c hc x z xz x l xl y h yh j x jx t z tz w y wy
matchkey_str	chenhuaicanzhanxiaozhiliuxiaohaiyangxuju:2019----:hbhvoohlua
hierarchy_sort_str	2019
bklnumber	33.68 35.18 52.78
publishDate	2019
allfields	10.1016/j.apsusc.2019.05.007 doi (DE-627)ELV002459795 (ELSEVIER)S0169-4332(19)31313-3 DE-627 ger DE-627 rda eng 670 530 660 DE-600 33.68 bkl 35.18 bkl 52.78 bkl Chen, Huaican verfasserin aut The behavior of helium atoms in He 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials. Bilayer nanocomposite Interface Helium behavior Neutron reflectometry (NR) Density functional theory (DFT) Zhan, Xiaozhi verfasserin aut Liu, Xiao verfasserin aut Hai, Yang verfasserin aut Xu, Juping verfasserin aut Zhu, Tao verfasserin aut Yin, Wen verfasserin aut Enthalten in Applied surface science Amsterdam : Elsevier, 1985 486, Seite 274-280 Online-Ressource (DE-627)312151128 (DE-600)2002520-8 (DE-576)094476985 nnns volume:486 pages:274-280 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 33.68 Oberflächen Dünne Schichten Grenzflächen Physik 35.18 Kolloidchemie Grenzflächenchemie 52.78 Oberflächentechnik Wärmebehandlung AR 486 274-280
spelling	10.1016/j.apsusc.2019.05.007 doi (DE-627)ELV002459795 (ELSEVIER)S0169-4332(19)31313-3 DE-627 ger DE-627 rda eng 670 530 660 DE-600 33.68 bkl 35.18 bkl 52.78 bkl Chen, Huaican verfasserin aut The behavior of helium atoms in He 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials. Bilayer nanocomposite Interface Helium behavior Neutron reflectometry (NR) Density functional theory (DFT) Zhan, Xiaozhi verfasserin aut Liu, Xiao verfasserin aut Hai, Yang verfasserin aut Xu, Juping verfasserin aut Zhu, Tao verfasserin aut Yin, Wen verfasserin aut Enthalten in Applied surface science Amsterdam : Elsevier, 1985 486, Seite 274-280 Online-Ressource (DE-627)312151128 (DE-600)2002520-8 (DE-576)094476985 nnns volume:486 pages:274-280 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 33.68 Oberflächen Dünne Schichten Grenzflächen Physik 35.18 Kolloidchemie Grenzflächenchemie 52.78 Oberflächentechnik Wärmebehandlung AR 486 274-280
allfields_unstemmed	10.1016/j.apsusc.2019.05.007 doi (DE-627)ELV002459795 (ELSEVIER)S0169-4332(19)31313-3 DE-627 ger DE-627 rda eng 670 530 660 DE-600 33.68 bkl 35.18 bkl 52.78 bkl Chen, Huaican verfasserin aut The behavior of helium atoms in He 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials. Bilayer nanocomposite Interface Helium behavior Neutron reflectometry (NR) Density functional theory (DFT) Zhan, Xiaozhi verfasserin aut Liu, Xiao verfasserin aut Hai, Yang verfasserin aut Xu, Juping verfasserin aut Zhu, Tao verfasserin aut Yin, Wen verfasserin aut Enthalten in Applied surface science Amsterdam : Elsevier, 1985 486, Seite 274-280 Online-Ressource (DE-627)312151128 (DE-600)2002520-8 (DE-576)094476985 nnns volume:486 pages:274-280 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 33.68 Oberflächen Dünne Schichten Grenzflächen Physik 35.18 Kolloidchemie Grenzflächenchemie 52.78 Oberflächentechnik Wärmebehandlung AR 486 274-280
allfieldsGer	10.1016/j.apsusc.2019.05.007 doi (DE-627)ELV002459795 (ELSEVIER)S0169-4332(19)31313-3 DE-627 ger DE-627 rda eng 670 530 660 DE-600 33.68 bkl 35.18 bkl 52.78 bkl Chen, Huaican verfasserin aut The behavior of helium atoms in He 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials. Bilayer nanocomposite Interface Helium behavior Neutron reflectometry (NR) Density functional theory (DFT) Zhan, Xiaozhi verfasserin aut Liu, Xiao verfasserin aut Hai, Yang verfasserin aut Xu, Juping verfasserin aut Zhu, Tao verfasserin aut Yin, Wen verfasserin aut Enthalten in Applied surface science Amsterdam : Elsevier, 1985 486, Seite 274-280 Online-Ressource (DE-627)312151128 (DE-600)2002520-8 (DE-576)094476985 nnns volume:486 pages:274-280 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 33.68 Oberflächen Dünne Schichten Grenzflächen Physik 35.18 Kolloidchemie Grenzflächenchemie 52.78 Oberflächentechnik Wärmebehandlung AR 486 274-280
allfieldsSound	10.1016/j.apsusc.2019.05.007 doi (DE-627)ELV002459795 (ELSEVIER)S0169-4332(19)31313-3 DE-627 ger DE-627 rda eng 670 530 660 DE-600 33.68 bkl 35.18 bkl 52.78 bkl Chen, Huaican verfasserin aut The behavior of helium atoms in He 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials. Bilayer nanocomposite Interface Helium behavior Neutron reflectometry (NR) Density functional theory (DFT) Zhan, Xiaozhi verfasserin aut Liu, Xiao verfasserin aut Hai, Yang verfasserin aut Xu, Juping verfasserin aut Zhu, Tao verfasserin aut Yin, Wen verfasserin aut Enthalten in Applied surface science Amsterdam : Elsevier, 1985 486, Seite 274-280 Online-Ressource (DE-627)312151128 (DE-600)2002520-8 (DE-576)094476985 nnns volume:486 pages:274-280 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 33.68 Oberflächen Dünne Schichten Grenzflächen Physik 35.18 Kolloidchemie Grenzflächenchemie 52.78 Oberflächentechnik Wärmebehandlung AR 486 274-280
language	English
source	Enthalten in Applied surface science 486, Seite 274-280 volume:486 pages:274-280
sourceStr	Enthalten in Applied surface science 486, Seite 274-280 volume:486 pages:274-280
format_phy_str_mv	Article
bklname	Oberflächen Dünne Schichten Grenzflächen Kolloidchemie Grenzflächenchemie Oberflächentechnik Wärmebehandlung
institution	findex.gbv.de
topic_facet	Bilayer nanocomposite Interface Helium behavior Neutron reflectometry (NR) Density functional theory (DFT)
dewey-raw	670
isfreeaccess_bool	false
container_title	Applied surface science
authorswithroles_txt_mv	Chen, Huaican @@aut@@ Zhan, Xiaozhi @@aut@@ Liu, Xiao @@aut@@ Hai, Yang @@aut@@ Xu, Juping @@aut@@ Zhu, Tao @@aut@@ Yin, Wen @@aut@@
publishDateDaySort_date	2019-01-01T00:00:00Z
hierarchy_top_id	312151128
dewey-sort	3670
id	ELV002459795
language_de	englisch
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author	Chen, Huaican
spellingShingle	Chen, Huaican ddc 670 bkl 33.68 bkl 35.18 bkl 52.78 misc Bilayer nanocomposite misc Interface misc Helium behavior misc Neutron reflectometry (NR) misc Density functional theory (DFT) The behavior of helium atoms in He
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topic_title	670 530 660 DE-600 33.68 bkl 35.18 bkl 52.78 bkl The behavior of helium atoms in He Bilayer nanocomposite Interface Helium behavior Neutron reflectometry (NR) Density functional theory (DFT)
topic	ddc 670 bkl 33.68 bkl 35.18 bkl 52.78 misc Bilayer nanocomposite misc Interface misc Helium behavior misc Neutron reflectometry (NR) misc Density functional theory (DFT)
topic_unstemmed	ddc 670 bkl 33.68 bkl 35.18 bkl 52.78 misc Bilayer nanocomposite misc Interface misc Helium behavior misc Neutron reflectometry (NR) misc Density functional theory (DFT)
topic_browse	ddc 670 bkl 33.68 bkl 35.18 bkl 52.78 misc Bilayer nanocomposite misc Interface misc Helium behavior misc Neutron reflectometry (NR) misc Density functional theory (DFT)
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title	The behavior of helium atoms in He
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title_full	The behavior of helium atoms in He
author_sort	Chen, Huaican
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author_browse	Chen, Huaican Zhan, Xiaozhi Liu, Xiao Hai, Yang Xu, Juping Zhu, Tao Yin, Wen
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title_sort	the behavior of helium atoms in he
title_auth	The behavior of helium atoms in He
abstract	Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials.
abstractGer	Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials.
abstract_unstemmed	Helium behavior in W/Ni bilayer nanocomposite was investigated by neutron reflectometry, transmission electron microscopy (TEM) and density functional theory (DFT) calculation. Under He+ ion implantation, the helium enriched layers are formed at W/Ni interface. As the implantation fluence increases to 1 × 1017 ions/cm2, the helium bubbles are observed in W and Ni layer, and the adsorption of helium atoms reaches saturation at W/Ni interface. Moreover, a mechanism that helium atoms trapped at the interface of W/Ni mainly migrate from the W layer is proposed. This mechanism enlightens that dispersing nickel-nanoparticles into tungsten can protect tungsten against helium deleterious effect. That is, modulating the constituent of dispersed nano-particles can effectively improve the helium resistant of materials.
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title_short	The behavior of helium atoms in He
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author2	Zhan, Xiaozhi Liu, Xiao Hai, Yang Xu, Juping Zhu, Tao Yin, Wen
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doi_str	10.1016/j.apsusc.2019.05.007
up_date	2024-07-07T00:48:04.194Z
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