Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films

Gespeichert in:

Autor*in:	Li, Jingjie [verfasserIn] Zhao, Yang [verfasserIn] Wang, Hui [verfasserIn] Zhou, Yijian [verfasserIn] Zhang, Meng [verfasserIn] Fu, Hongyuan [verfasserIn] Zhang, Baoping [verfasserIn] Li, Xinzhong [verfasserIn] Yang, Fan [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2019

Übergeordnetes Werk:	Enthalten in: Vacuum - Amsterdam [u.a.] : Elsevier Science, 1951, 168
Übergeordnetes Werk:	volume:168

DOI / URN:	10.1016/j.vacuum.2019.108811

Katalog-ID:	ELV002897253

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spelling	10.1016/j.vacuum.2019.108811 doi (DE-627)ELV002897253 (ELSEVIER)S0042-207X(19)31165-0 DE-627 ger DE-627 rda eng 530 DE-600 58.19 bkl 33.09 bkl 52.78 bkl Li, Jingjie verfasserin aut Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Zhao, Yang verfasserin aut Wang, Hui verfasserin aut Zhou, Yijian verfasserin aut Zhang, Meng verfasserin aut Fu, Hongyuan verfasserin aut Zhang, Baoping verfasserin aut Li, Xinzhong verfasserin aut Yang, Fan verfasserin aut Enthalten in Vacuum Amsterdam [u.a.] : Elsevier Science, 1951 168 Online-Ressource (DE-627)271176393 (DE-600)1479044-0 (DE-576)114088187 0042-207X nnns volume:168 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 58.19 Verfahrenstechnik: Sonstiges 33.09 Physik unter besonderen Bedingungen 52.78 Oberflächentechnik Wärmebehandlung AR 168
allfields_unstemmed	10.1016/j.vacuum.2019.108811 doi (DE-627)ELV002897253 (ELSEVIER)S0042-207X(19)31165-0 DE-627 ger DE-627 rda eng 530 DE-600 58.19 bkl 33.09 bkl 52.78 bkl Li, Jingjie verfasserin aut Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Zhao, Yang verfasserin aut Wang, Hui verfasserin aut Zhou, Yijian verfasserin aut Zhang, Meng verfasserin aut Fu, Hongyuan verfasserin aut Zhang, Baoping verfasserin aut Li, Xinzhong verfasserin aut Yang, Fan verfasserin aut Enthalten in Vacuum Amsterdam [u.a.] : Elsevier Science, 1951 168 Online-Ressource (DE-627)271176393 (DE-600)1479044-0 (DE-576)114088187 0042-207X nnns volume:168 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 58.19 Verfahrenstechnik: Sonstiges 33.09 Physik unter besonderen Bedingungen 52.78 Oberflächentechnik Wärmebehandlung AR 168
allfieldsGer	10.1016/j.vacuum.2019.108811 doi (DE-627)ELV002897253 (ELSEVIER)S0042-207X(19)31165-0 DE-627 ger DE-627 rda eng 530 DE-600 58.19 bkl 33.09 bkl 52.78 bkl Li, Jingjie verfasserin aut Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Zhao, Yang verfasserin aut Wang, Hui verfasserin aut Zhou, Yijian verfasserin aut Zhang, Meng verfasserin aut Fu, Hongyuan verfasserin aut Zhang, Baoping verfasserin aut Li, Xinzhong verfasserin aut Yang, Fan verfasserin aut Enthalten in Vacuum Amsterdam [u.a.] : Elsevier Science, 1951 168 Online-Ressource (DE-627)271176393 (DE-600)1479044-0 (DE-576)114088187 0042-207X nnns volume:168 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 58.19 Verfahrenstechnik: Sonstiges 33.09 Physik unter besonderen Bedingungen 52.78 Oberflächentechnik Wärmebehandlung AR 168
allfieldsSound	10.1016/j.vacuum.2019.108811 doi (DE-627)ELV002897253 (ELSEVIER)S0042-207X(19)31165-0 DE-627 ger DE-627 rda eng 530 DE-600 58.19 bkl 33.09 bkl 52.78 bkl Li, Jingjie verfasserin aut Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films 2019 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Zhao, Yang verfasserin aut Wang, Hui verfasserin aut Zhou, Yijian verfasserin aut Zhang, Meng verfasserin aut Fu, Hongyuan verfasserin aut Zhang, Baoping verfasserin aut Li, Xinzhong verfasserin aut Yang, Fan verfasserin aut Enthalten in Vacuum Amsterdam [u.a.] : Elsevier Science, 1951 168 Online-Ressource (DE-627)271176393 (DE-600)1479044-0 (DE-576)114088187 0042-207X nnns volume:168 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 58.19 Verfahrenstechnik: Sonstiges 33.09 Physik unter besonderen Bedingungen 52.78 Oberflächentechnik Wärmebehandlung AR 168
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author	Li, Jingjie
spellingShingle	Li, Jingjie ddc 530 bkl 58.19 bkl 33.09 bkl 52.78 Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films
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topic_title	530 DE-600 58.19 bkl 33.09 bkl 52.78 bkl Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films
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title	Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films
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title_full	Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films
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title_sort	effects of oxygen flow rates on the physical characteristics of magnetron sputtered cuo films
title_auth	Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films
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title_short	Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films
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author2	Zhao, Yang Wang, Hui Zhou, Yijian Zhang, Meng Fu, Hongyuan Zhang, Baoping Li, Xinzhong Yang, Fan
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doi_str	10.1016/j.vacuum.2019.108811
up_date	2024-07-06T17:49:12.011Z
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Effects of oxygen flow rates on the physical characteristics of magnetron sputtered CuO films

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