Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography

This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end an...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Rojjanapinun, Akarapan [verfasserIn] Pagsuyoin, Sheree A. [verfasserIn] Perman, Jason [verfasserIn] Sun, Hongwei [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2021

Schlagwörter:	Isoporous nanomembranes Nanosphere lithography Soft lithography Nanoparticle monolayer

Übergeordnetes Werk:	Enthalten in: Polymer testing - Amsterdam [u.a.] : Elsevier Science, 1980, 102
Übergeordnetes Werk:	volume:102

DOI / URN:	10.1016/j.polymertesting.2021.107316

Katalog-ID:	ELV006683347

Internformat


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publishDate	2021
allfields	10.1016/j.polymertesting.2021.107316 doi (DE-627)ELV006683347 (ELSEVIER)S0142-9418(21)00263-4 DE-627 ger DE-627 rda eng 540 DE-600 51.30 bkl Rojjanapinun, Akarapan verfasserin aut Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography 2021 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end and cross-flow filtration. Our tests demonstrate that 90–100% rejection rates could be achieved in these membranes for perfluorooctanoic acid, sulfamethoxazole, bovine serum albumin, and SARS-COV-2 in high-concentration aqueous solutions. The membranes are nominally 50 μm thick and retain structural integrity, exhibiting high tensile strengths of 8.56 MPa and 8.31 MPa, respectively, due to improved routes to β crystalline formations of the PVDF. Our useful fabrication procedure is compatible with developed technologies that can quickly expand the opportunities of isoporous PVDF for processing of advanced materials and devices. Isoporous nanomembranes Nanosphere lithography Soft lithography Nanoparticle monolayer Pagsuyoin, Sheree A. verfasserin (orcid)0000-0003-4090-957X aut Perman, Jason verfasserin (orcid)0000-0003-4894-3561 aut Sun, Hongwei verfasserin (orcid)0000-0002-9519-4420 aut Enthalten in Polymer testing Amsterdam [u.a.] : Elsevier Science, 1980 102 Online-Ressource (DE-627)320530280 (DE-600)2015673-X (DE-576)259484903 1873-2348 nnns volume:102 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 51.30 Werkstoffprüfung Werkstoffuntersuchung AR 102
spelling	10.1016/j.polymertesting.2021.107316 doi (DE-627)ELV006683347 (ELSEVIER)S0142-9418(21)00263-4 DE-627 ger DE-627 rda eng 540 DE-600 51.30 bkl Rojjanapinun, Akarapan verfasserin aut Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography 2021 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end and cross-flow filtration. Our tests demonstrate that 90–100% rejection rates could be achieved in these membranes for perfluorooctanoic acid, sulfamethoxazole, bovine serum albumin, and SARS-COV-2 in high-concentration aqueous solutions. The membranes are nominally 50 μm thick and retain structural integrity, exhibiting high tensile strengths of 8.56 MPa and 8.31 MPa, respectively, due to improved routes to β crystalline formations of the PVDF. Our useful fabrication procedure is compatible with developed technologies that can quickly expand the opportunities of isoporous PVDF for processing of advanced materials and devices. Isoporous nanomembranes Nanosphere lithography Soft lithography Nanoparticle monolayer Pagsuyoin, Sheree A. verfasserin (orcid)0000-0003-4090-957X aut Perman, Jason verfasserin (orcid)0000-0003-4894-3561 aut Sun, Hongwei verfasserin (orcid)0000-0002-9519-4420 aut Enthalten in Polymer testing Amsterdam [u.a.] : Elsevier Science, 1980 102 Online-Ressource (DE-627)320530280 (DE-600)2015673-X (DE-576)259484903 1873-2348 nnns volume:102 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 51.30 Werkstoffprüfung Werkstoffuntersuchung AR 102
allfields_unstemmed	10.1016/j.polymertesting.2021.107316 doi (DE-627)ELV006683347 (ELSEVIER)S0142-9418(21)00263-4 DE-627 ger DE-627 rda eng 540 DE-600 51.30 bkl Rojjanapinun, Akarapan verfasserin aut Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography 2021 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end and cross-flow filtration. Our tests demonstrate that 90–100% rejection rates could be achieved in these membranes for perfluorooctanoic acid, sulfamethoxazole, bovine serum albumin, and SARS-COV-2 in high-concentration aqueous solutions. The membranes are nominally 50 μm thick and retain structural integrity, exhibiting high tensile strengths of 8.56 MPa and 8.31 MPa, respectively, due to improved routes to β crystalline formations of the PVDF. Our useful fabrication procedure is compatible with developed technologies that can quickly expand the opportunities of isoporous PVDF for processing of advanced materials and devices. Isoporous nanomembranes Nanosphere lithography Soft lithography Nanoparticle monolayer Pagsuyoin, Sheree A. verfasserin (orcid)0000-0003-4090-957X aut Perman, Jason verfasserin (orcid)0000-0003-4894-3561 aut Sun, Hongwei verfasserin (orcid)0000-0002-9519-4420 aut Enthalten in Polymer testing Amsterdam [u.a.] : Elsevier Science, 1980 102 Online-Ressource (DE-627)320530280 (DE-600)2015673-X (DE-576)259484903 1873-2348 nnns volume:102 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 51.30 Werkstoffprüfung Werkstoffuntersuchung AR 102
allfieldsGer	10.1016/j.polymertesting.2021.107316 doi (DE-627)ELV006683347 (ELSEVIER)S0142-9418(21)00263-4 DE-627 ger DE-627 rda eng 540 DE-600 51.30 bkl Rojjanapinun, Akarapan verfasserin aut Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography 2021 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end and cross-flow filtration. Our tests demonstrate that 90–100% rejection rates could be achieved in these membranes for perfluorooctanoic acid, sulfamethoxazole, bovine serum albumin, and SARS-COV-2 in high-concentration aqueous solutions. The membranes are nominally 50 μm thick and retain structural integrity, exhibiting high tensile strengths of 8.56 MPa and 8.31 MPa, respectively, due to improved routes to β crystalline formations of the PVDF. Our useful fabrication procedure is compatible with developed technologies that can quickly expand the opportunities of isoporous PVDF for processing of advanced materials and devices. Isoporous nanomembranes Nanosphere lithography Soft lithography Nanoparticle monolayer Pagsuyoin, Sheree A. verfasserin (orcid)0000-0003-4090-957X aut Perman, Jason verfasserin (orcid)0000-0003-4894-3561 aut Sun, Hongwei verfasserin (orcid)0000-0002-9519-4420 aut Enthalten in Polymer testing Amsterdam [u.a.] : Elsevier Science, 1980 102 Online-Ressource (DE-627)320530280 (DE-600)2015673-X (DE-576)259484903 1873-2348 nnns volume:102 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 51.30 Werkstoffprüfung Werkstoffuntersuchung AR 102
allfieldsSound	10.1016/j.polymertesting.2021.107316 doi (DE-627)ELV006683347 (ELSEVIER)S0142-9418(21)00263-4 DE-627 ger DE-627 rda eng 540 DE-600 51.30 bkl Rojjanapinun, Akarapan verfasserin aut Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography 2021 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end and cross-flow filtration. Our tests demonstrate that 90–100% rejection rates could be achieved in these membranes for perfluorooctanoic acid, sulfamethoxazole, bovine serum albumin, and SARS-COV-2 in high-concentration aqueous solutions. The membranes are nominally 50 μm thick and retain structural integrity, exhibiting high tensile strengths of 8.56 MPa and 8.31 MPa, respectively, due to improved routes to β crystalline formations of the PVDF. Our useful fabrication procedure is compatible with developed technologies that can quickly expand the opportunities of isoporous PVDF for processing of advanced materials and devices. Isoporous nanomembranes Nanosphere lithography Soft lithography Nanoparticle monolayer Pagsuyoin, Sheree A. verfasserin (orcid)0000-0003-4090-957X aut Perman, Jason verfasserin (orcid)0000-0003-4894-3561 aut Sun, Hongwei verfasserin (orcid)0000-0002-9519-4420 aut Enthalten in Polymer testing Amsterdam [u.a.] : Elsevier Science, 1980 102 Online-Ressource (DE-627)320530280 (DE-600)2015673-X (DE-576)259484903 1873-2348 nnns volume:102 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_161 GBV_ILN_170 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4367 GBV_ILN_4393 GBV_ILN_4700 51.30 Werkstoffprüfung Werkstoffuntersuchung AR 102
language	English
source	Enthalten in Polymer testing 102 volume:102
sourceStr	Enthalten in Polymer testing 102 volume:102
format_phy_str_mv	Article
bklname	Werkstoffprüfung Werkstoffuntersuchung
institution	findex.gbv.de
topic_facet	Isoporous nanomembranes Nanosphere lithography Soft lithography Nanoparticle monolayer
dewey-raw	540
isfreeaccess_bool	false
container_title	Polymer testing
authorswithroles_txt_mv	Rojjanapinun, Akarapan @@aut@@ Pagsuyoin, Sheree A. @@aut@@ Perman, Jason @@aut@@ Sun, Hongwei @@aut@@
publishDateDaySort_date	2021-01-01T00:00:00Z
hierarchy_top_id	320530280
dewey-sort	3540
id	ELV006683347
language_de	englisch
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author	Rojjanapinun, Akarapan
spellingShingle	Rojjanapinun, Akarapan ddc 540 bkl 51.30 misc Isoporous nanomembranes misc Nanosphere lithography misc Soft lithography misc Nanoparticle monolayer Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography
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topic_title	540 DE-600 51.30 bkl Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography Isoporous nanomembranes Nanosphere lithography Soft lithography Nanoparticle monolayer
topic	ddc 540 bkl 51.30 misc Isoporous nanomembranes misc Nanosphere lithography misc Soft lithography misc Nanoparticle monolayer
topic_unstemmed	ddc 540 bkl 51.30 misc Isoporous nanomembranes misc Nanosphere lithography misc Soft lithography misc Nanoparticle monolayer
topic_browse	ddc 540 bkl 51.30 misc Isoporous nanomembranes misc Nanosphere lithography misc Soft lithography misc Nanoparticle monolayer
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title	Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography
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title_full	Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography
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author_browse	Rojjanapinun, Akarapan Pagsuyoin, Sheree A. Perman, Jason Sun, Hongwei
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title_sort	low-cost nanofabrication of isoporous nanomembranes using hybrid lithography
title_auth	Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography
abstract	This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end and cross-flow filtration. Our tests demonstrate that 90–100% rejection rates could be achieved in these membranes for perfluorooctanoic acid, sulfamethoxazole, bovine serum albumin, and SARS-COV-2 in high-concentration aqueous solutions. The membranes are nominally 50 μm thick and retain structural integrity, exhibiting high tensile strengths of 8.56 MPa and 8.31 MPa, respectively, due to improved routes to β crystalline formations of the PVDF. Our useful fabrication procedure is compatible with developed technologies that can quickly expand the opportunities of isoporous PVDF for processing of advanced materials and devices.
abstractGer	This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end and cross-flow filtration. Our tests demonstrate that 90–100% rejection rates could be achieved in these membranes for perfluorooctanoic acid, sulfamethoxazole, bovine serum albumin, and SARS-COV-2 in high-concentration aqueous solutions. The membranes are nominally 50 μm thick and retain structural integrity, exhibiting high tensile strengths of 8.56 MPa and 8.31 MPa, respectively, due to improved routes to β crystalline formations of the PVDF. Our useful fabrication procedure is compatible with developed technologies that can quickly expand the opportunities of isoporous PVDF for processing of advanced materials and devices.
abstract_unstemmed	This work demonstrates an improved route to develop low-cost and robust isoporous polyvinylidene fluoride (PVDF) nanomembranes for industrial separation and purifications processes. The 4-step process excels at making uniform 100 nm and 20 nm pore membranes that exhibit high flux in both dead-end and cross-flow filtration. Our tests demonstrate that 90–100% rejection rates could be achieved in these membranes for perfluorooctanoic acid, sulfamethoxazole, bovine serum albumin, and SARS-COV-2 in high-concentration aqueous solutions. The membranes are nominally 50 μm thick and retain structural integrity, exhibiting high tensile strengths of 8.56 MPa and 8.31 MPa, respectively, due to improved routes to β crystalline formations of the PVDF. Our useful fabrication procedure is compatible with developed technologies that can quickly expand the opportunities of isoporous PVDF for processing of advanced materials and devices.
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title_short	Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography
remote_bool	true
author2	Pagsuyoin, Sheree A. Perman, Jason Sun, Hongwei
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doi_str	10.1016/j.polymertesting.2021.107316
up_date	2024-07-06T22:12:42.506Z
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Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography

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