Effect of impurities of Fe
The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the ini...
Ausführliche Beschreibung
Autor*in: |
Tian, Xuekun [verfasserIn] Su, Kai [verfasserIn] Ouyang, Deze [verfasserIn] Gao, Jinxing [verfasserIn] Jia, Quanli [verfasserIn] Liu, Xinhong [verfasserIn] |
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E-Artikel |
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Sprache: |
Englisch |
Erschienen: |
2022 |
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Schlagwörter: |
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Übergeordnetes Werk: |
Enthalten in: Corrosion science - Amsterdam [u.a.] : Elsevier Science, 1961, 203 |
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Übergeordnetes Werk: |
volume:203 |
DOI / URN: |
10.1016/j.corsci.2022.110374 |
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Katalog-ID: |
ELV007939930 |
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520 | |a The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. | ||
650 | 4 | |a β-SiAlON | |
650 | 4 | |a Impurities | |
650 | 4 | |a Oxidation kinetics | |
650 | 4 | |a Oxidation rate | |
650 | 4 | |a SEM | |
700 | 1 | |a Su, Kai |e verfasserin |4 aut | |
700 | 1 | |a Ouyang, Deze |e verfasserin |4 aut | |
700 | 1 | |a Gao, Jinxing |e verfasserin |4 aut | |
700 | 1 | |a Jia, Quanli |e verfasserin |4 aut | |
700 | 1 | |a Liu, Xinhong |e verfasserin |4 aut | |
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2022 |
allfields |
10.1016/j.corsci.2022.110374 doi (DE-627)ELV007939930 (ELSEVIER)S0010-938X(22)00292-X DE-627 ger DE-627 rda eng 670 DE-600 51.24 bkl Tian, Xuekun verfasserin aut Effect of impurities of Fe 2022 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. β-SiAlON Impurities Oxidation kinetics Oxidation rate SEM Su, Kai verfasserin aut Ouyang, Deze verfasserin aut Gao, Jinxing verfasserin aut Jia, Quanli verfasserin aut Liu, Xinhong verfasserin aut Enthalten in Corrosion science Amsterdam [u.a.] : Elsevier Science, 1961 203 Online-Ressource (DE-627)306660350 (DE-600)1500558-6 (DE-576)094531277 nnns volume:203 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2008 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 51.24 Korrosion AR 203 |
spelling |
10.1016/j.corsci.2022.110374 doi (DE-627)ELV007939930 (ELSEVIER)S0010-938X(22)00292-X DE-627 ger DE-627 rda eng 670 DE-600 51.24 bkl Tian, Xuekun verfasserin aut Effect of impurities of Fe 2022 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. β-SiAlON Impurities Oxidation kinetics Oxidation rate SEM Su, Kai verfasserin aut Ouyang, Deze verfasserin aut Gao, Jinxing verfasserin aut Jia, Quanli verfasserin aut Liu, Xinhong verfasserin aut Enthalten in Corrosion science Amsterdam [u.a.] : Elsevier Science, 1961 203 Online-Ressource (DE-627)306660350 (DE-600)1500558-6 (DE-576)094531277 nnns volume:203 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2008 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 51.24 Korrosion AR 203 |
allfields_unstemmed |
10.1016/j.corsci.2022.110374 doi (DE-627)ELV007939930 (ELSEVIER)S0010-938X(22)00292-X DE-627 ger DE-627 rda eng 670 DE-600 51.24 bkl Tian, Xuekun verfasserin aut Effect of impurities of Fe 2022 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. β-SiAlON Impurities Oxidation kinetics Oxidation rate SEM Su, Kai verfasserin aut Ouyang, Deze verfasserin aut Gao, Jinxing verfasserin aut Jia, Quanli verfasserin aut Liu, Xinhong verfasserin aut Enthalten in Corrosion science Amsterdam [u.a.] : Elsevier Science, 1961 203 Online-Ressource (DE-627)306660350 (DE-600)1500558-6 (DE-576)094531277 nnns volume:203 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2008 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 51.24 Korrosion AR 203 |
allfieldsGer |
10.1016/j.corsci.2022.110374 doi (DE-627)ELV007939930 (ELSEVIER)S0010-938X(22)00292-X DE-627 ger DE-627 rda eng 670 DE-600 51.24 bkl Tian, Xuekun verfasserin aut Effect of impurities of Fe 2022 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. β-SiAlON Impurities Oxidation kinetics Oxidation rate SEM Su, Kai verfasserin aut Ouyang, Deze verfasserin aut Gao, Jinxing verfasserin aut Jia, Quanli verfasserin aut Liu, Xinhong verfasserin aut Enthalten in Corrosion science Amsterdam [u.a.] : Elsevier Science, 1961 203 Online-Ressource (DE-627)306660350 (DE-600)1500558-6 (DE-576)094531277 nnns volume:203 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2008 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 51.24 Korrosion AR 203 |
allfieldsSound |
10.1016/j.corsci.2022.110374 doi (DE-627)ELV007939930 (ELSEVIER)S0010-938X(22)00292-X DE-627 ger DE-627 rda eng 670 DE-600 51.24 bkl Tian, Xuekun verfasserin aut Effect of impurities of Fe 2022 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. β-SiAlON Impurities Oxidation kinetics Oxidation rate SEM Su, Kai verfasserin aut Ouyang, Deze verfasserin aut Gao, Jinxing verfasserin aut Jia, Quanli verfasserin aut Liu, Xinhong verfasserin aut Enthalten in Corrosion science Amsterdam [u.a.] : Elsevier Science, 1961 203 Online-Ressource (DE-627)306660350 (DE-600)1500558-6 (DE-576)094531277 nnns volume:203 GBV_USEFLAG_U SYSFLAG_U GBV_ELV GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_224 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2008 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2038 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2088 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2118 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4338 GBV_ILN_4393 51.24 Korrosion AR 203 |
language |
English |
source |
Enthalten in Corrosion science 203 volume:203 |
sourceStr |
Enthalten in Corrosion science 203 volume:203 |
format_phy_str_mv |
Article |
bklname |
Korrosion |
institution |
findex.gbv.de |
topic_facet |
β-SiAlON Impurities Oxidation kinetics Oxidation rate SEM |
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Tian, Xuekun @@aut@@ Su, Kai @@aut@@ Ouyang, Deze @@aut@@ Gao, Jinxing @@aut@@ Jia, Quanli @@aut@@ Liu, Xinhong @@aut@@ |
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2022-01-01T00:00:00Z |
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Effect of impurities of Fe |
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Effect of impurities of Fe |
abstract |
The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. |
abstractGer |
The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. |
abstract_unstemmed |
The oxidation kinetics of β-SiAlON with and without impurities synthesized using α-Al2O3, Si, Al, Fe2O3 or TiO2 powders at 1573 K in microwave sintering furnace, were investigated. The initial oxidation temperature of β-SiAlON with impurities was lower than that sample without impurities. In the initial oxidation stage at 1373–1473 K, the lattice deformation accelerated oxidation rate of β-SiAlON with impurities. However, in the final oxidation stage, the oxidation rate of β-SiAlON with impurities was much lower than that of reference sample, because impurities promote glass film formation on surface of β-SiAlON particles, reducing the chance of β-SiAlON reacting with O2. |
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