Patterned dielectric mirrors for uniformly high reflection in polarized light

Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and in...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	George, Linu [verfasserIn] Kumar, Govind [verfasserIn] Haldar, Arpita [verfasserIn] Vijaya, R. [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2023

Schlagwörter:	Dielectric mirrors Patterned surfaces Polarization-dependent reflection

Übergeordnetes Werk:	Enthalten in: Thin solid films - Amsterdam [u.a.] : Elsevier, 1967, 776
Übergeordnetes Werk:	volume:776

DOI / URN:	10.1016/j.tsf.2023.139886

Katalog-ID:	ELV009953094

Internformat


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520			\|a Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence.
650		4	\|a Dielectric mirrors
650		4	\|a Patterned surfaces
650		4	\|a Polarization-dependent reflection
700	1		\|a Kumar, Govind \|e verfasserin \|4 aut
700	1		\|a Haldar, Arpita \|e verfasserin \|4 aut
700	1		\|a Vijaya, R. \|e verfasserin \|0 (orcid)0000-0001-8628-4582 \|4 aut
773	0	8	\|i Enthalten in \|t Thin solid films \|d Amsterdam [u.a.] : Elsevier, 1967 \|g 776 \|h Online-Ressource \|w (DE-627)300593503 \|w (DE-600)1482896-0 \|w (DE-576)079165354 \|7 nnns
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912			\|a GBV_ILN_31
912			\|a GBV_ILN_32
912			\|a GBV_ILN_40
912			\|a GBV_ILN_60
912			\|a GBV_ILN_62
912			\|a GBV_ILN_65
912			\|a GBV_ILN_69
912			\|a GBV_ILN_70
912			\|a GBV_ILN_73
912			\|a GBV_ILN_74
912			\|a GBV_ILN_90
912			\|a GBV_ILN_95
912			\|a GBV_ILN_100
912			\|a GBV_ILN_105
912			\|a GBV_ILN_110
912			\|a GBV_ILN_150
912			\|a GBV_ILN_151
912			\|a GBV_ILN_187
912			\|a GBV_ILN_213
912			\|a GBV_ILN_224
912			\|a GBV_ILN_230
912			\|a GBV_ILN_370
912			\|a GBV_ILN_602
912			\|a GBV_ILN_702
912			\|a GBV_ILN_2001
912			\|a GBV_ILN_2003
912			\|a GBV_ILN_2004
912			\|a GBV_ILN_2005
912			\|a GBV_ILN_2007
912			\|a GBV_ILN_2008
912			\|a GBV_ILN_2009
912			\|a GBV_ILN_2010
912			\|a GBV_ILN_2011
912			\|a GBV_ILN_2014
912			\|a GBV_ILN_2015
912			\|a GBV_ILN_2020
912			\|a GBV_ILN_2021
912			\|a GBV_ILN_2025
912			\|a GBV_ILN_2026
912			\|a GBV_ILN_2027
912			\|a GBV_ILN_2034
912			\|a GBV_ILN_2044
912			\|a GBV_ILN_2048
912			\|a GBV_ILN_2049
912			\|a GBV_ILN_2050
912			\|a GBV_ILN_2055
912			\|a GBV_ILN_2056
912			\|a GBV_ILN_2059
912			\|a GBV_ILN_2061
912			\|a GBV_ILN_2064
912			\|a GBV_ILN_2088
912			\|a GBV_ILN_2106
912			\|a GBV_ILN_2110
912			\|a GBV_ILN_2111
912			\|a GBV_ILN_2112
912			\|a GBV_ILN_2122
912			\|a GBV_ILN_2129
912			\|a GBV_ILN_2143
912			\|a GBV_ILN_2152
912			\|a GBV_ILN_2153
912			\|a GBV_ILN_2190
912			\|a GBV_ILN_2232
912			\|a GBV_ILN_2336
912			\|a GBV_ILN_2470
912			\|a GBV_ILN_2507
912			\|a GBV_ILN_4035
912			\|a GBV_ILN_4037
912			\|a GBV_ILN_4112
912			\|a GBV_ILN_4125
912			\|a GBV_ILN_4242
912			\|a GBV_ILN_4249
912			\|a GBV_ILN_4251
912			\|a GBV_ILN_4305
912			\|a GBV_ILN_4306
912			\|a GBV_ILN_4307
912			\|a GBV_ILN_4313
912			\|a GBV_ILN_4322
912			\|a GBV_ILN_4323
912			\|a GBV_ILN_4324
912			\|a GBV_ILN_4325
912			\|a GBV_ILN_4326
912			\|a GBV_ILN_4333
912			\|a GBV_ILN_4334
912			\|a GBV_ILN_4338
912			\|a GBV_ILN_4393
912			\|a GBV_ILN_4700
936	b	k	\|a 33.68 \|j Oberflächen \|j Dünne Schichten \|j Grenzflächen \|x Physik \|q VZ
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Indexfelder

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matchkey_str	georgelinukumargovindhaldararpitavijayar:2023----:atredeetimrosouiomyihelci
hierarchy_sort_str	2023
bklnumber	33.68
publishDate	2023
allfields	10.1016/j.tsf.2023.139886 doi (DE-627)ELV009953094 (ELSEVIER)S0040-6090(23)00216-X DE-627 ger DE-627 rda eng 070 660 VZ 33.68 bkl George, Linu verfasserin (orcid)0000-0001-6297-1484 aut Patterned dielectric mirrors for uniformly high reflection in polarized light 2023 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence. Dielectric mirrors Patterned surfaces Polarization-dependent reflection Kumar, Govind verfasserin aut Haldar, Arpita verfasserin aut Vijaya, R. verfasserin (orcid)0000-0001-8628-4582 aut Enthalten in Thin solid films Amsterdam [u.a.] : Elsevier, 1967 776 Online-Ressource (DE-627)300593503 (DE-600)1482896-0 (DE-576)079165354 nnns volume:776 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA SSG-OPC-BBI GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.68 Oberflächen Dünne Schichten Grenzflächen Physik VZ AR 776
spelling	10.1016/j.tsf.2023.139886 doi (DE-627)ELV009953094 (ELSEVIER)S0040-6090(23)00216-X DE-627 ger DE-627 rda eng 070 660 VZ 33.68 bkl George, Linu verfasserin (orcid)0000-0001-6297-1484 aut Patterned dielectric mirrors for uniformly high reflection in polarized light 2023 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence. Dielectric mirrors Patterned surfaces Polarization-dependent reflection Kumar, Govind verfasserin aut Haldar, Arpita verfasserin aut Vijaya, R. verfasserin (orcid)0000-0001-8628-4582 aut Enthalten in Thin solid films Amsterdam [u.a.] : Elsevier, 1967 776 Online-Ressource (DE-627)300593503 (DE-600)1482896-0 (DE-576)079165354 nnns volume:776 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA SSG-OPC-BBI GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.68 Oberflächen Dünne Schichten Grenzflächen Physik VZ AR 776
allfields_unstemmed	10.1016/j.tsf.2023.139886 doi (DE-627)ELV009953094 (ELSEVIER)S0040-6090(23)00216-X DE-627 ger DE-627 rda eng 070 660 VZ 33.68 bkl George, Linu verfasserin (orcid)0000-0001-6297-1484 aut Patterned dielectric mirrors for uniformly high reflection in polarized light 2023 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence. Dielectric mirrors Patterned surfaces Polarization-dependent reflection Kumar, Govind verfasserin aut Haldar, Arpita verfasserin aut Vijaya, R. verfasserin (orcid)0000-0001-8628-4582 aut Enthalten in Thin solid films Amsterdam [u.a.] : Elsevier, 1967 776 Online-Ressource (DE-627)300593503 (DE-600)1482896-0 (DE-576)079165354 nnns volume:776 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA SSG-OPC-BBI GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.68 Oberflächen Dünne Schichten Grenzflächen Physik VZ AR 776
allfieldsGer	10.1016/j.tsf.2023.139886 doi (DE-627)ELV009953094 (ELSEVIER)S0040-6090(23)00216-X DE-627 ger DE-627 rda eng 070 660 VZ 33.68 bkl George, Linu verfasserin (orcid)0000-0001-6297-1484 aut Patterned dielectric mirrors for uniformly high reflection in polarized light 2023 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence. Dielectric mirrors Patterned surfaces Polarization-dependent reflection Kumar, Govind verfasserin aut Haldar, Arpita verfasserin aut Vijaya, R. verfasserin (orcid)0000-0001-8628-4582 aut Enthalten in Thin solid films Amsterdam [u.a.] : Elsevier, 1967 776 Online-Ressource (DE-627)300593503 (DE-600)1482896-0 (DE-576)079165354 nnns volume:776 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA SSG-OPC-BBI GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.68 Oberflächen Dünne Schichten Grenzflächen Physik VZ AR 776
allfieldsSound	10.1016/j.tsf.2023.139886 doi (DE-627)ELV009953094 (ELSEVIER)S0040-6090(23)00216-X DE-627 ger DE-627 rda eng 070 660 VZ 33.68 bkl George, Linu verfasserin (orcid)0000-0001-6297-1484 aut Patterned dielectric mirrors for uniformly high reflection in polarized light 2023 nicht spezifiziert zzz rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence. Dielectric mirrors Patterned surfaces Polarization-dependent reflection Kumar, Govind verfasserin aut Haldar, Arpita verfasserin aut Vijaya, R. verfasserin (orcid)0000-0001-8628-4582 aut Enthalten in Thin solid films Amsterdam [u.a.] : Elsevier, 1967 776 Online-Ressource (DE-627)300593503 (DE-600)1482896-0 (DE-576)079165354 nnns volume:776 GBV_USEFLAG_U SYSFLAG_U GBV_ELV SSG-OLC-PHA SSG-OPC-BBI GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_150 GBV_ILN_151 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_370 GBV_ILN_602 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2034 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2088 GBV_ILN_2106 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2470 GBV_ILN_2507 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.68 Oberflächen Dünne Schichten Grenzflächen Physik VZ AR 776
language	English
source	Enthalten in Thin solid films 776 volume:776
sourceStr	Enthalten in Thin solid films 776 volume:776
format_phy_str_mv	Article
bklname	Oberflächen Dünne Schichten Grenzflächen
institution	findex.gbv.de
topic_facet	Dielectric mirrors Patterned surfaces Polarization-dependent reflection
dewey-raw	070
isfreeaccess_bool	false
container_title	Thin solid films
authorswithroles_txt_mv	George, Linu @@aut@@ Kumar, Govind @@aut@@ Haldar, Arpita @@aut@@ Vijaya, R. @@aut@@
publishDateDaySort_date	2023-01-01T00:00:00Z
hierarchy_top_id	300593503
dewey-sort	270
id	ELV009953094
language_de	englisch
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author	George, Linu
spellingShingle	George, Linu ddc 070 bkl 33.68 misc Dielectric mirrors misc Patterned surfaces misc Polarization-dependent reflection Patterned dielectric mirrors for uniformly high reflection in polarized light
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topic_title	070 660 VZ 33.68 bkl Patterned dielectric mirrors for uniformly high reflection in polarized light Dielectric mirrors Patterned surfaces Polarization-dependent reflection
topic	ddc 070 bkl 33.68 misc Dielectric mirrors misc Patterned surfaces misc Polarization-dependent reflection
topic_unstemmed	ddc 070 bkl 33.68 misc Dielectric mirrors misc Patterned surfaces misc Polarization-dependent reflection
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title	Patterned dielectric mirrors for uniformly high reflection in polarized light
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title_full	Patterned dielectric mirrors for uniformly high reflection in polarized light
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title_sort	patterned dielectric mirrors for uniformly high reflection in polarized light
title_auth	Patterned dielectric mirrors for uniformly high reflection in polarized light
abstract	Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence.
abstractGer	Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence.
abstract_unstemmed	Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence.
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title_short	Patterned dielectric mirrors for uniformly high reflection in polarized light
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up_date	2024-07-07T00:55:00.037Z
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Patterned dielectric mirrors for uniformly high reflection in polarized light

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