High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers
In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition wa...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Ali, Kamran [verfasserIn] |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2014transfer abstract |
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| Schlagwörter: |
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| Umfang: |
5 |
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| Übergeordnetes Werk: |
Enthalten in: New associations and host status: Infestability of kiwifruit by the fruit fly species - Follett, Peter A. ELSEVIER, 2018, an interdisciplinary journal affiliated with the Materials Research Society and the Materials Society Japan, devoted to the rapid publication of short communications on the science, applications and processing of materials, New York, NY [u.a.] |
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| Übergeordnetes Werk: |
volume:136 ; year:2014 ; day:1 ; month:12 ; pages:90-94 ; extent:5 |
| Links: |
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| DOI / URN: |
10.1016/j.matlet.2014.07.186 |
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ELV012151394 |
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| 245 | 1 | 0 | |a High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers |
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| 520 | |a In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. | ||
| 520 | |a In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. | ||
| 650 | 7 | |a Roll-to-roll atomic layer deposition |2 Elsevier | |
| 650 | 7 | |a Al2O3 |2 Elsevier | |
| 650 | 7 | |a Barrier |2 Elsevier | |
| 650 | 7 | |a PET |2 Elsevier | |
| 650 | 7 | |a Atmospheric |2 Elsevier | |
| 700 | 1 | |a Choi, Kyung-Hyun |4 oth | |
| 700 | 1 | |a Jo, Jeongdai |4 oth | |
| 700 | 1 | |a Lee, Yun Woo |4 oth | |
| 773 | 0 | 8 | |i Enthalten in |n Elsevier |a Follett, Peter A. ELSEVIER |t New associations and host status: Infestability of kiwifruit by the fruit fly species |d 2018 |d an interdisciplinary journal affiliated with the Materials Research Society and the Materials Society Japan, devoted to the rapid publication of short communications on the science, applications and processing of materials |g New York, NY [u.a.] |w (DE-627)ELV000885371 |
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10.1016/j.matlet.2014.07.186 doi GBVA2014006000004.pica (DE-627)ELV012151394 (ELSEVIER)S0167-577X(14)01458-X DE-627 ger DE-627 rakwb eng 530 600 670 530 DE-600 600 DE-600 670 DE-600 630 580 VZ BIODIV DE-30 fid 48.00 bkl Ali, Kamran verfasserin aut High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers 2014transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. Roll-to-roll atomic layer deposition Elsevier Al2O3 Elsevier Barrier Elsevier PET Elsevier Atmospheric Elsevier Choi, Kyung-Hyun oth Jo, Jeongdai oth Lee, Yun Woo oth Enthalten in Elsevier Follett, Peter A. ELSEVIER New associations and host status: Infestability of kiwifruit by the fruit fly species 2018 an interdisciplinary journal affiliated with the Materials Research Society and the Materials Society Japan, devoted to the rapid publication of short communications on the science, applications and processing of materials New York, NY [u.a.] (DE-627)ELV000885371 volume:136 year:2014 day:1 month:12 pages:90-94 extent:5 https://doi.org/10.1016/j.matlet.2014.07.186 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U FID-BIODIV SSG-OLC-PHA SSG-OPC-FOR 48.00 Land- und Forstwirtschaft: Allgemeines VZ AR 136 2014 1 1201 90-94 5 045F 530 |
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10.1016/j.matlet.2014.07.186 doi GBVA2014006000004.pica (DE-627)ELV012151394 (ELSEVIER)S0167-577X(14)01458-X DE-627 ger DE-627 rakwb eng 530 600 670 530 DE-600 600 DE-600 670 DE-600 630 580 VZ BIODIV DE-30 fid 48.00 bkl Ali, Kamran verfasserin aut High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers 2014transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. Roll-to-roll atomic layer deposition Elsevier Al2O3 Elsevier Barrier Elsevier PET Elsevier Atmospheric Elsevier Choi, Kyung-Hyun oth Jo, Jeongdai oth Lee, Yun Woo oth Enthalten in Elsevier Follett, Peter A. ELSEVIER New associations and host status: Infestability of kiwifruit by the fruit fly species 2018 an interdisciplinary journal affiliated with the Materials Research Society and the Materials Society Japan, devoted to the rapid publication of short communications on the science, applications and processing of materials New York, NY [u.a.] (DE-627)ELV000885371 volume:136 year:2014 day:1 month:12 pages:90-94 extent:5 https://doi.org/10.1016/j.matlet.2014.07.186 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U FID-BIODIV SSG-OLC-PHA SSG-OPC-FOR 48.00 Land- und Forstwirtschaft: Allgemeines VZ AR 136 2014 1 1201 90-94 5 045F 530 |
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10.1016/j.matlet.2014.07.186 doi GBVA2014006000004.pica (DE-627)ELV012151394 (ELSEVIER)S0167-577X(14)01458-X DE-627 ger DE-627 rakwb eng 530 600 670 530 DE-600 600 DE-600 670 DE-600 630 580 VZ BIODIV DE-30 fid 48.00 bkl Ali, Kamran verfasserin aut High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers 2014transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. Roll-to-roll atomic layer deposition Elsevier Al2O3 Elsevier Barrier Elsevier PET Elsevier Atmospheric Elsevier Choi, Kyung-Hyun oth Jo, Jeongdai oth Lee, Yun Woo oth Enthalten in Elsevier Follett, Peter A. ELSEVIER New associations and host status: Infestability of kiwifruit by the fruit fly species 2018 an interdisciplinary journal affiliated with the Materials Research Society and the Materials Society Japan, devoted to the rapid publication of short communications on the science, applications and processing of materials New York, NY [u.a.] (DE-627)ELV000885371 volume:136 year:2014 day:1 month:12 pages:90-94 extent:5 https://doi.org/10.1016/j.matlet.2014.07.186 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U FID-BIODIV SSG-OLC-PHA SSG-OPC-FOR 48.00 Land- und Forstwirtschaft: Allgemeines VZ AR 136 2014 1 1201 90-94 5 045F 530 |
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10.1016/j.matlet.2014.07.186 doi GBVA2014006000004.pica (DE-627)ELV012151394 (ELSEVIER)S0167-577X(14)01458-X DE-627 ger DE-627 rakwb eng 530 600 670 530 DE-600 600 DE-600 670 DE-600 630 580 VZ BIODIV DE-30 fid 48.00 bkl Ali, Kamran verfasserin aut High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers 2014transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. Roll-to-roll atomic layer deposition Elsevier Al2O3 Elsevier Barrier Elsevier PET Elsevier Atmospheric Elsevier Choi, Kyung-Hyun oth Jo, Jeongdai oth Lee, Yun Woo oth Enthalten in Elsevier Follett, Peter A. ELSEVIER New associations and host status: Infestability of kiwifruit by the fruit fly species 2018 an interdisciplinary journal affiliated with the Materials Research Society and the Materials Society Japan, devoted to the rapid publication of short communications on the science, applications and processing of materials New York, NY [u.a.] (DE-627)ELV000885371 volume:136 year:2014 day:1 month:12 pages:90-94 extent:5 https://doi.org/10.1016/j.matlet.2014.07.186 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U FID-BIODIV SSG-OLC-PHA SSG-OPC-FOR 48.00 Land- und Forstwirtschaft: Allgemeines VZ AR 136 2014 1 1201 90-94 5 045F 530 |
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10.1016/j.matlet.2014.07.186 doi GBVA2014006000004.pica (DE-627)ELV012151394 (ELSEVIER)S0167-577X(14)01458-X DE-627 ger DE-627 rakwb eng 530 600 670 530 DE-600 600 DE-600 670 DE-600 630 580 VZ BIODIV DE-30 fid 48.00 bkl Ali, Kamran verfasserin aut High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers 2014transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. Roll-to-roll atomic layer deposition Elsevier Al2O3 Elsevier Barrier Elsevier PET Elsevier Atmospheric Elsevier Choi, Kyung-Hyun oth Jo, Jeongdai oth Lee, Yun Woo oth Enthalten in Elsevier Follett, Peter A. ELSEVIER New associations and host status: Infestability of kiwifruit by the fruit fly species 2018 an interdisciplinary journal affiliated with the Materials Research Society and the Materials Society Japan, devoted to the rapid publication of short communications on the science, applications and processing of materials New York, NY [u.a.] (DE-627)ELV000885371 volume:136 year:2014 day:1 month:12 pages:90-94 extent:5 https://doi.org/10.1016/j.matlet.2014.07.186 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U FID-BIODIV SSG-OLC-PHA SSG-OPC-FOR 48.00 Land- und Forstwirtschaft: Allgemeines VZ AR 136 2014 1 1201 90-94 5 045F 530 |
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high rate roll-to-roll atmospheric atomic layer deposition of al2o3 thin films towards gas diffusion barriers on polymers |
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High rate roll-to-roll atmospheric atomic layer deposition of Al2O3 thin films towards gas diffusion barriers on polymers |
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In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. |
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In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. |
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In this study, Al2O3 thin films fabricated through a novel technique of roll-to-roll atmospheric atomic layer deposition (R2R-AALD) using a multiple slit gas source head have been tested as low permeability gas diffusion barriers on polyethylene terephthalate (PET) substrate. The Al2O3 deposition was carried out at a very low temperature of 50°C under the working pressure of 740Torr, which is very close to the atmospheric pressure (760 Torr). Good morphological, chemical, and optical characteristics have been shown by the Al2O3 films produced at a large scale. The growth of Al2O3 films has been confirmed by X-ray photoelectron spectroscopy (XPS), indicating the peaks of Al 2p, Al 2s and O 1s at the binding energies of 74eV, 119eV and 531eV, respectively. On the basis of MOCON test instrument, water permeation values of the range ~10−3 g/m2/day at 37.8°C/100% relative humidity have been observed for Al2O3 films with a thickness of 15nm to 40nm. Al2O3 thin films with such low water permeability have not been reported before to be fabricated under near atmospheric pressure through any trend of roll-to-roll atomic layer deposition. |
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