Vertically aligned Si nanocrystals embedded in amorphous Si matrix prepared by inductively coupled plasma chemical vapor deposition (ICP-CVD)
• Inductively-coupled plasma is used for nanostructured silicon at room temperature. • Low temperature deposition allows device processing on various substrates. • Deposition pressure is the most effective parameter in controlling nanostructure. • Films consist of quantum dots in a-Si matrix and exh...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Nogay, G. [verfasserIn] |
|---|
| Format: |
E-Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
2015 |
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| Schlagwörter: |
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| Umfang: |
7 |
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| Übergeordnetes Werk: |
Enthalten in: The curiosity of educators from two cultural groups: Implications to professional development - Birenbaum, Menucha ELSEVIER, 2020, New York, NY [u.a.] |
|---|---|
| Übergeordnetes Werk: |
volume:196 ; year:2015 ; pages:28-34 ; extent:7 |
| Links: |
|---|
| DOI / URN: |
10.1016/j.mseb.2015.02.013 |
|---|
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ELV018658504 |
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