Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography
The hybrid cleaning process for UV cured resin removal.
Autor*in: |
Kim, Min-Su [verfasserIn] |
---|
Format: |
E-Artikel |
---|---|
Sprache: |
Englisch |
Erschienen: |
2014 |
---|
Schlagwörter: |
---|
Umfang: |
5 |
---|
Übergeordnetes Werk: |
Enthalten in: Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery - Souzanchi-K, M. ELSEVIER, 2021, [S.l.] |
---|---|
Übergeordnetes Werk: |
volume:114 ; year:2014 ; pages:126-130 ; extent:5 |
Links: |
---|
DOI / URN: |
10.1016/j.mee.2013.05.005 |
---|
Katalog-ID: |
ELV022447423 |
---|
LEADER | 01000caa a22002652 4500 | ||
---|---|---|---|
001 | ELV022447423 | ||
003 | DE-627 | ||
005 | 20230623163939.0 | ||
007 | cr uuu---uuuuu | ||
008 | 180603s2014 xx |||||o 00| ||eng c | ||
024 | 7 | |a 10.1016/j.mee.2013.05.005 |2 doi | |
028 | 5 | 2 | |a GBVA2014004000018.pica |
035 | |a (DE-627)ELV022447423 | ||
035 | |a (ELSEVIER)S0167-9317(13)00493-0 | ||
040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
041 | |a eng | ||
082 | 0 | |a 620 | |
082 | 0 | 4 | |a 620 |q DE-600 |
082 | 0 | 4 | |a 610 |a 570 |q VZ |
084 | |a 42.00 |2 bkl | ||
084 | |a 44.09 |2 bkl | ||
100 | 1 | |a Kim, Min-Su |e verfasserin |4 aut | |
245 | 1 | 0 | |a Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography |
264 | 1 | |c 2014 | |
300 | |a 5 | ||
336 | |a nicht spezifiziert |b zzz |2 rdacontent | ||
337 | |a nicht spezifiziert |b z |2 rdamedia | ||
338 | |a nicht spezifiziert |b zu |2 rdacarrier | ||
520 | |a The hybrid cleaning process for UV cured resin removal. | ||
650 | 7 | |a DIO3 cleaning |2 Elsevier | |
650 | 7 | |a UV/O3 pretreatment |2 Elsevier | |
650 | 7 | |a Megasonic |2 Elsevier | |
650 | 7 | |a UV-cured resin removal |2 Elsevier | |
700 | 1 | |a Kang, Bong-Kyun |4 oth | |
700 | 1 | |a Ramachandran, Manivannan |4 oth | |
700 | 1 | |a Kim, Jae-Kwan |4 oth | |
700 | 1 | |a Lee, Byung-Kyu |4 oth | |
700 | 1 | |a Park, Jin-Goo |4 oth | |
773 | 0 | 8 | |i Enthalten in |n Elsevier |a Souzanchi-K, M. ELSEVIER |t Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |d 2021 |g [S.l.] |w (DE-627)ELV00683695X |
773 | 1 | 8 | |g volume:114 |g year:2014 |g pages:126-130 |g extent:5 |
856 | 4 | 0 | |u https://doi.org/10.1016/j.mee.2013.05.005 |3 Volltext |
912 | |a GBV_USEFLAG_U | ||
912 | |a GBV_ELV | ||
912 | |a SYSFLAG_U | ||
912 | |a SSG-OLC-PHA | ||
936 | b | k | |a 42.00 |q VZ |
936 | b | k | |a 44.09 |j Medizintechnik |q VZ |
951 | |a AR | ||
952 | |d 114 |j 2014 |h 126-130 |g 5 | ||
953 | |2 045F |a 620 |
author_variant |
m s k msk |
---|---|
matchkey_str |
kimminsukangbongkyunramachandranmanivann:2014----:eoaoucrdeiuighbicennpoesonn |
hierarchy_sort_str |
2014 |
bklnumber |
42.00 44.09 |
publishDate |
2014 |
allfields |
10.1016/j.mee.2013.05.005 doi GBVA2014004000018.pica (DE-627)ELV022447423 (ELSEVIER)S0167-9317(13)00493-0 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Kim, Min-Su verfasserin aut Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography 2014 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The hybrid cleaning process for UV cured resin removal. DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal Elsevier Kang, Bong-Kyun oth Ramachandran, Manivannan oth Kim, Jae-Kwan oth Lee, Byung-Kyu oth Park, Jin-Goo oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:114 year:2014 pages:126-130 extent:5 https://doi.org/10.1016/j.mee.2013.05.005 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 114 2014 126-130 5 045F 620 |
spelling |
10.1016/j.mee.2013.05.005 doi GBVA2014004000018.pica (DE-627)ELV022447423 (ELSEVIER)S0167-9317(13)00493-0 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Kim, Min-Su verfasserin aut Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography 2014 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The hybrid cleaning process for UV cured resin removal. DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal Elsevier Kang, Bong-Kyun oth Ramachandran, Manivannan oth Kim, Jae-Kwan oth Lee, Byung-Kyu oth Park, Jin-Goo oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:114 year:2014 pages:126-130 extent:5 https://doi.org/10.1016/j.mee.2013.05.005 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 114 2014 126-130 5 045F 620 |
allfields_unstemmed |
10.1016/j.mee.2013.05.005 doi GBVA2014004000018.pica (DE-627)ELV022447423 (ELSEVIER)S0167-9317(13)00493-0 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Kim, Min-Su verfasserin aut Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography 2014 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The hybrid cleaning process for UV cured resin removal. DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal Elsevier Kang, Bong-Kyun oth Ramachandran, Manivannan oth Kim, Jae-Kwan oth Lee, Byung-Kyu oth Park, Jin-Goo oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:114 year:2014 pages:126-130 extent:5 https://doi.org/10.1016/j.mee.2013.05.005 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 114 2014 126-130 5 045F 620 |
allfieldsGer |
10.1016/j.mee.2013.05.005 doi GBVA2014004000018.pica (DE-627)ELV022447423 (ELSEVIER)S0167-9317(13)00493-0 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Kim, Min-Su verfasserin aut Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography 2014 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The hybrid cleaning process for UV cured resin removal. DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal Elsevier Kang, Bong-Kyun oth Ramachandran, Manivannan oth Kim, Jae-Kwan oth Lee, Byung-Kyu oth Park, Jin-Goo oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:114 year:2014 pages:126-130 extent:5 https://doi.org/10.1016/j.mee.2013.05.005 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 114 2014 126-130 5 045F 620 |
allfieldsSound |
10.1016/j.mee.2013.05.005 doi GBVA2014004000018.pica (DE-627)ELV022447423 (ELSEVIER)S0167-9317(13)00493-0 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Kim, Min-Su verfasserin aut Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography 2014 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The hybrid cleaning process for UV cured resin removal. DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal Elsevier Kang, Bong-Kyun oth Ramachandran, Manivannan oth Kim, Jae-Kwan oth Lee, Byung-Kyu oth Park, Jin-Goo oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:114 year:2014 pages:126-130 extent:5 https://doi.org/10.1016/j.mee.2013.05.005 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 114 2014 126-130 5 045F 620 |
language |
English |
source |
Enthalten in Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery [S.l.] volume:114 year:2014 pages:126-130 extent:5 |
sourceStr |
Enthalten in Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery [S.l.] volume:114 year:2014 pages:126-130 extent:5 |
format_phy_str_mv |
Article |
bklname |
Medizintechnik |
institution |
findex.gbv.de |
topic_facet |
DIO3 cleaning UV/O3 pretreatment Megasonic UV-cured resin removal |
dewey-raw |
620 |
isfreeaccess_bool |
false |
container_title |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
authorswithroles_txt_mv |
Kim, Min-Su @@aut@@ Kang, Bong-Kyun @@oth@@ Ramachandran, Manivannan @@oth@@ Kim, Jae-Kwan @@oth@@ Lee, Byung-Kyu @@oth@@ Park, Jin-Goo @@oth@@ |
publishDateDaySort_date |
2014-01-01T00:00:00Z |
hierarchy_top_id |
ELV00683695X |
dewey-sort |
3620 |
id |
ELV022447423 |
language_de |
englisch |
fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">ELV022447423</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230623163939.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">180603s2014 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1016/j.mee.2013.05.005</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">GBVA2014004000018.pica</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)ELV022447423</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ELSEVIER)S0167-9317(13)00493-0</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">620</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">610</subfield><subfield code="a">570</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">42.00</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">44.09</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Kim, Min-Su</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2014</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">5</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zzz</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">z</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zu</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">The hybrid cleaning process for UV cured resin removal.</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">DIO3 cleaning</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">UV/O3 pretreatment</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Megasonic</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">UV-cured resin removal</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kang, Bong-Kyun</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Ramachandran, Manivannan</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kim, Jae-Kwan</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Lee, Byung-Kyu</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Park, Jin-Goo</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="n">Elsevier</subfield><subfield code="a">Souzanchi-K, M. ELSEVIER</subfield><subfield code="t">Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery</subfield><subfield code="d">2021</subfield><subfield code="g">[S.l.] </subfield><subfield code="w">(DE-627)ELV00683695X</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:114</subfield><subfield code="g">year:2014</subfield><subfield code="g">pages:126-130</subfield><subfield code="g">extent:5</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1016/j.mee.2013.05.005</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ELV</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">42.00</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">44.09</subfield><subfield code="j">Medizintechnik</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">114</subfield><subfield code="j">2014</subfield><subfield code="h">126-130</subfield><subfield code="g">5</subfield></datafield><datafield tag="953" ind1=" " ind2=" "><subfield code="2">045F</subfield><subfield code="a">620</subfield></datafield></record></collection>
|
author |
Kim, Min-Su |
spellingShingle |
Kim, Min-Su ddc 620 ddc 610 bkl 42.00 bkl 44.09 Elsevier DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography |
authorStr |
Kim, Min-Su |
ppnlink_with_tag_str_mv |
@@773@@(DE-627)ELV00683695X |
format |
electronic Article |
dewey-ones |
620 - Engineering & allied operations 610 - Medicine & health 570 - Life sciences; biology |
delete_txt_mv |
keep |
author_role |
aut |
collection |
elsevier |
remote_str |
true |
illustrated |
Not Illustrated |
topic_title |
620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal Elsevier |
topic |
ddc 620 ddc 610 bkl 42.00 bkl 44.09 Elsevier DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal |
topic_unstemmed |
ddc 620 ddc 610 bkl 42.00 bkl 44.09 Elsevier DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal |
topic_browse |
ddc 620 ddc 610 bkl 42.00 bkl 44.09 Elsevier DIO3 cleaning Elsevier UV/O3 pretreatment Elsevier Megasonic Elsevier UV-cured resin removal |
format_facet |
Elektronische Aufsätze Aufsätze Elektronische Ressource |
format_main_str_mv |
Text Zeitschrift/Artikel |
carriertype_str_mv |
zu |
author2_variant |
b k k bkk m r mr j k k jkk b k l bkl j g p jgp |
hierarchy_parent_title |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
hierarchy_parent_id |
ELV00683695X |
dewey-tens |
620 - Engineering 610 - Medicine & health 570 - Life sciences; biology |
hierarchy_top_title |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
isfreeaccess_txt |
false |
familylinks_str_mv |
(DE-627)ELV00683695X |
title |
Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography |
ctrlnum |
(DE-627)ELV022447423 (ELSEVIER)S0167-9317(13)00493-0 |
title_full |
Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography |
author_sort |
Kim, Min-Su |
journal |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
journalStr |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
lang_code |
eng |
isOA_bool |
false |
dewey-hundreds |
600 - Technology 500 - Science |
recordtype |
marc |
publishDateSort |
2014 |
contenttype_str_mv |
zzz |
container_start_page |
126 |
author_browse |
Kim, Min-Su |
container_volume |
114 |
physical |
5 |
class |
620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl |
format_se |
Elektronische Aufsätze |
author-letter |
Kim, Min-Su |
doi_str_mv |
10.1016/j.mee.2013.05.005 |
dewey-full |
620 610 570 |
title_sort |
removal of uv-cured resin using a hybrid cleaning process for nanoimprint lithography |
title_auth |
Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography |
abstract |
The hybrid cleaning process for UV cured resin removal. |
abstractGer |
The hybrid cleaning process for UV cured resin removal. |
abstract_unstemmed |
The hybrid cleaning process for UV cured resin removal. |
collection_details |
GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA |
title_short |
Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography |
url |
https://doi.org/10.1016/j.mee.2013.05.005 |
remote_bool |
true |
author2 |
Kang, Bong-Kyun Ramachandran, Manivannan Kim, Jae-Kwan Lee, Byung-Kyu Park, Jin-Goo |
author2Str |
Kang, Bong-Kyun Ramachandran, Manivannan Kim, Jae-Kwan Lee, Byung-Kyu Park, Jin-Goo |
ppnlink |
ELV00683695X |
mediatype_str_mv |
z |
isOA_txt |
false |
hochschulschrift_bool |
false |
author2_role |
oth oth oth oth oth |
doi_str |
10.1016/j.mee.2013.05.005 |
up_date |
2024-07-06T22:00:55.478Z |
_version_ |
1803868706418196480 |
fullrecord_marcxml |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">ELV022447423</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230623163939.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">180603s2014 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1016/j.mee.2013.05.005</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">GBVA2014004000018.pica</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)ELV022447423</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ELSEVIER)S0167-9317(13)00493-0</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">620</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">610</subfield><subfield code="a">570</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">42.00</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">44.09</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Kim, Min-Su</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2014</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">5</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zzz</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">z</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zu</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">The hybrid cleaning process for UV cured resin removal.</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">DIO3 cleaning</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">UV/O3 pretreatment</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Megasonic</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">UV-cured resin removal</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kang, Bong-Kyun</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Ramachandran, Manivannan</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kim, Jae-Kwan</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Lee, Byung-Kyu</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Park, Jin-Goo</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="n">Elsevier</subfield><subfield code="a">Souzanchi-K, M. ELSEVIER</subfield><subfield code="t">Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery</subfield><subfield code="d">2021</subfield><subfield code="g">[S.l.] </subfield><subfield code="w">(DE-627)ELV00683695X</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:114</subfield><subfield code="g">year:2014</subfield><subfield code="g">pages:126-130</subfield><subfield code="g">extent:5</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1016/j.mee.2013.05.005</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ELV</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">42.00</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">44.09</subfield><subfield code="j">Medizintechnik</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">114</subfield><subfield code="j">2014</subfield><subfield code="h">126-130</subfield><subfield code="g">5</subfield></datafield><datafield tag="953" ind1=" " ind2=" "><subfield code="2">045F</subfield><subfield code="a">620</subfield></datafield></record></collection>
|
score |
7.4009123 |