Synthesis and applications of 18O standards for nuclear reaction analysis
A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed t...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Pitthan, E. [verfasserIn] |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2014transfer abstract |
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| Umfang: |
4 |
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| Übergeordnetes Werk: |
Enthalten in: Editorial Comment - Unwala, Darius J. ELSEVIER, 2013, a journal on accelerators, instrumentation and techniques applied to research in nuclear and atomic physics, materials science and related fields in physics, Amsterdam [u.a.] |
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| Übergeordnetes Werk: |
volume:332 ; year:2014 ; day:1 ; month:08 ; pages:56-59 ; extent:4 |
| Links: |
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| DOI / URN: |
10.1016/j.nimb.2014.02.029 |
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ELV027936198 |
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| 520 | |a A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. | ||
| 520 | |a A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. | ||
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10.1016/j.nimb.2014.02.029 doi GBVA2014005000027.pica (DE-627)ELV027936198 (ELSEVIER)S0168-583X(14)00286-9 DE-627 ger DE-627 rakwb eng 530 530 DE-600 610 VZ 610 VZ 44.85 bkl Pitthan, E. verfasserin aut Synthesis and applications of 18O standards for nuclear reaction analysis 2014transfer abstract 4 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. Nuclear reaction analysis Elsevier Oxygen Elsevier Silicon carbide Elsevier Standard sample Elsevier Germanium Elsevier Corrêa, S.A. oth Soares, G.V. oth Radtke, C. oth Stedile, F.C. oth Enthalten in Elsevier Unwala, Darius J. ELSEVIER Editorial Comment 2013 a journal on accelerators, instrumentation and techniques applied to research in nuclear and atomic physics, materials science and related fields in physics Amsterdam [u.a.] (DE-627)ELV011304669 volume:332 year:2014 day:1 month:08 pages:56-59 extent:4 https://doi.org/10.1016/j.nimb.2014.02.029 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA GBV_ILN_21 GBV_ILN_22 GBV_ILN_24 GBV_ILN_40 GBV_ILN_62 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 44.85 Kardiologie Angiologie VZ AR 332 2014 1 0801 56-59 4 045F 530 |
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10.1016/j.nimb.2014.02.029 doi GBVA2014005000027.pica (DE-627)ELV027936198 (ELSEVIER)S0168-583X(14)00286-9 DE-627 ger DE-627 rakwb eng 530 530 DE-600 610 VZ 610 VZ 44.85 bkl Pitthan, E. verfasserin aut Synthesis and applications of 18O standards for nuclear reaction analysis 2014transfer abstract 4 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. Nuclear reaction analysis Elsevier Oxygen Elsevier Silicon carbide Elsevier Standard sample Elsevier Germanium Elsevier Corrêa, S.A. oth Soares, G.V. oth Radtke, C. oth Stedile, F.C. oth Enthalten in Elsevier Unwala, Darius J. ELSEVIER Editorial Comment 2013 a journal on accelerators, instrumentation and techniques applied to research in nuclear and atomic physics, materials science and related fields in physics Amsterdam [u.a.] (DE-627)ELV011304669 volume:332 year:2014 day:1 month:08 pages:56-59 extent:4 https://doi.org/10.1016/j.nimb.2014.02.029 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA GBV_ILN_21 GBV_ILN_22 GBV_ILN_24 GBV_ILN_40 GBV_ILN_62 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 44.85 Kardiologie Angiologie VZ AR 332 2014 1 0801 56-59 4 045F 530 |
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10.1016/j.nimb.2014.02.029 doi GBVA2014005000027.pica (DE-627)ELV027936198 (ELSEVIER)S0168-583X(14)00286-9 DE-627 ger DE-627 rakwb eng 530 530 DE-600 610 VZ 610 VZ 44.85 bkl Pitthan, E. verfasserin aut Synthesis and applications of 18O standards for nuclear reaction analysis 2014transfer abstract 4 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. Nuclear reaction analysis Elsevier Oxygen Elsevier Silicon carbide Elsevier Standard sample Elsevier Germanium Elsevier Corrêa, S.A. oth Soares, G.V. oth Radtke, C. oth Stedile, F.C. oth Enthalten in Elsevier Unwala, Darius J. ELSEVIER Editorial Comment 2013 a journal on accelerators, instrumentation and techniques applied to research in nuclear and atomic physics, materials science and related fields in physics Amsterdam [u.a.] (DE-627)ELV011304669 volume:332 year:2014 day:1 month:08 pages:56-59 extent:4 https://doi.org/10.1016/j.nimb.2014.02.029 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA GBV_ILN_21 GBV_ILN_22 GBV_ILN_24 GBV_ILN_40 GBV_ILN_62 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 44.85 Kardiologie Angiologie VZ AR 332 2014 1 0801 56-59 4 045F 530 |
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10.1016/j.nimb.2014.02.029 doi GBVA2014005000027.pica (DE-627)ELV027936198 (ELSEVIER)S0168-583X(14)00286-9 DE-627 ger DE-627 rakwb eng 530 530 DE-600 610 VZ 610 VZ 44.85 bkl Pitthan, E. verfasserin aut Synthesis and applications of 18O standards for nuclear reaction analysis 2014transfer abstract 4 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. Nuclear reaction analysis Elsevier Oxygen Elsevier Silicon carbide Elsevier Standard sample Elsevier Germanium Elsevier Corrêa, S.A. oth Soares, G.V. oth Radtke, C. oth Stedile, F.C. oth Enthalten in Elsevier Unwala, Darius J. ELSEVIER Editorial Comment 2013 a journal on accelerators, instrumentation and techniques applied to research in nuclear and atomic physics, materials science and related fields in physics Amsterdam [u.a.] (DE-627)ELV011304669 volume:332 year:2014 day:1 month:08 pages:56-59 extent:4 https://doi.org/10.1016/j.nimb.2014.02.029 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA GBV_ILN_21 GBV_ILN_22 GBV_ILN_24 GBV_ILN_40 GBV_ILN_62 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 44.85 Kardiologie Angiologie VZ AR 332 2014 1 0801 56-59 4 045F 530 |
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10.1016/j.nimb.2014.02.029 doi GBVA2014005000027.pica (DE-627)ELV027936198 (ELSEVIER)S0168-583X(14)00286-9 DE-627 ger DE-627 rakwb eng 530 530 DE-600 610 VZ 610 VZ 44.85 bkl Pitthan, E. verfasserin aut Synthesis and applications of 18O standards for nuclear reaction analysis 2014transfer abstract 4 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. Nuclear reaction analysis Elsevier Oxygen Elsevier Silicon carbide Elsevier Standard sample Elsevier Germanium Elsevier Corrêa, S.A. oth Soares, G.V. oth Radtke, C. oth Stedile, F.C. oth Enthalten in Elsevier Unwala, Darius J. ELSEVIER Editorial Comment 2013 a journal on accelerators, instrumentation and techniques applied to research in nuclear and atomic physics, materials science and related fields in physics Amsterdam [u.a.] (DE-627)ELV011304669 volume:332 year:2014 day:1 month:08 pages:56-59 extent:4 https://doi.org/10.1016/j.nimb.2014.02.029 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA GBV_ILN_21 GBV_ILN_22 GBV_ILN_24 GBV_ILN_40 GBV_ILN_62 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2005 GBV_ILN_2007 44.85 Kardiologie Angiologie VZ AR 332 2014 1 0801 56-59 4 045F 530 |
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Synthesis and applications of 18O standards for nuclear reaction analysis |
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A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. |
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A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. |
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A new method to synthesize 18O standard samples to be used in nuclear reaction analyses is proposed and investigated. This method consists of obtaining a Si18O2 film on a Si substrate using a natural abundance SiO2 film as a passivation layer to prevent the isotopically enriched film to be exposed to the atmosphere and possibly degraded by it. For that, sequential oxidation steps are performed followed by a controlled etching in aqueous hydrofluoric acid. Details of these steps are discussed as well as the stability of the synthesized samples. Applications using these standard samples in the field of alternative semiconductors to Si (SiC and Ge), used in micro and nanoelectronics are also presented. |
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Synthesis and applications of 18O standards for nuclear reaction analysis |
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