High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution
Display Omitted
Gespeichert in:
| Autor*in: |
Okazaki, Shinji [verfasserIn] |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2015 |
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| Schlagwörter: |
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| Umfang: |
13 |
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| Übergeordnetes Werk: |
Enthalten in: Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery - Souzanchi-K, M. ELSEVIER, 2021, [S.l.] |
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| Übergeordnetes Werk: |
volume:133 ; year:2015 ; day:5 ; month:02 ; pages:23-35 ; extent:13 |
| Links: |
|---|
| DOI / URN: |
10.1016/j.mee.2014.11.015 |
|---|
| Katalog-ID: |
ELV034403736 |
|---|
| LEADER | 01000caa a22002652 4500 | ||
|---|---|---|---|
| 001 | ELV034403736 | ||
| 003 | DE-627 | ||
| 005 | 20230624013254.0 | ||
| 007 | cr uuu---uuuuu | ||
| 008 | 180603s2015 xx |||||o 00| ||eng c | ||
| 024 | 7 | |a 10.1016/j.mee.2014.11.015 |2 doi | |
| 028 | 5 | 2 | |a GBVA2015004000014.pica |
| 035 | |a (DE-627)ELV034403736 | ||
| 035 | |a (ELSEVIER)S0167-9317(14)00491-2 | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
| 041 | |a eng | ||
| 082 | 0 | |a 620 | |
| 082 | 0 | 4 | |a 620 |q DE-600 |
| 082 | 0 | 4 | |a 610 |a 570 |q VZ |
| 084 | |a 42.00 |2 bkl | ||
| 084 | |a 44.09 |2 bkl | ||
| 100 | 1 | |a Okazaki, Shinji |e verfasserin |4 aut | |
| 245 | 1 | 0 | |a High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution |
| 264 | 1 | |c 2015 | |
| 300 | |a 13 | ||
| 336 | |a nicht spezifiziert |b zzz |2 rdacontent | ||
| 337 | |a nicht spezifiziert |b z |2 rdamedia | ||
| 338 | |a nicht spezifiziert |b zu |2 rdacarrier | ||
| 520 | |a Display Omitted | ||
| 650 | 7 | |a Optical lithography |2 Elsevier | |
| 650 | 7 | |a Electron beam lithography |2 Elsevier | |
| 650 | 7 | |a Throughput |2 Elsevier | |
| 650 | 7 | |a Resolution enhancement technologies |2 Elsevier | |
| 650 | 7 | |a Multi-beams |2 Elsevier | |
| 773 | 0 | 8 | |i Enthalten in |n Elsevier |a Souzanchi-K, M. ELSEVIER |t Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |d 2021 |g [S.l.] |w (DE-627)ELV00683695X |
| 773 | 1 | 8 | |g volume:133 |g year:2015 |g day:5 |g month:02 |g pages:23-35 |g extent:13 |
| 856 | 4 | 0 | |u https://doi.org/10.1016/j.mee.2014.11.015 |3 Volltext |
| 912 | |a GBV_USEFLAG_U | ||
| 912 | |a GBV_ELV | ||
| 912 | |a SYSFLAG_U | ||
| 912 | |a SSG-OLC-PHA | ||
| 936 | b | k | |a 42.00 |q VZ |
| 936 | b | k | |a 44.09 |j Medizintechnik |q VZ |
| 951 | |a AR | ||
| 952 | |d 133 |j 2015 |b 5 |c 0205 |h 23-35 |g 13 | ||
| 953 | |2 045F |a 620 | ||
| author_variant |
s o so |
|---|---|
| matchkey_str |
okazakishinji:2015----:iheouinpialtorpyrihhogptlcrnemihgahteehiasrglfote |
| hierarchy_sort_str |
2015 |
| bklnumber |
42.00 44.09 |
| publishDate |
2015 |
| allfields |
10.1016/j.mee.2014.11.015 doi GBVA2015004000014.pica (DE-627)ELV034403736 (ELSEVIER)S0167-9317(14)00491-2 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Okazaki, Shinji verfasserin aut High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution 2015 13 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Display Omitted Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams Elsevier Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:133 year:2015 day:5 month:02 pages:23-35 extent:13 https://doi.org/10.1016/j.mee.2014.11.015 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 133 2015 5 0205 23-35 13 045F 620 |
| spelling |
10.1016/j.mee.2014.11.015 doi GBVA2015004000014.pica (DE-627)ELV034403736 (ELSEVIER)S0167-9317(14)00491-2 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Okazaki, Shinji verfasserin aut High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution 2015 13 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Display Omitted Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams Elsevier Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:133 year:2015 day:5 month:02 pages:23-35 extent:13 https://doi.org/10.1016/j.mee.2014.11.015 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 133 2015 5 0205 23-35 13 045F 620 |
| allfields_unstemmed |
10.1016/j.mee.2014.11.015 doi GBVA2015004000014.pica (DE-627)ELV034403736 (ELSEVIER)S0167-9317(14)00491-2 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Okazaki, Shinji verfasserin aut High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution 2015 13 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Display Omitted Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams Elsevier Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:133 year:2015 day:5 month:02 pages:23-35 extent:13 https://doi.org/10.1016/j.mee.2014.11.015 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 133 2015 5 0205 23-35 13 045F 620 |
| allfieldsGer |
10.1016/j.mee.2014.11.015 doi GBVA2015004000014.pica (DE-627)ELV034403736 (ELSEVIER)S0167-9317(14)00491-2 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Okazaki, Shinji verfasserin aut High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution 2015 13 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Display Omitted Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams Elsevier Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:133 year:2015 day:5 month:02 pages:23-35 extent:13 https://doi.org/10.1016/j.mee.2014.11.015 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 133 2015 5 0205 23-35 13 045F 620 |
| allfieldsSound |
10.1016/j.mee.2014.11.015 doi GBVA2015004000014.pica (DE-627)ELV034403736 (ELSEVIER)S0167-9317(14)00491-2 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Okazaki, Shinji verfasserin aut High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution 2015 13 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Display Omitted Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams Elsevier Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:133 year:2015 day:5 month:02 pages:23-35 extent:13 https://doi.org/10.1016/j.mee.2014.11.015 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 133 2015 5 0205 23-35 13 045F 620 |
| language |
English |
| source |
Enthalten in Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery [S.l.] volume:133 year:2015 day:5 month:02 pages:23-35 extent:13 |
| sourceStr |
Enthalten in Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery [S.l.] volume:133 year:2015 day:5 month:02 pages:23-35 extent:13 |
| format_phy_str_mv |
Article |
| bklname |
Medizintechnik |
| institution |
findex.gbv.de |
| topic_facet |
Optical lithography Electron beam lithography Throughput Resolution enhancement technologies Multi-beams |
| dewey-raw |
620 |
| isfreeaccess_bool |
false |
| container_title |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
| authorswithroles_txt_mv |
Okazaki, Shinji @@aut@@ |
| publishDateDaySort_date |
2015-01-05T00:00:00Z |
| hierarchy_top_id |
ELV00683695X |
| dewey-sort |
3620 |
| id |
ELV034403736 |
| language_de |
englisch |
| fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">ELV034403736</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230624013254.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">180603s2015 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1016/j.mee.2014.11.015</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">GBVA2015004000014.pica</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)ELV034403736</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ELSEVIER)S0167-9317(14)00491-2</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">620</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">610</subfield><subfield code="a">570</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">42.00</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">44.09</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Okazaki, Shinji</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2015</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">13</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zzz</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">z</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zu</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Display Omitted</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Optical lithography</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Electron beam lithography</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Throughput</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Resolution enhancement technologies</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Multi-beams</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="n">Elsevier</subfield><subfield code="a">Souzanchi-K, M. ELSEVIER</subfield><subfield code="t">Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery</subfield><subfield code="d">2021</subfield><subfield code="g">[S.l.] </subfield><subfield code="w">(DE-627)ELV00683695X</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:133</subfield><subfield code="g">year:2015</subfield><subfield code="g">day:5</subfield><subfield code="g">month:02</subfield><subfield code="g">pages:23-35</subfield><subfield code="g">extent:13</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1016/j.mee.2014.11.015</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ELV</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">42.00</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">44.09</subfield><subfield code="j">Medizintechnik</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">133</subfield><subfield code="j">2015</subfield><subfield code="b">5</subfield><subfield code="c">0205</subfield><subfield code="h">23-35</subfield><subfield code="g">13</subfield></datafield><datafield tag="953" ind1=" " ind2=" "><subfield code="2">045F</subfield><subfield code="a">620</subfield></datafield></record></collection>
|
| author |
Okazaki, Shinji |
| spellingShingle |
Okazaki, Shinji ddc 620 ddc 610 bkl 42.00 bkl 44.09 Elsevier Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution |
| authorStr |
Okazaki, Shinji |
| ppnlink_with_tag_str_mv |
@@773@@(DE-627)ELV00683695X |
| format |
electronic Article |
| dewey-ones |
620 - Engineering & allied operations 610 - Medicine & health 570 - Life sciences; biology |
| delete_txt_mv |
keep |
| author_role |
aut |
| collection |
elsevier |
| remote_str |
true |
| illustrated |
Not Illustrated |
| topic_title |
620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams Elsevier |
| topic |
ddc 620 ddc 610 bkl 42.00 bkl 44.09 Elsevier Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams |
| topic_unstemmed |
ddc 620 ddc 610 bkl 42.00 bkl 44.09 Elsevier Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams |
| topic_browse |
ddc 620 ddc 610 bkl 42.00 bkl 44.09 Elsevier Optical lithography Elsevier Electron beam lithography Elsevier Throughput Elsevier Resolution enhancement technologies Elsevier Multi-beams |
| format_facet |
Elektronische Aufsätze Aufsätze Elektronische Ressource |
| format_main_str_mv |
Text Zeitschrift/Artikel |
| carriertype_str_mv |
zu |
| hierarchy_parent_title |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
| hierarchy_parent_id |
ELV00683695X |
| dewey-tens |
620 - Engineering 610 - Medicine & health 570 - Life sciences; biology |
| hierarchy_top_title |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
| isfreeaccess_txt |
false |
| familylinks_str_mv |
(DE-627)ELV00683695X |
| title |
High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution |
| ctrlnum |
(DE-627)ELV034403736 (ELSEVIER)S0167-9317(14)00491-2 |
| title_full |
High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution |
| author_sort |
Okazaki, Shinji |
| journal |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
| journalStr |
Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
| lang_code |
eng |
| isOA_bool |
false |
| dewey-hundreds |
600 - Technology 500 - Science |
| recordtype |
marc |
| publishDateSort |
2015 |
| contenttype_str_mv |
zzz |
| container_start_page |
23 |
| author_browse |
Okazaki, Shinji |
| container_volume |
133 |
| physical |
13 |
| class |
620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl |
| format_se |
Elektronische Aufsätze |
| author-letter |
Okazaki, Shinji |
| doi_str_mv |
10.1016/j.mee.2014.11.015 |
| dewey-full |
620 610 570 |
| title_sort |
high resolution optical lithography or high throughput electron beam lithography: the technical struggle from the micro to the nano-fabrication evolution |
| title_auth |
High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution |
| abstract |
Display Omitted |
| abstractGer |
Display Omitted |
| abstract_unstemmed |
Display Omitted |
| collection_details |
GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA |
| title_short |
High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution |
| url |
https://doi.org/10.1016/j.mee.2014.11.015 |
| remote_bool |
true |
| ppnlink |
ELV00683695X |
| mediatype_str_mv |
z |
| isOA_txt |
false |
| hochschulschrift_bool |
false |
| doi_str |
10.1016/j.mee.2014.11.015 |
| up_date |
2024-07-06T21:02:15.165Z |
| _version_ |
1803865015100375040 |
| fullrecord_marcxml |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">ELV034403736</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230624013254.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">180603s2015 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1016/j.mee.2014.11.015</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">GBVA2015004000014.pica</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)ELV034403736</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ELSEVIER)S0167-9317(14)00491-2</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">620</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">610</subfield><subfield code="a">570</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">42.00</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">44.09</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Okazaki, Shinji</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2015</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">13</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zzz</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">z</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zu</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Display Omitted</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Optical lithography</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Electron beam lithography</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Throughput</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Resolution enhancement technologies</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Multi-beams</subfield><subfield code="2">Elsevier</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="n">Elsevier</subfield><subfield code="a">Souzanchi-K, M. ELSEVIER</subfield><subfield code="t">Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery</subfield><subfield code="d">2021</subfield><subfield code="g">[S.l.] </subfield><subfield code="w">(DE-627)ELV00683695X</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:133</subfield><subfield code="g">year:2015</subfield><subfield code="g">day:5</subfield><subfield code="g">month:02</subfield><subfield code="g">pages:23-35</subfield><subfield code="g">extent:13</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1016/j.mee.2014.11.015</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ELV</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_U</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">42.00</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="936" ind1="b" ind2="k"><subfield code="a">44.09</subfield><subfield code="j">Medizintechnik</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">133</subfield><subfield code="j">2015</subfield><subfield code="b">5</subfield><subfield code="c">0205</subfield><subfield code="h">23-35</subfield><subfield code="g">13</subfield></datafield><datafield tag="953" ind1=" " ind2=" "><subfield code="2">045F</subfield><subfield code="a">620</subfield></datafield></record></collection>
|
| score |
7.401457 |