Characterizing the degradation of PDMS stamps in nanoimprint lithography
Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Tucher, Nico [verfasserIn] |
|---|
| Format: |
E-Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
2017transfer abstract |
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| Umfang: |
5 |
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| Übergeordnetes Werk: |
Enthalten in: Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery - Souzanchi-K, M. ELSEVIER, 2021, [S.l.] |
|---|---|
| Übergeordnetes Werk: |
volume:180 ; year:2017 ; day:5 ; month:08 ; pages:40-44 ; extent:5 |
| Links: |
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| DOI / URN: |
10.1016/j.mee.2017.05.049 |
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ELV035723599 |
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| 520 | |a Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. | ||
| 520 | |a Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. | ||
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10.1016/j.mee.2017.05.049 doi GBVA2017004000021.pica (DE-627)ELV035723599 (ELSEVIER)S0167-9317(17)30258-7 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Tucher, Nico verfasserin aut Characterizing the degradation of PDMS stamps in nanoimprint lithography 2017transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Höhn, Oliver oth Hauser, Hubert oth Müller, Claas oth Bläsi, Benedikt oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:180 year:2017 day:5 month:08 pages:40-44 extent:5 https://doi.org/10.1016/j.mee.2017.05.049 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 180 2017 5 0805 40-44 5 045F 620 |
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10.1016/j.mee.2017.05.049 doi GBVA2017004000021.pica (DE-627)ELV035723599 (ELSEVIER)S0167-9317(17)30258-7 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Tucher, Nico verfasserin aut Characterizing the degradation of PDMS stamps in nanoimprint lithography 2017transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Höhn, Oliver oth Hauser, Hubert oth Müller, Claas oth Bläsi, Benedikt oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:180 year:2017 day:5 month:08 pages:40-44 extent:5 https://doi.org/10.1016/j.mee.2017.05.049 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 180 2017 5 0805 40-44 5 045F 620 |
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10.1016/j.mee.2017.05.049 doi GBVA2017004000021.pica (DE-627)ELV035723599 (ELSEVIER)S0167-9317(17)30258-7 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Tucher, Nico verfasserin aut Characterizing the degradation of PDMS stamps in nanoimprint lithography 2017transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Höhn, Oliver oth Hauser, Hubert oth Müller, Claas oth Bläsi, Benedikt oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:180 year:2017 day:5 month:08 pages:40-44 extent:5 https://doi.org/10.1016/j.mee.2017.05.049 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 180 2017 5 0805 40-44 5 045F 620 |
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10.1016/j.mee.2017.05.049 doi GBVA2017004000021.pica (DE-627)ELV035723599 (ELSEVIER)S0167-9317(17)30258-7 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Tucher, Nico verfasserin aut Characterizing the degradation of PDMS stamps in nanoimprint lithography 2017transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Höhn, Oliver oth Hauser, Hubert oth Müller, Claas oth Bläsi, Benedikt oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:180 year:2017 day:5 month:08 pages:40-44 extent:5 https://doi.org/10.1016/j.mee.2017.05.049 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 180 2017 5 0805 40-44 5 045F 620 |
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10.1016/j.mee.2017.05.049 doi GBVA2017004000021.pica (DE-627)ELV035723599 (ELSEVIER)S0167-9317(17)30258-7 DE-627 ger DE-627 rakwb eng 620 620 DE-600 610 570 VZ 42.00 bkl 44.09 bkl Tucher, Nico verfasserin aut Characterizing the degradation of PDMS stamps in nanoimprint lithography 2017transfer abstract 5 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. Höhn, Oliver oth Hauser, Hubert oth Müller, Claas oth Bläsi, Benedikt oth Enthalten in Elsevier Souzanchi-K, M. ELSEVIER Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery 2021 [S.l.] (DE-627)ELV00683695X volume:180 year:2017 day:5 month:08 pages:40-44 extent:5 https://doi.org/10.1016/j.mee.2017.05.049 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 42.00 VZ 44.09 Medizintechnik VZ AR 180 2017 5 0805 40-44 5 045F 620 |
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Enthalten in Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery [S.l.] volume:180 year:2017 day:5 month:08 pages:40-44 extent:5 |
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Enthalten in Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery [S.l.] volume:180 year:2017 day:5 month:08 pages:40-44 extent:5 |
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Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
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Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
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Characterizing the degradation of PDMS stamps in nanoimprint lithography |
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Characterizing the degradation of PDMS stamps in nanoimprint lithography |
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Tucher, Nico |
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Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
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Brain emotional learning impedance control of uncertain nonlinear systems with time delay: Experiments on a hybrid elastic joint robot in telesurgery |
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10.1016/j.mee.2017.05.049 |
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characterizing the degradation of pdms stamps in nanoimprint lithography |
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Characterizing the degradation of PDMS stamps in nanoimprint lithography |
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Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. |
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Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. |
| abstract_unstemmed |
Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL. |
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Characterizing the degradation of PDMS stamps in nanoimprint lithography |
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Höhn, Oliver Hauser, Hubert Müller, Claas Bläsi, Benedikt |
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