Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid
Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin film...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Vishnyakov, V. [verfasserIn] |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2018transfer abstract |
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| Schlagwörter: |
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| Umfang: |
8 |
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| Übergeordnetes Werk: |
Enthalten in: Patient and Graft Survival After Pre-emptive Versus Non-pre-emptive Kidney Transplantation: A Single-Center Experience From Turkey - 2013, Amsterdam [u.a.] |
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| Übergeordnetes Werk: |
volume:157 ; year:2018 ; pages:1-8 ; extent:8 |
| Links: |
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| DOI / URN: |
10.1016/j.polymdegradstab.2018.09.016 |
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ELV044860439 |
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| 245 | 1 | 0 | |a Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid |
| 264 | 1 | |c 2018transfer abstract | |
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| 520 | |a Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. | ||
| 520 | |a Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. | ||
| 650 | 7 | |a Anatase |2 Elsevier | |
| 650 | 7 | |a Rutile |2 Elsevier | |
| 650 | 7 | |a Photocatalysis |2 Elsevier | |
| 650 | 7 | |a Mixed phases |2 Elsevier | |
| 650 | 7 | |a Temperature treatment |2 Elsevier | |
| 650 | 7 | |a Titanium dioxide |2 Elsevier | |
| 650 | 7 | |a Ion sputtering deposition |2 Elsevier | |
| 700 | 1 | |a Kelly, P.J. |4 oth | |
| 700 | 1 | |a Humblot, J. |4 oth | |
| 700 | 1 | |a Kriek, R.J. |4 oth | |
| 700 | 1 | |a Allen, N.S. |4 oth | |
| 700 | 1 | |a Mahdjoub, N. |4 oth | |
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10.1016/j.polymdegradstab.2018.09.016 doi GBV00000000000419.pica (DE-627)ELV044860439 (ELSEVIER)S0141-3910(18)30296-9 DE-627 ger DE-627 rakwb eng 610 VZ 550 VZ 38.86 bkl 43.50 bkl 58.51 bkl Vishnyakov, V. verfasserin aut Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid 2018transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Anatase Elsevier Rutile Elsevier Photocatalysis Elsevier Mixed phases Elsevier Temperature treatment Elsevier Titanium dioxide Elsevier Ion sputtering deposition Elsevier Kelly, P.J. oth Humblot, J. oth Kriek, R.J. oth Allen, N.S. oth Mahdjoub, N. oth Enthalten in Elsevier Science Patient and Graft Survival After Pre-emptive Versus Non-pre-emptive Kidney Transplantation: A Single-Center Experience From Turkey 2013 Amsterdam [u.a.] (DE-627)ELV016597362 volume:157 year:2018 pages:1-8 extent:8 https://doi.org/10.1016/j.polymdegradstab.2018.09.016 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OPC-GGO 38.86 Grundwasser VZ 43.50 Umweltbelastungen VZ 58.51 Abwassertechnik Wasseraufbereitung VZ AR 157 2018 1-8 8 |
| spelling |
10.1016/j.polymdegradstab.2018.09.016 doi GBV00000000000419.pica (DE-627)ELV044860439 (ELSEVIER)S0141-3910(18)30296-9 DE-627 ger DE-627 rakwb eng 610 VZ 550 VZ 38.86 bkl 43.50 bkl 58.51 bkl Vishnyakov, V. verfasserin aut Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid 2018transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Anatase Elsevier Rutile Elsevier Photocatalysis Elsevier Mixed phases Elsevier Temperature treatment Elsevier Titanium dioxide Elsevier Ion sputtering deposition Elsevier Kelly, P.J. oth Humblot, J. oth Kriek, R.J. oth Allen, N.S. oth Mahdjoub, N. oth Enthalten in Elsevier Science Patient and Graft Survival After Pre-emptive Versus Non-pre-emptive Kidney Transplantation: A Single-Center Experience From Turkey 2013 Amsterdam [u.a.] (DE-627)ELV016597362 volume:157 year:2018 pages:1-8 extent:8 https://doi.org/10.1016/j.polymdegradstab.2018.09.016 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OPC-GGO 38.86 Grundwasser VZ 43.50 Umweltbelastungen VZ 58.51 Abwassertechnik Wasseraufbereitung VZ AR 157 2018 1-8 8 |
| allfields_unstemmed |
10.1016/j.polymdegradstab.2018.09.016 doi GBV00000000000419.pica (DE-627)ELV044860439 (ELSEVIER)S0141-3910(18)30296-9 DE-627 ger DE-627 rakwb eng 610 VZ 550 VZ 38.86 bkl 43.50 bkl 58.51 bkl Vishnyakov, V. verfasserin aut Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid 2018transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Anatase Elsevier Rutile Elsevier Photocatalysis Elsevier Mixed phases Elsevier Temperature treatment Elsevier Titanium dioxide Elsevier Ion sputtering deposition Elsevier Kelly, P.J. oth Humblot, J. oth Kriek, R.J. oth Allen, N.S. oth Mahdjoub, N. oth Enthalten in Elsevier Science Patient and Graft Survival After Pre-emptive Versus Non-pre-emptive Kidney Transplantation: A Single-Center Experience From Turkey 2013 Amsterdam [u.a.] (DE-627)ELV016597362 volume:157 year:2018 pages:1-8 extent:8 https://doi.org/10.1016/j.polymdegradstab.2018.09.016 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OPC-GGO 38.86 Grundwasser VZ 43.50 Umweltbelastungen VZ 58.51 Abwassertechnik Wasseraufbereitung VZ AR 157 2018 1-8 8 |
| allfieldsGer |
10.1016/j.polymdegradstab.2018.09.016 doi GBV00000000000419.pica (DE-627)ELV044860439 (ELSEVIER)S0141-3910(18)30296-9 DE-627 ger DE-627 rakwb eng 610 VZ 550 VZ 38.86 bkl 43.50 bkl 58.51 bkl Vishnyakov, V. verfasserin aut Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid 2018transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Anatase Elsevier Rutile Elsevier Photocatalysis Elsevier Mixed phases Elsevier Temperature treatment Elsevier Titanium dioxide Elsevier Ion sputtering deposition Elsevier Kelly, P.J. oth Humblot, J. oth Kriek, R.J. oth Allen, N.S. oth Mahdjoub, N. oth Enthalten in Elsevier Science Patient and Graft Survival After Pre-emptive Versus Non-pre-emptive Kidney Transplantation: A Single-Center Experience From Turkey 2013 Amsterdam [u.a.] (DE-627)ELV016597362 volume:157 year:2018 pages:1-8 extent:8 https://doi.org/10.1016/j.polymdegradstab.2018.09.016 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OPC-GGO 38.86 Grundwasser VZ 43.50 Umweltbelastungen VZ 58.51 Abwassertechnik Wasseraufbereitung VZ AR 157 2018 1-8 8 |
| allfieldsSound |
10.1016/j.polymdegradstab.2018.09.016 doi GBV00000000000419.pica (DE-627)ELV044860439 (ELSEVIER)S0141-3910(18)30296-9 DE-627 ger DE-627 rakwb eng 610 VZ 550 VZ 38.86 bkl 43.50 bkl 58.51 bkl Vishnyakov, V. verfasserin aut Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid 2018transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. 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use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid |
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Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid |
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Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. |
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Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. |
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Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films. |
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<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">ELV044860439</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230626005858.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">181123s2018 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1016/j.polymdegradstab.2018.09.016</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">GBV00000000000419.pica</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)ELV044860439</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ELSEVIER)S0141-3910(18)30296-9</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">610</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">550</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">38.86</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">43.50</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">58.51</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Vishnyakov, V.</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films: Influence of thermal treatments on structural and activity properties based on the decomposition of stearic acid</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2018transfer abstract</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">8</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zzz</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">z</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zu</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. 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Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO2 thin films.</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. 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