Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings
Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Grančič, B. [verfasserIn] |
|---|
| Format: |
E-Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
2019transfer abstract |
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| Umfang: |
8 |
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| Übergeordnetes Werk: |
Enthalten in: A high efficiency solar steam generation system with using residual heat to enhance steam escape - Bai, Binglin ELSEVIER, 2020, Amsterdam [u.a.] |
|---|---|
| Übergeordnetes Werk: |
volume:367 ; year:2019 ; day:15 ; month:06 ; pages:341-348 ; extent:8 |
| Links: |
|---|
| DOI / URN: |
10.1016/j.surfcoat.2019.04.017 |
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| 520 | |a Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. | ||
| 520 | |a Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. | ||
| 700 | 1 | |a Pleva, M. |4 oth | |
| 700 | 1 | |a Mikula, M. |4 oth | |
| 700 | 1 | |a Čaplovičová, M. |4 oth | |
| 700 | 1 | |a Satrapinskyy, L. |4 oth | |
| 700 | 1 | |a Roch, T. |4 oth | |
| 700 | 1 | |a Truchlý, M. |4 oth | |
| 700 | 1 | |a Sahul, M. |4 oth | |
| 700 | 1 | |a Gregor, M. |4 oth | |
| 700 | 1 | |a Švec, P. |4 oth | |
| 700 | 1 | |a Zahoran, M. |4 oth | |
| 700 | 1 | |a Kúš, P. |4 oth | |
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10.1016/j.surfcoat.2019.04.017 doi GBV00000000000629.pica (DE-627)ELV046422935 (ELSEVIER)S0257-8972(19)30382-2 DE-627 ger DE-627 rakwb eng 570 690 VZ 58.51 bkl Grančič, B. verfasserin aut Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings 2019transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Pleva, M. oth Mikula, M. oth Čaplovičová, M. oth Satrapinskyy, L. oth Roch, T. oth Truchlý, M. oth Sahul, M. oth Gregor, M. oth Švec, P. oth Zahoran, M. oth Kúš, P. oth Enthalten in Elsevier Science Bai, Binglin ELSEVIER A high efficiency solar steam generation system with using residual heat to enhance steam escape 2020 Amsterdam [u.a.] (DE-627)ELV004415906 volume:367 year:2019 day:15 month:06 pages:341-348 extent:8 https://doi.org/10.1016/j.surfcoat.2019.04.017 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 58.51 Abwassertechnik Wasseraufbereitung VZ AR 367 2019 15 0615 341-348 8 |
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10.1016/j.surfcoat.2019.04.017 doi GBV00000000000629.pica (DE-627)ELV046422935 (ELSEVIER)S0257-8972(19)30382-2 DE-627 ger DE-627 rakwb eng 570 690 VZ 58.51 bkl Grančič, B. verfasserin aut Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings 2019transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Pleva, M. oth Mikula, M. oth Čaplovičová, M. oth Satrapinskyy, L. oth Roch, T. oth Truchlý, M. oth Sahul, M. oth Gregor, M. oth Švec, P. oth Zahoran, M. oth Kúš, P. oth Enthalten in Elsevier Science Bai, Binglin ELSEVIER A high efficiency solar steam generation system with using residual heat to enhance steam escape 2020 Amsterdam [u.a.] (DE-627)ELV004415906 volume:367 year:2019 day:15 month:06 pages:341-348 extent:8 https://doi.org/10.1016/j.surfcoat.2019.04.017 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 58.51 Abwassertechnik Wasseraufbereitung VZ AR 367 2019 15 0615 341-348 8 |
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10.1016/j.surfcoat.2019.04.017 doi GBV00000000000629.pica (DE-627)ELV046422935 (ELSEVIER)S0257-8972(19)30382-2 DE-627 ger DE-627 rakwb eng 570 690 VZ 58.51 bkl Grančič, B. verfasserin aut Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings 2019transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Pleva, M. oth Mikula, M. oth Čaplovičová, M. oth Satrapinskyy, L. oth Roch, T. oth Truchlý, M. oth Sahul, M. oth Gregor, M. oth Švec, P. oth Zahoran, M. oth Kúš, P. oth Enthalten in Elsevier Science Bai, Binglin ELSEVIER A high efficiency solar steam generation system with using residual heat to enhance steam escape 2020 Amsterdam [u.a.] (DE-627)ELV004415906 volume:367 year:2019 day:15 month:06 pages:341-348 extent:8 https://doi.org/10.1016/j.surfcoat.2019.04.017 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 58.51 Abwassertechnik Wasseraufbereitung VZ AR 367 2019 15 0615 341-348 8 |
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10.1016/j.surfcoat.2019.04.017 doi GBV00000000000629.pica (DE-627)ELV046422935 (ELSEVIER)S0257-8972(19)30382-2 DE-627 ger DE-627 rakwb eng 570 690 VZ 58.51 bkl Grančič, B. verfasserin aut Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings 2019transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Pleva, M. oth Mikula, M. oth Čaplovičová, M. oth Satrapinskyy, L. oth Roch, T. oth Truchlý, M. oth Sahul, M. oth Gregor, M. oth Švec, P. oth Zahoran, M. oth Kúš, P. oth Enthalten in Elsevier Science Bai, Binglin ELSEVIER A high efficiency solar steam generation system with using residual heat to enhance steam escape 2020 Amsterdam [u.a.] (DE-627)ELV004415906 volume:367 year:2019 day:15 month:06 pages:341-348 extent:8 https://doi.org/10.1016/j.surfcoat.2019.04.017 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 58.51 Abwassertechnik Wasseraufbereitung VZ AR 367 2019 15 0615 341-348 8 |
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10.1016/j.surfcoat.2019.04.017 doi GBV00000000000629.pica (DE-627)ELV046422935 (ELSEVIER)S0257-8972(19)30382-2 DE-627 ger DE-627 rakwb eng 570 690 VZ 58.51 bkl Grančič, B. verfasserin aut Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings 2019transfer abstract 8 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. Pleva, M. oth Mikula, M. oth Čaplovičová, M. oth Satrapinskyy, L. oth Roch, T. oth Truchlý, M. oth Sahul, M. oth Gregor, M. oth Švec, P. oth Zahoran, M. oth Kúš, P. oth Enthalten in Elsevier Science Bai, Binglin ELSEVIER A high efficiency solar steam generation system with using residual heat to enhance steam escape 2020 Amsterdam [u.a.] (DE-627)ELV004415906 volume:367 year:2019 day:15 month:06 pages:341-348 extent:8 https://doi.org/10.1016/j.surfcoat.2019.04.017 Volltext GBV_USEFLAG_U GBV_ELV SYSFLAG_U SSG-OLC-PHA 58.51 Abwassertechnik Wasseraufbereitung VZ AR 367 2019 15 0615 341-348 8 |
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Enthalten in A high efficiency solar steam generation system with using residual heat to enhance steam escape Amsterdam [u.a.] volume:367 year:2019 day:15 month:06 pages:341-348 extent:8 |
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Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings |
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Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings |
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10.1016/j.surfcoat.2019.04.017 |
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stoichiometry, structure and mechanical properties of co-sputtered ti<ce:inf loc="post">1-x</ce:inf>ta<ce:inf loc="post">x</ce:inf>b<ce:inf loc="post">2±δ</ce:inf> coatings |
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Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings |
| abstract |
Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. |
| abstractGer |
Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. |
| abstract_unstemmed |
Magnetron co-sputtering from TiB2 and TaB2 stoichiometric targets is used to prepare AlB2-prototype ternary Ti1-xTaxB2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me < 2 tend to be nanocrystalline (without any preferred crystallite orientation) or amorphous. All the deposited coatings have a hardness higher than 32 GPa. The under-stoichiometric (B/Me < 2) coatings show material pile-up around the cube-corner indent edges, an indication for plastic flow and increased ductility. |
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Stoichiometry, structure and mechanical properties of co-sputtered Ti<ce:inf loc="post">1-x</ce:inf>Ta<ce:inf loc="post">x</ce:inf>B<ce:inf loc="post">2±Δ</ce:inf> coatings |
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Pleva, M. Mikula, M. Čaplovičová, M. Satrapinskyy, L. Roch, T. Truchlý, M. Sahul, M. Gregor, M. Švec, P. Zahoran, M. Kúš, P. |
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Pleva, M. Mikula, M. Čaplovičová, M. Satrapinskyy, L. Roch, T. Truchlý, M. Sahul, M. Gregor, M. Švec, P. Zahoran, M. Kúš, P. |
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