Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering
• Nb3Sn films were fabricated by using multilayer sequential magnetron sputtering. • Surface morphology varied with varying substrate temperature. • Superconducting critical temperature of 17.76 K has been achieved. • Surface voids reduced at the substrate temperature of 250 °C.
Gespeichert in:
| Autor*in: |
Sayeed, Md Nizam [verfasserIn] |
|---|
| Format: |
E-Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
2022 |
|---|
| Übergeordnetes Werk: |
Enthalten in: Formation and degradation of N-oxide venlafaxine during ozonation and biological post-treatment - Zucker, Ines ELSEVIER, 2017, international journal on the science and technology of condensed matter films, Amsterdam [u.a.] |
|---|---|
| Übergeordnetes Werk: |
volume:763 ; year:2022 ; day:1 ; month:12 ; pages:0 |
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| DOI / URN: |
10.1016/j.tsf.2022.139569 |
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Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering |
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• Nb3Sn films were fabricated by using multilayer sequential magnetron sputtering. • Surface morphology varied with varying substrate temperature. • Superconducting critical temperature of 17.76 K has been achieved. • Surface voids reduced at the substrate temperature of 250 °C. |
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• Nb3Sn films were fabricated by using multilayer sequential magnetron sputtering. • Surface morphology varied with varying substrate temperature. • Superconducting critical temperature of 17.76 K has been achieved. • Surface voids reduced at the substrate temperature of 250 °C. |
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• Nb3Sn films were fabricated by using multilayer sequential magnetron sputtering. • Surface morphology varied with varying substrate temperature. • Superconducting critical temperature of 17.76 K has been achieved. • Surface voids reduced at the substrate temperature of 250 °C. |
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