Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr)
Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both d...
Ausführliche Beschreibung
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| Autor*in: |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
1984 |
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| Reproduktion: |
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 |
|---|---|
| Übergeordnetes Werk: |
in: Thin Solid Films - Amsterdam : Elsevier, 118(1984), 2, Seite 231-241 |
| Übergeordnetes Werk: |
volume:118 ; year:1984 ; number:2 ; pages:231-241 |
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| 245 | 1 | 0 | |a Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr) |
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| 520 | |a Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. | ||
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(DE-627)NLEJ177758309 (DE-599)GBVNLZ177758309 DE-627 ger DE-627 rakwb eng Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr) 1984 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Avni, R. oth Carmi, U. oth Inspektor, A. oth Rosenthal, I. oth in Thin Solid Films Amsterdam : Elsevier 118(1984), 2, Seite 231-241 (DE-627)NLEJ177331380 (DE-600)1482896-0 0040-6090 nnns volume:118 year:1984 number:2 pages:231-241 http://linkinghub.elsevier.com/retrieve/pii/0040-6090(84)90076-2 GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 118 1984 2 231-241 |
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(DE-627)NLEJ177758309 (DE-599)GBVNLZ177758309 DE-627 ger DE-627 rakwb eng Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr) 1984 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Avni, R. oth Carmi, U. oth Inspektor, A. oth Rosenthal, I. oth in Thin Solid Films Amsterdam : Elsevier 118(1984), 2, Seite 231-241 (DE-627)NLEJ177331380 (DE-600)1482896-0 0040-6090 nnns volume:118 year:1984 number:2 pages:231-241 http://linkinghub.elsevier.com/retrieve/pii/0040-6090(84)90076-2 GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 118 1984 2 231-241 |
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(DE-627)NLEJ177758309 (DE-599)GBVNLZ177758309 DE-627 ger DE-627 rakwb eng Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr) 1984 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Avni, R. oth Carmi, U. oth Inspektor, A. oth Rosenthal, I. oth in Thin Solid Films Amsterdam : Elsevier 118(1984), 2, Seite 231-241 (DE-627)NLEJ177331380 (DE-600)1482896-0 0040-6090 nnns volume:118 year:1984 number:2 pages:231-241 http://linkinghub.elsevier.com/retrieve/pii/0040-6090(84)90076-2 GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 118 1984 2 231-241 |
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(DE-627)NLEJ177758309 (DE-599)GBVNLZ177758309 DE-627 ger DE-627 rakwb eng Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr) 1984 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Avni, R. oth Carmi, U. oth Inspektor, A. oth Rosenthal, I. oth in Thin Solid Films Amsterdam : Elsevier 118(1984), 2, Seite 231-241 (DE-627)NLEJ177331380 (DE-600)1482896-0 0040-6090 nnns volume:118 year:1984 number:2 pages:231-241 http://linkinghub.elsevier.com/retrieve/pii/0040-6090(84)90076-2 GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 118 1984 2 231-241 |
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(DE-627)NLEJ177758309 (DE-599)GBVNLZ177758309 DE-627 ger DE-627 rakwb eng Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr) 1984 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Avni, R. oth Carmi, U. oth Inspektor, A. oth Rosenthal, I. oth in Thin Solid Films Amsterdam : Elsevier 118(1984), 2, Seite 231-241 (DE-627)NLEJ177331380 (DE-600)1482896-0 0040-6090 nnns volume:118 year:1984 number:2 pages:231-241 http://linkinghub.elsevier.com/retrieve/pii/0040-6090(84)90076-2 GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 118 1984 2 231-241 |
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Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr) |
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Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. |
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Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. |
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Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H"2 or NH"3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. |
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