In situ optical element cleaning with photon activated oxygen
The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and...
Ausführliche Beschreibung
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| Autor*in: |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
1992 |
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| Reproduktion: |
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 |
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| Übergeordnetes Werk: |
in: Nuclear Instruments and Methods in Physics Research Section A: - Amsterdam : Elsevier, 319(1992), 1-3, Seite 240-243 |
| Übergeordnetes Werk: |
volume:319 ; year:1992 ; number:1-3 ; pages:240-243 |
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| 520 | |a The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. | ||
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(DE-627)NLEJ180909703 (DE-599)GBVNLZ180909703 DE-627 ger DE-627 rakwb eng In situ optical element cleaning with photon activated oxygen 1992 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Warburton, W.K. oth Pianetta, P. oth in Nuclear Instruments and Methods in Physics Research Section A: Amsterdam : Elsevier 319(1992), 1-3, Seite 240-243 (DE-627)NLEJ180854372 (DE-600)1466532-3 0168-9002 nnns volume:319 year:1992 number:1-3 pages:240-243 http://linkinghub.elsevier.com/retrieve/pii/0168-9002(92)90560-Q GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 319 1992 1-3 240-243 |
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(DE-627)NLEJ180909703 (DE-599)GBVNLZ180909703 DE-627 ger DE-627 rakwb eng In situ optical element cleaning with photon activated oxygen 1992 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Warburton, W.K. oth Pianetta, P. oth in Nuclear Instruments and Methods in Physics Research Section A: Amsterdam : Elsevier 319(1992), 1-3, Seite 240-243 (DE-627)NLEJ180854372 (DE-600)1466532-3 0168-9002 nnns volume:319 year:1992 number:1-3 pages:240-243 http://linkinghub.elsevier.com/retrieve/pii/0168-9002(92)90560-Q GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 319 1992 1-3 240-243 |
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(DE-627)NLEJ180909703 (DE-599)GBVNLZ180909703 DE-627 ger DE-627 rakwb eng In situ optical element cleaning with photon activated oxygen 1992 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Warburton, W.K. oth Pianetta, P. oth in Nuclear Instruments and Methods in Physics Research Section A: Amsterdam : Elsevier 319(1992), 1-3, Seite 240-243 (DE-627)NLEJ180854372 (DE-600)1466532-3 0168-9002 nnns volume:319 year:1992 number:1-3 pages:240-243 http://linkinghub.elsevier.com/retrieve/pii/0168-9002(92)90560-Q GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 319 1992 1-3 240-243 |
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(DE-627)NLEJ180909703 (DE-599)GBVNLZ180909703 DE-627 ger DE-627 rakwb eng In situ optical element cleaning with photon activated oxygen 1992 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Warburton, W.K. oth Pianetta, P. oth in Nuclear Instruments and Methods in Physics Research Section A: Amsterdam : Elsevier 319(1992), 1-3, Seite 240-243 (DE-627)NLEJ180854372 (DE-600)1466532-3 0168-9002 nnns volume:319 year:1992 number:1-3 pages:240-243 http://linkinghub.elsevier.com/retrieve/pii/0168-9002(92)90560-Q GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 319 1992 1-3 240-243 |
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(DE-627)NLEJ180909703 (DE-599)GBVNLZ180909703 DE-627 ger DE-627 rakwb eng In situ optical element cleaning with photon activated oxygen 1992 nicht spezifiziert zzz rdacontent nicht spezifiziert z rdamedia nicht spezifiziert zu rdacarrier The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. Elsevier Journal Backfiles on ScienceDirect 1907 - 2002 Warburton, W.K. oth Pianetta, P. oth in Nuclear Instruments and Methods in Physics Research Section A: Amsterdam : Elsevier 319(1992), 1-3, Seite 240-243 (DE-627)NLEJ180854372 (DE-600)1466532-3 0168-9002 nnns volume:319 year:1992 number:1-3 pages:240-243 http://linkinghub.elsevier.com/retrieve/pii/0168-9002(92)90560-Q GBV_USEFLAG_H ZDB-1-SDJ GBV_NL_ARTICLE AR 319 1992 1-3 240-243 |
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The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. |
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The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. |
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The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique. |
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<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">NLEJ180909703</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20210706140746.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">070505s1992 xx |||||o 00| ||eng c</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)NLEJ180909703</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVNLZ180909703</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">In situ optical element cleaning with photon activated oxygen</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1992</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zzz</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">z</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">nicht spezifiziert</subfield><subfield code="b">zu</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">The severe flux losses seen in synchrotron radiation beamlines due to carbon contamination of optical surfaces has stimulated a search for decontamination techniques to restore these surface to their pristine efficiencies. In situ techniques are preferred for their potential for minimizing labor and beamline downtime costs. Glow discharge activated O"2, with or without additions of H"2O, has been the most successful procedure to date and is capable of cleaning the surfaces without degrading their optical properties provided the system is properly designed and operated. The method is scarcely ideal, however, since real possibilities for contamination from the discharges exist, considerable instrument modification may be required to allow plasma access to the optics, and total cycle times are 1-3 days, which may be a significant operating cost on new, ultrahigh intensity beamlines.In this work we demonstrate the existence of a new in situ decontamination technique, presenting initial work showing that synchrotron radiation itself can sufficiently activate dry oxygen to successfully remove carbon contamination films. This technique offers particular promise in two areas. First, used in situ, the cleaning action takes place in exactly the same places where contamination occurs, since both processes are activated by the same radiation, and no instrument modifications are required. Second, it suggests that if the optical elements were continuously exposed to oxygen at an appropriate partial pressure, carbon contamination could be suppressed completely. We are now planning experiments to understand the physics, chemistry and kinetics of this new decontamination technique.</subfield></datafield><datafield tag="533" ind1=" " ind2=" "><subfield code="f">Elsevier Journal Backfiles on ScienceDirect 1907 - 2002</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Warburton, W.K.</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Pianetta, P.</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">in</subfield><subfield code="t">Nuclear Instruments and Methods in Physics Research Section A:</subfield><subfield code="d">Amsterdam : Elsevier</subfield><subfield code="g">319(1992), 1-3, Seite 240-243</subfield><subfield code="w">(DE-627)NLEJ180854372</subfield><subfield code="w">(DE-600)1466532-3</subfield><subfield code="x">0168-9002</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:319</subfield><subfield code="g">year:1992</subfield><subfield code="g">number:1-3</subfield><subfield code="g">pages:240-243</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://linkinghub.elsevier.com/retrieve/pii/0168-9002(92)90560-Q</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_H</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-1-SDJ</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_NL_ARTICLE</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">319</subfield><subfield code="j">1992</subfield><subfield code="e">1-3</subfield><subfield code="h">240-243</subfield></datafield></record></collection>
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