C59N Monomers: Stabilization through Immobilization
C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less...
Ausführliche Beschreibung
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E-Artikel |
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| Erschienen: |
1999 |
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Online-Ressource 4 |
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APS Digital Backfile Archive 1893-2003 |
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| Übergeordnetes Werk: |
Enthalten in: Physical review letters - College Park, Md. : APS, 1958, 83(1999), 17, Seite 3478-3481 |
| Übergeordnetes Werk: |
volume:83 ; year:1999 ; number:17 ; pages:3478-3481 ; extent:4 |
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| 520 | |a C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. | ||
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(DE-627)NLEJ250690055 (DE-601)aps:00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 DE-627 ger DE-627 rakwb C59N Monomers: Stabilization through Immobilization 1999 Online-Ressource 4 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. APS Digital Backfile Archive 1893-2003 Butcher, M. J. oth Jones, F. H. oth Beton, P. H. oth Moriarty, P. oth Cotier, B. N. oth Upward, M. D. oth Enthalten in Physical review letters College Park, Md. : APS, 1958 83(1999), 17, Seite 3478-3481 Online-Ressource (DE-627)NLEJ248237888 (DE-600)1472655-5 1079-7114 nnns volume:83 year:1999 number:17 pages:3478-3481 extent:4 https://www.tib.eu/de/suchen/id/aps%3A00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 Verlag Deutschlandweit zugänglich GBV_USEFLAG_U ZDB-1-APS GBV_NL_ARTICLE AR 83 1999 17 3478-3481 4 |
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(DE-627)NLEJ250690055 (DE-601)aps:00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 DE-627 ger DE-627 rakwb C59N Monomers: Stabilization through Immobilization 1999 Online-Ressource 4 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. APS Digital Backfile Archive 1893-2003 Butcher, M. J. oth Jones, F. H. oth Beton, P. H. oth Moriarty, P. oth Cotier, B. N. oth Upward, M. D. oth Enthalten in Physical review letters College Park, Md. : APS, 1958 83(1999), 17, Seite 3478-3481 Online-Ressource (DE-627)NLEJ248237888 (DE-600)1472655-5 1079-7114 nnns volume:83 year:1999 number:17 pages:3478-3481 extent:4 https://www.tib.eu/de/suchen/id/aps%3A00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 Verlag Deutschlandweit zugänglich GBV_USEFLAG_U ZDB-1-APS GBV_NL_ARTICLE AR 83 1999 17 3478-3481 4 |
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(DE-627)NLEJ250690055 (DE-601)aps:00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 DE-627 ger DE-627 rakwb C59N Monomers: Stabilization through Immobilization 1999 Online-Ressource 4 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. APS Digital Backfile Archive 1893-2003 Butcher, M. J. oth Jones, F. H. oth Beton, P. H. oth Moriarty, P. oth Cotier, B. N. oth Upward, M. D. oth Enthalten in Physical review letters College Park, Md. : APS, 1958 83(1999), 17, Seite 3478-3481 Online-Ressource (DE-627)NLEJ248237888 (DE-600)1472655-5 1079-7114 nnns volume:83 year:1999 number:17 pages:3478-3481 extent:4 https://www.tib.eu/de/suchen/id/aps%3A00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 Verlag Deutschlandweit zugänglich GBV_USEFLAG_U ZDB-1-APS GBV_NL_ARTICLE AR 83 1999 17 3478-3481 4 |
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(DE-627)NLEJ250690055 (DE-601)aps:00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 DE-627 ger DE-627 rakwb C59N Monomers: Stabilization through Immobilization 1999 Online-Ressource 4 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. APS Digital Backfile Archive 1893-2003 Butcher, M. J. oth Jones, F. H. oth Beton, P. H. oth Moriarty, P. oth Cotier, B. N. oth Upward, M. D. oth Enthalten in Physical review letters College Park, Md. : APS, 1958 83(1999), 17, Seite 3478-3481 Online-Ressource (DE-627)NLEJ248237888 (DE-600)1472655-5 1079-7114 nnns volume:83 year:1999 number:17 pages:3478-3481 extent:4 https://www.tib.eu/de/suchen/id/aps%3A00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 Verlag Deutschlandweit zugänglich GBV_USEFLAG_U ZDB-1-APS GBV_NL_ARTICLE AR 83 1999 17 3478-3481 4 |
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(DE-627)NLEJ250690055 (DE-601)aps:00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 DE-627 ger DE-627 rakwb C59N Monomers: Stabilization through Immobilization 1999 Online-Ressource 4 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. APS Digital Backfile Archive 1893-2003 Butcher, M. J. oth Jones, F. H. oth Beton, P. H. oth Moriarty, P. oth Cotier, B. N. oth Upward, M. D. oth Enthalten in Physical review letters College Park, Md. : APS, 1958 83(1999), 17, Seite 3478-3481 Online-Ressource (DE-627)NLEJ248237888 (DE-600)1472655-5 1079-7114 nnns volume:83 year:1999 number:17 pages:3478-3481 extent:4 https://www.tib.eu/de/suchen/id/aps%3A00f382fef4a42e4a49d4f15a8e4d92bb04b13d04 Verlag Deutschlandweit zugänglich GBV_USEFLAG_U ZDB-1-APS GBV_NL_ARTICLE AR 83 1999 17 3478-3481 4 |
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C59N Monomers: Stabilization through Immobilization |
| abstract |
C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. |
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C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. |
| abstract_unstemmed |
C59N is found to sublime in monomer free radical form rather than the more stable dimers which are normally observed. Using a scanning tunneling microscope operating in ultrahigh vacuum we have found that the monomer form may be immobilized and therefore stabilized on clean Si surfaces. On the less reactive H-terminated Si(100) surface C59N diffuses and forms disordered islands, and a lower limit for the interaction energy between two monomers may be estimated at 0.8 eV. Synchrotron based photoemission experiments have also been performed and show diffusion and redimerization occur for multilayer deposition of C59N. |
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