Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion
Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calcu...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Jin, Huang [verfasserIn] Madeleine, Meyer [verfasserIn] Vassilis, Pontikis [verfasserIn] |
|---|
| Format: |
E-Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
1991 |
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| Übergeordnetes Werk: |
Enthalten in: Philosophical magazine - London [u.a.] : Taylor and Francis, 1978, 63, 6, Seite 1149-1165 |
|---|---|
| Übergeordnetes Werk: |
volume:63 ; number:6 ; pages:1149-1165 |
| Links: |
|---|
| DOI / URN: |
10.1080/01418619108205574 |
|---|
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NLEJ253743486 |
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| 245 | 1 | 0 | |a Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion |
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| 520 | |a Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. | ||
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| 700 | 1 | |a Vassilis, Pontikis |e verfasserin |4 aut | |
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10.1080/01418619108205574 doi (DE-627)NLEJ253743486 (TFO)8205574 DE-627 ger DE-627 rda eng Jin, Huang verfasserin aut Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion 1991 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. Madeleine, Meyer verfasserin aut Vassilis, Pontikis verfasserin aut Enthalten in Philosophical magazine London [u.a.] : Taylor and Francis, 1978 63, 6, Seite 1149-1165 Online-Ressource (DE-627)NLEJ253724619 (DE-600)2001649-9 (DE-576)090880773 1460-6992 nnns volume:63 number:6 pages:1149-1165 https://www.tib.eu/de/suchen/id/tandf%3A9bf5ea79a810401b86a0303d6c597394a92a0118 Digitalisierung Deutschlandweit zugänglich ZDB-1-TFO GBV_NL_ARTICLE AR 63 6 1149-1165 |
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10.1080/01418619108205574 doi (DE-627)NLEJ253743486 (TFO)8205574 DE-627 ger DE-627 rda eng Jin, Huang verfasserin aut Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion 1991 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. Madeleine, Meyer verfasserin aut Vassilis, Pontikis verfasserin aut Enthalten in Philosophical magazine London [u.a.] : Taylor and Francis, 1978 63, 6, Seite 1149-1165 Online-Ressource (DE-627)NLEJ253724619 (DE-600)2001649-9 (DE-576)090880773 1460-6992 nnns volume:63 number:6 pages:1149-1165 https://www.tib.eu/de/suchen/id/tandf%3A9bf5ea79a810401b86a0303d6c597394a92a0118 Digitalisierung Deutschlandweit zugänglich ZDB-1-TFO GBV_NL_ARTICLE AR 63 6 1149-1165 |
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10.1080/01418619108205574 doi (DE-627)NLEJ253743486 (TFO)8205574 DE-627 ger DE-627 rda eng Jin, Huang verfasserin aut Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion 1991 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. Madeleine, Meyer verfasserin aut Vassilis, Pontikis verfasserin aut Enthalten in Philosophical magazine London [u.a.] : Taylor and Francis, 1978 63, 6, Seite 1149-1165 Online-Ressource (DE-627)NLEJ253724619 (DE-600)2001649-9 (DE-576)090880773 1460-6992 nnns volume:63 number:6 pages:1149-1165 https://www.tib.eu/de/suchen/id/tandf%3A9bf5ea79a810401b86a0303d6c597394a92a0118 Digitalisierung Deutschlandweit zugänglich ZDB-1-TFO GBV_NL_ARTICLE AR 63 6 1149-1165 |
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10.1080/01418619108205574 doi (DE-627)NLEJ253743486 (TFO)8205574 DE-627 ger DE-627 rda eng Jin, Huang verfasserin aut Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion 1991 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. Madeleine, Meyer verfasserin aut Vassilis, Pontikis verfasserin aut Enthalten in Philosophical magazine London [u.a.] : Taylor and Francis, 1978 63, 6, Seite 1149-1165 Online-Ressource (DE-627)NLEJ253724619 (DE-600)2001649-9 (DE-576)090880773 1460-6992 nnns volume:63 number:6 pages:1149-1165 https://www.tib.eu/de/suchen/id/tandf%3A9bf5ea79a810401b86a0303d6c597394a92a0118 Digitalisierung Deutschlandweit zugänglich ZDB-1-TFO GBV_NL_ARTICLE AR 63 6 1149-1165 |
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10.1080/01418619108205574 doi (DE-627)NLEJ253743486 (TFO)8205574 DE-627 ger DE-627 rda eng Jin, Huang verfasserin aut Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion 1991 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. Madeleine, Meyer verfasserin aut Vassilis, Pontikis verfasserin aut Enthalten in Philosophical magazine London [u.a.] : Taylor and Francis, 1978 63, 6, Seite 1149-1165 Online-Ressource (DE-627)NLEJ253724619 (DE-600)2001649-9 (DE-576)090880773 1460-6992 nnns volume:63 number:6 pages:1149-1165 https://www.tib.eu/de/suchen/id/tandf%3A9bf5ea79a810401b86a0303d6c597394a92a0118 Digitalisierung Deutschlandweit zugänglich ZDB-1-TFO GBV_NL_ARTICLE AR 63 6 1149-1165 |
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Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion |
| abstract |
Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. |
| abstractGer |
Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. |
| abstract_unstemmed |
Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated. |
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<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000naa a22002652 4500</leader><controlfield tag="001">NLEJ253743486</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20240215134426.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">240215s1991 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1080/01418619108205574</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)NLEJ253743486</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(TFO)8205574</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Jin, Huang</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Migration of point defects along a dissociated edge dislocation in copper: A molecular dynamics study of pipe diffusion</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1991</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Pipe diffusion along a dissociated edge dislocation in copper is investigated by molecular dynamics simulation. The formation energies of a vacancy and an interstitial in the cores and the fault ribbon are calculated by quasi-dynamics relaxation at 0 K. The diffusion rates of these defects are calculated at high temperatures by counting the number of atomic jumps due to the migration of the defects. The variation in the diffusion coefficients with the inverse of the temperature yields the migration energies for pipe diffusion, and it is interesting to note that the value of the energy obtained for the interstitial is comparable with the bulk value. Contrary to current assumptions in favour of a vacancy mechanism, we find that the two types of defect may contribute comparably with pipe diffusion since their activation energies are very close. Owing to the extension of the cores, the trajectories of the migrating defects involve not only the partials but also the stacking-fault ribbon. For this reason, pipe diffusion is slower when the dislocations are dissociated.</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Madeleine, Meyer</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Vassilis, Pontikis</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Philosophical magazine</subfield><subfield code="d">London [u.a.] : Taylor and Francis, 1978</subfield><subfield code="g">63, 6, Seite 1149-1165</subfield><subfield code="h">Online-Ressource</subfield><subfield code="w">(DE-627)NLEJ253724619</subfield><subfield code="w">(DE-600)2001649-9</subfield><subfield code="w">(DE-576)090880773</subfield><subfield code="x">1460-6992</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:63</subfield><subfield code="g">number:6</subfield><subfield code="g">pages:1149-1165</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://www.tib.eu/de/suchen/id/tandf%3A9bf5ea79a810401b86a0303d6c597394a92a0118</subfield><subfield code="x">Digitalisierung</subfield><subfield code="z">Deutschlandweit zugänglich</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-1-TFO</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_NL_ARTICLE</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">63</subfield><subfield code="e">6</subfield><subfield code="h">1149-1165</subfield></datafield></record></collection>
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