Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood Estimation of the Mean and Covariance Surfaces

Gespeichert in:

Autor*in:	Davis, J.C. [verfasserIn] Hughes-Oliver, J.M. Lu, J.C. Gyurcsik, R.S.

Format:	Artikel

Erschienen:	1996

Systematik:	VA 4000

Umfang:	6

Übergeordnetes Werk:	Enthalten in: Journal of the Electrochemical Society - Pennington, NJ : Electrochemical Society, 1948, 143(1996), 10, Seite 3404-3409
Übergeordnetes Werk:	volume:143 ; year:1996 ; number:10 ; pages:3404-3409 ; extent:6

Katalog-ID:	OLC150716369X

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topic_title	540 620 660 VA 4000 AVZ rvk Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood Estimation of the Mean and Covariance Surfaces
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title	Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood Estimation of the Mean and Covariance Surfaces
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title_full	Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood Estimation of the Mean and Covariance Surfaces
author_sort	Davis, J.C.
journal	Journal of the Electrochemical Society
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container_start_page	3404
author_browse	Davis, J.C.
container_volume	143
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format_se	Aufsätze
author-letter	Davis, J.C.
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title_sort	improved within-wafer uniformity modeling through the use of maximum-likelihood estimation of the mean and covariance surfaces
title_auth	Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood Estimation of the Mean and Covariance Surfaces
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title_short	Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood Estimation of the Mean and Covariance Surfaces
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author2	Hughes-Oliver, J.M. Lu, J.C. Gyurcsik, R.S.
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