Analysis by Surface-Sensitive Second Harmonic Generation of Si(111)7 x 7 Exposed to High Purity Ozone Jet for Oxide Film Formation
Autor*in: |
Nakamura, K. [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
1997 |
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Systematik: |
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Umfang: |
6 |
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Übergeordnetes Werk: |
Enthalten in: Surface and interface analysis - Chichester [u.a.] : Wiley, 1979, 25(1997), 2, Seite 88-93 |
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Übergeordnetes Werk: |
volume:25 ; year:1997 ; number:2 ; pages:88-93 ; extent:6 |
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SW970324 (DE-627)OLC151401128X (DE-599)GBVOLC151401128X DE-627 ger DE-627 rakwb 540 530 ZG 1100: AVZ rvk 51.00 bkl 33.68 bkl Nakamura, K. verfasserin aut Analysis by Surface-Sensitive Second Harmonic Generation of Si(111)7 x 7 Exposed to High Purity Ozone Jet for Oxide Film Formation 1997 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Kurokawa, A. oth Ichimura, S. oth Enthalten in Surface and interface analysis Chichester [u.a.] : Wiley, 1979 25(1997), 2, Seite 88-93 (DE-627)129377104 (DE-600)164045-8 (DE-576)01475908X 0142-2421 nnns volume:25 year:1997 number:2 pages:88-93 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_24 GBV_ILN_30 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2026 GBV_ILN_4027 GBV_ILN_4046 ZG 1100: 51.00 AVZ 33.68 AVZ AR 25 1997 2 88-93 6 |
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