Interfacial Layers between Si and Ru Films Deposited by Sputtering in Ar-02 Mixture Ambient

Gespeichert in:

Autor*in:	Aoyama, Tomonori [verfasserIn] Murakoshi, Atsushi Koike, Mitsuo Takeno, Shiro Imai, Keitaro

Format:	Artikel

Erschienen:	1998

Systematik:	UA 4210.

Übergeordnetes Werk:	Enthalten in: Japanese journal of applied physics. Part 2, Letters & express letters - Tokyo : Ōyō Butsuri Gakkai, 1982, 37(1998), 2, B, Seite L242
Übergeordnetes Werk:	volume:37 ; year:1998 ; number:2 ; supplement:B ; pages:L242

Katalog-ID:	OLC1535499575

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spelling	SW980611 (DE-627)OLC1535499575 (DE-599)GBVOLC1535499575 DE-627 ger DE-627 rakwb 530 UA 4210. AVZ rvk Aoyama, Tomonori verfasserin aut Interfacial Layers between Si and Ru Films Deposited by Sputtering in Ar-02 Mixture Ambient 1998 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Murakoshi, Atsushi oth Koike, Mitsuo oth Takeno, Shiro oth Imai, Keitaro oth Enthalten in Japanese journal of applied physics. Part 2, Letters & express letters Tokyo : Ōyō Butsuri Gakkai, 1982 37(1998), 2, B, Seite L242 (DE-627)130626945 (DE-600)797295-7 (DE-576)016133277 0021-4922 nnns volume:37 year:1998 number:2 supplement:B pages:L242 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_70 GBV_ILN_100 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2001 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2185 GBV_ILN_4036 GBV_ILN_4037 GBV_ILN_4082 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4317 GBV_ILN_4319 GBV_ILN_4700 UA 4210. AR 37 1998 2 B L242
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Interfacial Layers between Si and Ru Films Deposited by Sputtering in Ar-02 Mixture Ambient

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