Two-step stress method for the dynamic testing of very thin (8 nm) SiO2 films

Gespeichert in:

Autor*in:	Rodriguez, R. [verfasserIn] Miranda, E. Nafria, M. Suñé, J. Aymerich, X.

Format:	Artikel

Erschienen:	1998

Umfang:	6

Übergeordnetes Werk:	Enthalten in: Microelectronics reliability - Amsterdam [u.a.] : Elsevier, 1964, 38(1998), 6-8, Seite 1127-1132
Übergeordnetes Werk:	volume:38 ; year:1998 ; number:6-8 ; pages:1127-1132 ; extent:6

Katalog-ID:	OLC1547332956

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Two-step stress method for the dynamic testing of very thin (8 nm) SiO2 films

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