RF-sputter deposition of Zn-Ge nitride thin films
Autor*in: |
Kikkawa, S. [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
1999 |
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Umfang: |
4 |
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Übergeordnetes Werk: |
Enthalten in: Solid state communications - New York, NY [u.a.] : Elsevier Science, 1963, 112(1999), 9, Seite 513-516 |
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Übergeordnetes Werk: |
volume:112 ; year:1999 ; number:9 ; pages:513-516 ; extent:4 |
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OLC1563355884 |
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SW991123 (DE-627)OLC1563355884 (DE-599)GBVOLC1563355884 DE-627 ger DE-627 rakwb 540 530 33.60 bkl Kikkawa, S. verfasserin aut RF-sputter deposition of Zn-Ge nitride thin films 1999 4 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Morisaka, H. oth Enthalten in Solid state communications New York, NY [u.a.] : Elsevier Science, 1963 112(1999), 9, Seite 513-516 (DE-627)129481998 (DE-600)204573-4 (DE-576)014865130 0038-1098 nnns volume:112 year:1999 number:9 pages:513-516 extent:4 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_2185 GBV_ILN_2221 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4313 GBV_ILN_4315 GBV_ILN_4318 GBV_ILN_4323 GBV_ILN_4700 33.60 AVZ AR 112 1999 9 513-516 4 |
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