Letters - Surfaces, Interfaces, and Films - Ruthenium Films Prepared by Liquid Source Chemical Vapor Deposition Using Bis-(ethylcyclopentadienyl)ruthenium

Gespeichert in:

Autor*in:	Aoyama, Tomonori [verfasserIn] Eguchi, Kazuhiro

Format:	Artikel

Erschienen:	1999

Systematik:	UA 4210.

Übergeordnetes Werk:	Enthalten in: Japanese journal of applied physics. Part 2, Letters & express letters - Tokyo : Ōyō Butsuri Gakkai, 1982, 38(1999), 10, A, Seite L1134
Übergeordnetes Werk:	volume:38 ; year:1999 ; number:10 ; supplement:A ; pages:L1134

Katalog-ID:	OLC156421351X

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