Instrumentation, Measurement, and Fabrication Technology - Determination of the Density and the Thickness of SiO2 Films Using Extremely Asymmetric X-Ray Diffraction
Autor*in: |
Kudo, Yoshihiro [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
2000 |
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Systematik: |
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Umfang: |
5 |
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Übergeordnetes Werk: |
Enthalten in: Japanese journal of applied physics. Part 1, Regular papers, brief communications & review papers - Tokyo : Ōyō Butsuri Gakkai, 1982, 39(2000), 3, A, Seite 1409-1413 |
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Übergeordnetes Werk: |
volume:39 ; year:2000 ; number:3 ; supplement:A ; pages:1409-1413 ; extent:5 |
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SW000526 (DE-627)OLC1572675667 (DE-599)GBVOLC1572675667 DE-627 ger DE-627 rakwb 530 UA 4210. AVZ rvk Kudo, Yoshihiro verfasserin aut Instrumentation, Measurement, and Fabrication Technology - Determination of the Density and the Thickness of SiO2 Films Using Extremely Asymmetric X-Ray Diffraction 2000 5 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Liu, Kuang-Yu oth Kawado, Seiji oth Kashiwagi, Akihide oth Hirano, Keiichi oth Enthalten in Japanese journal of applied physics. Part 1, Regular papers, brief communications & review papers Tokyo : Ōyō Butsuri Gakkai, 1982 39(2000), 3, A, Seite 1409-1413 (DE-627)130626937 (DE-600)797294-5 (DE-576)016133269 0021-4922 nnns volume:39 year:2000 number:3 supplement:A pages:1409-1413 extent:5 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_70 GBV_ILN_100 GBV_ILN_170 GBV_ILN_2001 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2185 GBV_ILN_4036 GBV_ILN_4037 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4700 UA 4210. AR 39 2000 3 A 1409-1413 5 |
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SW000526 (DE-627)OLC1572675667 (DE-599)GBVOLC1572675667 DE-627 ger DE-627 rakwb 530 UA 4210. AVZ rvk Kudo, Yoshihiro verfasserin aut Instrumentation, Measurement, and Fabrication Technology - Determination of the Density and the Thickness of SiO2 Films Using Extremely Asymmetric X-Ray Diffraction 2000 5 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Liu, Kuang-Yu oth Kawado, Seiji oth Kashiwagi, Akihide oth Hirano, Keiichi oth Enthalten in Japanese journal of applied physics. Part 1, Regular papers, brief communications & review papers Tokyo : Ōyō Butsuri Gakkai, 1982 39(2000), 3, A, Seite 1409-1413 (DE-627)130626937 (DE-600)797294-5 (DE-576)016133269 0021-4922 nnns volume:39 year:2000 number:3 supplement:A pages:1409-1413 extent:5 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_70 GBV_ILN_100 GBV_ILN_170 GBV_ILN_2001 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2185 GBV_ILN_4036 GBV_ILN_4037 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4700 UA 4210. AR 39 2000 3 A 1409-1413 5 |
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Instrumentation, Measurement, and Fabrication Technology - Determination of the Density and the Thickness of SiO2 Films Using Extremely Asymmetric X-Ray Diffraction |
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title_short |
Instrumentation, Measurement, and Fabrication Technology - Determination of the Density and the Thickness of SiO2 Films Using Extremely Asymmetric X-Ray Diffraction |
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author2 |
Liu, Kuang-Yu Kawado, Seiji Kashiwagi, Akihide Hirano, Keiichi |
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Liu, Kuang-Yu Kawado, Seiji Kashiwagi, Akihide Hirano, Keiichi |
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2024-07-04T01:03:11.891Z |
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