Evaluation of Halogenated Polyimide Etching for Optical Waveguide Fabrication by Using Inductively Coupled Plasma Published online 7 November 2000

Gespeichert in:

Autor*in:	Han, K. [verfasserIn] Kim, J. Jang, W.-H.

Format:	Artikel

Erschienen:	2001

Umfang:	7

Übergeordnetes Werk:	Enthalten in: Journal of applied polymer science - Hoboken, NJ [u.a.] : Wiley InterScience, 1959, 79(2001), 1, Seite 176-182
Übergeordnetes Werk:	volume:79 ; year:2001 ; number:1 ; pages:176-182 ; extent:7

Katalog-ID:	OLC1586216856

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spelling	SW001221 (DE-627)OLC1586216856 (DE-599)GBVOLC1586216856 DE-627 ger DE-627 rakwb 540 35.80 bkl 51.70 bkl Han, K. verfasserin aut Evaluation of Halogenated Polyimide Etching for Optical Waveguide Fabrication by Using Inductively Coupled Plasma Published online 7 November 2000 2001 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Kim, J. oth Jang, W.-H. oth Enthalten in Journal of applied polymer science Hoboken, NJ [u.a.] : Wiley InterScience, 1959 79(2001), 1, Seite 176-182 (DE-627)129595799 (DE-600)240694-9 (DE-576)015088812 0021-8995 nnns volume:79 year:2001 number:1 pages:176-182 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_95 GBV_ILN_2004 GBV_ILN_2411 GBV_ILN_4319 GBV_ILN_4323 35.80 AVZ 51.70 AVZ AR 79 2001 1 176-182 7
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allfieldsGer	SW001221 (DE-627)OLC1586216856 (DE-599)GBVOLC1586216856 DE-627 ger DE-627 rakwb 540 35.80 bkl 51.70 bkl Han, K. verfasserin aut Evaluation of Halogenated Polyimide Etching for Optical Waveguide Fabrication by Using Inductively Coupled Plasma Published online 7 November 2000 2001 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Kim, J. oth Jang, W.-H. oth Enthalten in Journal of applied polymer science Hoboken, NJ [u.a.] : Wiley InterScience, 1959 79(2001), 1, Seite 176-182 (DE-627)129595799 (DE-600)240694-9 (DE-576)015088812 0021-8995 nnns volume:79 year:2001 number:1 pages:176-182 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_95 GBV_ILN_2004 GBV_ILN_2411 GBV_ILN_4319 GBV_ILN_4323 35.80 AVZ 51.70 AVZ AR 79 2001 1 176-182 7
allfieldsSound	SW001221 (DE-627)OLC1586216856 (DE-599)GBVOLC1586216856 DE-627 ger DE-627 rakwb 540 35.80 bkl 51.70 bkl Han, K. verfasserin aut Evaluation of Halogenated Polyimide Etching for Optical Waveguide Fabrication by Using Inductively Coupled Plasma Published online 7 November 2000 2001 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Kim, J. oth Jang, W.-H. oth Enthalten in Journal of applied polymer science Hoboken, NJ [u.a.] : Wiley InterScience, 1959 79(2001), 1, Seite 176-182 (DE-627)129595799 (DE-600)240694-9 (DE-576)015088812 0021-8995 nnns volume:79 year:2001 number:1 pages:176-182 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_95 GBV_ILN_2004 GBV_ILN_2411 GBV_ILN_4319 GBV_ILN_4323 35.80 AVZ 51.70 AVZ AR 79 2001 1 176-182 7
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title_sort	evaluation of halogenated polyimide etching for optical waveguide fabrication by using inductively coupled plasma published online 7 november 2000
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