X-ray photoelectron spectroscopy study of the difference between reactively evaporated and direct sputter-deposited TiN films and their oxidation properties

Gespeichert in:

Autor*in:	Prieto, P. [verfasserIn] Kirby, R.E.

Format:	Artikel

Erschienen:	1995

Systematik:	UA 4921

Umfang:	8

Übergeordnetes Werk:	Enthalten in: Journal of vacuum science and technology / A - New York, NY : Inst., 1983, 13(1995), 6, Seite 2819-2826
Übergeordnetes Werk:	volume:13 ; year:1995 ; number:6 ; pages:2819-2826 ; extent:8

Katalog-ID:	OLC1590208579

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title_sort	x-ray photoelectron spectroscopy study of the difference between reactively evaporated and direct sputter-deposited tin films and their oxidation properties
title_auth	X-ray photoelectron spectroscopy study of the difference between reactively evaporated and direct sputter-deposited TiN films and their oxidation properties
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container_issue	6
title_short	X-ray photoelectron spectroscopy study of the difference between reactively evaporated and direct sputter-deposited TiN films and their oxidation properties
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author2	Kirby, R.E.
author2Str	Kirby, R.E.
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up_date	2024-07-03T16:01:52.718Z
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