Plasma processes and film deposition using tetraethoxysilane

Gespeichert in:

Autor*in:	Nöthe, M. [verfasserIn] Bolt, H.

Format:	Artikel

Erschienen:	2000

Umfang:	7

Übergeordnetes Werk:	Enthalten in: Surface & coatings technology - Lausanne : Elsevier Sequoia, 1986, 131(2000), 1-3, Seite 102-108
Übergeordnetes Werk:	volume:131 ; year:2000 ; number:1-3 ; pages:102-108 ; extent:7

Katalog-ID:	OLC1598907786

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