Simulation of near-field photolithography using the finite-difference time-domain method

Gespeichert in:

Autor*in:	Tanaka, Shuji [verfasserIn] Nakao, Masayuki Umeda, Mariko Ito, Kenchi Nakamura, Shigeru Hatamura, Yotaro

Format:	Artikel

Erschienen:	2001

Umfang:	7

Übergeordnetes Werk:	Enthalten in: Journal of applied physics - Melville, NY : AIP, 1937, 89(2001), 7, Seite 3547-3553
Übergeordnetes Werk:	volume:89 ; year:2001 ; number:7 ; pages:3547-3553 ; extent:7

Katalog-ID:	OLC160120065X

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spelling	SW010327 (DE-627)OLC160120065X (DE-599)GBVOLC160120065X DE-627 ger DE-627 rakwb 530 Tanaka, Shuji verfasserin aut Simulation of near-field photolithography using the finite-difference time-domain method 2001 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Nakao, Masayuki oth Umeda, Mariko oth Ito, Kenchi oth Nakamura, Shigeru oth Hatamura, Yotaro oth Enthalten in Journal of applied physics Melville, NY : AIP, 1937 89(2001), 7, Seite 3547-3553 (DE-627)129079030 (DE-600)3112-4 (DE-576)014411652 0021-8979 nnns volume:89 year:2001 number:7 pages:3547-3553 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_59 GBV_ILN_62 GBV_ILN_70 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_2185 GBV_ILN_2279 GBV_ILN_2409 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4310 GBV_ILN_4313 GBV_ILN_4318 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 89 2001 7 3547-3553 7
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Simulation of near-field photolithography using the finite-difference time-domain method

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