Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma

Gespeichert in:

Autor*in:	Goto, Takashi [verfasserIn] Masumoto, Hiroshi Niizuma, Mineo

Format:	Artikel

Erschienen:	2002

Umfang:	6

Übergeordnetes Werk:	Enthalten in: Materials chemistry and physics - Amsterdam [u.a.] : Elsevier, 1983, 75(2002), 1, Seite 235-240
Übergeordnetes Werk:	volume:75 ; year:2002 ; number:1 ; pages:235-240 ; extent:6

Katalog-ID:	OLC162136089X

Internformat


LEADER	01000caa a22002652 4500
001	OLC162136089X
003	DE-627
005	20230706131830.0
007	tu
008	020405s2002 xx \|\|\|\|\| 00\| \|\|und c
028	5	2	\|a SW020402
035			\|a (DE-627)OLC162136089X
035			\|a (DE-599)GBVOLC162136089X
040			\|a DE-627 \|b ger \|c DE-627 \|e rakwb
082	0	4	\|a 540 \|a 530
100	1		\|a Goto, Takashi \|e verfasserin \|4 aut
245	1	0	\|a Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma
264		1	\|c 2002
300			\|a 6
336			\|a Text \|b txt \|2 rdacontent
337			\|a ohne Hilfsmittel zu benutzen \|b n \|2 rdamedia
338			\|a Band \|b nc \|2 rdacarrier
700	1		\|a Masumoto, Hiroshi \|4 oth
700	1		\|a Niizuma, Mineo \|4 oth
773	0	8	\|i Enthalten in \|t Materials chemistry and physics \|d Amsterdam [u.a.] : Elsevier, 1983 \|g 75(2002), 1, Seite 235-240 \|w (DE-627)130443832 \|w (DE-600)710090-5 \|w (DE-576)015977463 \|x 0254-0584 \|7 nnns
773	1	8	\|g volume:75 \|g year:2002 \|g number:1 \|g pages:235-240 \|g extent:6
912			\|a GBV_USEFLAG_A
912			\|a SYSFLAG_A
912			\|a GBV_OLC
912			\|a SSG-OLC-PHY
912			\|a SSG-OLC-CHE
912			\|a SSG-OLC-PHA
912			\|a SSG-OLC-DE-84
912			\|a GBV_ILN_11
912			\|a GBV_ILN_32
912			\|a GBV_ILN_70
912			\|a GBV_ILN_2020
951			\|a AR
952			\|d 75 \|j 2002 \|e 1 \|h 235-240 \|g 6

Indexfelder

author_variant	t g tg
matchkey_str	article:02540584:2002----::otmeauexdtoocdibeetoccor
hierarchy_sort_str	2002
publishDate	2002
allfields	SW020402 (DE-627)OLC162136089X (DE-599)GBVOLC162136089X DE-627 ger DE-627 rakwb 540 530 Goto, Takashi verfasserin aut Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma 2002 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Masumoto, Hiroshi oth Niizuma, Mineo oth Enthalten in Materials chemistry and physics Amsterdam [u.a.] : Elsevier, 1983 75(2002), 1, Seite 235-240 (DE-627)130443832 (DE-600)710090-5 (DE-576)015977463 0254-0584 nnns volume:75 year:2002 number:1 pages:235-240 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_32 GBV_ILN_70 GBV_ILN_2020 AR 75 2002 1 235-240 6
spelling	SW020402 (DE-627)OLC162136089X (DE-599)GBVOLC162136089X DE-627 ger DE-627 rakwb 540 530 Goto, Takashi verfasserin aut Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma 2002 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Masumoto, Hiroshi oth Niizuma, Mineo oth Enthalten in Materials chemistry and physics Amsterdam [u.a.] : Elsevier, 1983 75(2002), 1, Seite 235-240 (DE-627)130443832 (DE-600)710090-5 (DE-576)015977463 0254-0584 nnns volume:75 year:2002 number:1 pages:235-240 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_32 GBV_ILN_70 GBV_ILN_2020 AR 75 2002 1 235-240 6
allfields_unstemmed	SW020402 (DE-627)OLC162136089X (DE-599)GBVOLC162136089X DE-627 ger DE-627 rakwb 540 530 Goto, Takashi verfasserin aut Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma 2002 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Masumoto, Hiroshi oth Niizuma, Mineo oth Enthalten in Materials chemistry and physics Amsterdam [u.a.] : Elsevier, 1983 75(2002), 1, Seite 235-240 (DE-627)130443832 (DE-600)710090-5 (DE-576)015977463 0254-0584 nnns volume:75 year:2002 number:1 pages:235-240 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_32 GBV_ILN_70 GBV_ILN_2020 AR 75 2002 1 235-240 6
allfieldsGer	SW020402 (DE-627)OLC162136089X (DE-599)GBVOLC162136089X DE-627 ger DE-627 rakwb 540 530 Goto, Takashi verfasserin aut Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma 2002 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Masumoto, Hiroshi oth Niizuma, Mineo oth Enthalten in Materials chemistry and physics Amsterdam [u.a.] : Elsevier, 1983 75(2002), 1, Seite 235-240 (DE-627)130443832 (DE-600)710090-5 (DE-576)015977463 0254-0584 nnns volume:75 year:2002 number:1 pages:235-240 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_32 GBV_ILN_70 GBV_ILN_2020 AR 75 2002 1 235-240 6
allfieldsSound	SW020402 (DE-627)OLC162136089X (DE-599)GBVOLC162136089X DE-627 ger DE-627 rakwb 540 530 Goto, Takashi verfasserin aut Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma 2002 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Masumoto, Hiroshi oth Niizuma, Mineo oth Enthalten in Materials chemistry and physics Amsterdam [u.a.] : Elsevier, 1983 75(2002), 1, Seite 235-240 (DE-627)130443832 (DE-600)710090-5 (DE-576)015977463 0254-0584 nnns volume:75 year:2002 number:1 pages:235-240 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_32 GBV_ILN_70 GBV_ILN_2020 AR 75 2002 1 235-240 6
source	Enthalten in Materials chemistry and physics 75(2002), 1, Seite 235-240 volume:75 year:2002 number:1 pages:235-240 extent:6
sourceStr	Enthalten in Materials chemistry and physics 75(2002), 1, Seite 235-240 volume:75 year:2002 number:1 pages:235-240 extent:6
format_phy_str_mv	Article
institution	findex.gbv.de
dewey-raw	540
isfreeaccess_bool	false
container_title	Materials chemistry and physics
authorswithroles_txt_mv	Goto, Takashi @@aut@@ Masumoto, Hiroshi @@oth@@ Niizuma, Mineo @@oth@@
publishDateDaySort_date	2002-01-01T00:00:00Z
hierarchy_top_id	130443832
dewey-sort	3540
id	OLC162136089X
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC162136089X</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230706131830.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">020405s2002 xx \|\|\|\|\| 00\| \|\|und c</controlfield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">SW020402</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC162136089X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVOLC162136089X</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">540</subfield><subfield code="a">530</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Goto, Takashi</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2002</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">6</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Masumoto, Hiroshi</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Niizuma, Mineo</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Materials chemistry and physics</subfield><subfield code="d">Amsterdam [u.a.] : Elsevier, 1983</subfield><subfield code="g">75(2002), 1, Seite 235-240</subfield><subfield code="w">(DE-627)130443832</subfield><subfield code="w">(DE-600)710090-5</subfield><subfield code="w">(DE-576)015977463</subfield><subfield code="x">0254-0584</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:75</subfield><subfield code="g">year:2002</subfield><subfield code="g">number:1</subfield><subfield code="g">pages:235-240</subfield><subfield code="g">extent:6</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-CHE</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-DE-84</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_11</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_32</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2020</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">75</subfield><subfield code="j">2002</subfield><subfield code="e">1</subfield><subfield code="h">235-240</subfield><subfield code="g">6</subfield></datafield></record></collection>
author	Goto, Takashi
spellingShingle	Goto, Takashi ddc 540 Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma
authorStr	Goto, Takashi
ppnlink_with_tag_str_mv	@@773@@(DE-627)130443832
format	Article
dewey-ones	540 - Chemistry & allied sciences 530 - Physics
delete_txt_mv	keep
author_role	aut
collection	OLC
remote_str	false
illustrated	Not Illustrated
issn	0254-0584
topic_title	540 530 Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma
topic	ddc 540
topic_unstemmed	ddc 540
topic_browse	ddc 540
format_facet	Aufsätze Gedruckte Aufsätze
format_main_str_mv	Text Zeitschrift/Artikel
carriertype_str_mv	nc
author2_variant	h m hm m n mn
hierarchy_parent_title	Materials chemistry and physics
hierarchy_parent_id	130443832
dewey-tens	540 - Chemistry 530 - Physics
hierarchy_top_title	Materials chemistry and physics
isfreeaccess_txt	false
familylinks_str_mv	(DE-627)130443832 (DE-600)710090-5 (DE-576)015977463
title	Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma
ctrlnum	(DE-627)OLC162136089X (DE-599)GBVOLC162136089X
title_full	Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma
author_sort	Goto, Takashi
journal	Materials chemistry and physics
journalStr	Materials chemistry and physics
isOA_bool	false
dewey-hundreds	500 - Science
recordtype	marc
publishDateSort	2002
contenttype_str_mv	txt
container_start_page	235
author_browse	Goto, Takashi
container_volume	75
physical	6
class	540 530
format_se	Aufsätze
author-letter	Goto, Takashi
dewey-full	540 530
title_sort	low temperature oxidation of cvd sic by electron cyclotron resonance plasma
title_auth	Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma
collection_details	GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_32 GBV_ILN_70 GBV_ILN_2020
container_issue	1
title_short	Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma
remote_bool	false
author2	Masumoto, Hiroshi Niizuma, Mineo
author2Str	Masumoto, Hiroshi Niizuma, Mineo
ppnlink	130443832
mediatype_str_mv	n
isOA_txt	false
hochschulschrift_bool	false
author2_role	oth oth
up_date	2024-07-03T14:57:47.032Z
_version_	1803570293809086464
fullrecord_marcxml	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC162136089X</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230706131830.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">020405s2002 xx \|\|\|\|\| 00\| \|\|und c</controlfield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">SW020402</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC162136089X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVOLC162136089X</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">540</subfield><subfield code="a">530</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Goto, Takashi</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2002</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">6</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Masumoto, Hiroshi</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Niizuma, Mineo</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Materials chemistry and physics</subfield><subfield code="d">Amsterdam [u.a.] : Elsevier, 1983</subfield><subfield code="g">75(2002), 1, Seite 235-240</subfield><subfield code="w">(DE-627)130443832</subfield><subfield code="w">(DE-600)710090-5</subfield><subfield code="w">(DE-576)015977463</subfield><subfield code="x">0254-0584</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:75</subfield><subfield code="g">year:2002</subfield><subfield code="g">number:1</subfield><subfield code="g">pages:235-240</subfield><subfield code="g">extent:6</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-CHE</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-DE-84</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_11</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_32</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2020</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">75</subfield><subfield code="j">2002</subfield><subfield code="e">1</subfield><subfield code="h">235-240</subfield><subfield code="g">6</subfield></datafield></record></collection>
score	7.400916

Nicht das Richtige dabei?

Schreiben Sie uns!

Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma

Nicht das Richtige dabei?

Zugang & Verfügbarkeit

Vorhandene Bände

Nicht das Richtige dabei?