The effect of deposition process parameters and post-deposition treatments on the poly- and amorphous-silicon morphology

Gespeichert in:

Autor*in:	Edrei, R. [verfasserIn] Shauly, E.N. Roizin, Y. Hoffman, A.

Format:	Artikel

Erschienen:	2002

Umfang:	6

Übergeordnetes Werk:	Enthalten in: Applied surface science - Amsterdam [u.a.] : Elsevier, 1985, 188(2002), 3, Seite 539-544
Übergeordnetes Werk:	volume:188 ; year:2002 ; number:3 ; pages:539-544 ; extent:6

Katalog-ID:	OLC1624710344

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