The effect of deposition process parameters and post-deposition treatments on the poly- and amorphous-silicon morphology
Autor*in: |
Edrei, R. [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
2002 |
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Umfang: |
6 |
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Übergeordnetes Werk: |
Enthalten in: Applied surface science - Amsterdam [u.a.] : Elsevier, 1985, 188(2002), 3, Seite 539-544 |
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Übergeordnetes Werk: |
volume:188 ; year:2002 ; number:3 ; pages:539-544 ; extent:6 |
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