Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2
Autor*in: |
Bastos, K.P. [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
2002 |
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Umfang: |
3 |
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Übergeordnetes Werk: |
Enthalten in: Applied physics letters - Melville, NY : AIP, 1962, 81(2002), 9, Seite 1669-1671 |
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Übergeordnetes Werk: |
volume:81 ; year:2002 ; number:9 ; pages:1669-1671 ; extent:3 |
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SW020826 (DE-627)OLC1628946008 (DE-599)GBVOLC1628946008 DE-627 ger DE-627 rakwb 530 Bastos, K.P. verfasserin aut Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2 2002 3 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Morais, J. oth Miotti, L. oth Pezzi, R.P. oth Soares, G.V. oth Baumvol, I.J.R. oth Hegde, R.I. oth Tseng, H.H. oth Tobin, P.J. oth Enthalten in Applied physics letters Melville, NY : AIP, 1962 81(2002), 9, Seite 1669-1671 (DE-627)12951568X (DE-600)211245-0 (DE-576)014926210 0003-6951 nnns volume:81 year:2002 number:9 pages:1669-1671 extent:3 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_55 GBV_ILN_60 GBV_ILN_62 GBV_ILN_70 GBV_ILN_130 GBV_ILN_150 GBV_ILN_170 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_2192 GBV_ILN_2279 GBV_ILN_2409 GBV_ILN_4036 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4310 GBV_ILN_4313 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 81 2002 9 1669-1671 3 |
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SW020826 (DE-627)OLC1628946008 (DE-599)GBVOLC1628946008 DE-627 ger DE-627 rakwb 530 Bastos, K.P. verfasserin aut Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2 2002 3 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Morais, J. oth Miotti, L. oth Pezzi, R.P. oth Soares, G.V. oth Baumvol, I.J.R. oth Hegde, R.I. oth Tseng, H.H. oth Tobin, P.J. oth Enthalten in Applied physics letters Melville, NY : AIP, 1962 81(2002), 9, Seite 1669-1671 (DE-627)12951568X (DE-600)211245-0 (DE-576)014926210 0003-6951 nnns volume:81 year:2002 number:9 pages:1669-1671 extent:3 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_55 GBV_ILN_60 GBV_ILN_62 GBV_ILN_70 GBV_ILN_130 GBV_ILN_150 GBV_ILN_170 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_2192 GBV_ILN_2279 GBV_ILN_2409 GBV_ILN_4036 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4310 GBV_ILN_4313 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 81 2002 9 1669-1671 3 |
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oxygen reaction-diffusion in metalorganic chemical vapor deposition hfo2 films annealed in o2 |
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Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2 |
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Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2 |
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