Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2

Gespeichert in:

Autor*in:	Bastos, K.P. [verfasserIn] Morais, J. Miotti, L. Pezzi, R.P. Soares, G.V. Baumvol, I.J.R. Hegde, R.I. Tseng, H.H. Tobin, P.J.

Format:	Artikel

Erschienen:	2002

Umfang:	3

Übergeordnetes Werk:	Enthalten in: Applied physics letters - Melville, NY : AIP, 1962, 81(2002), 9, Seite 1669-1671
Übergeordnetes Werk:	volume:81 ; year:2002 ; number:9 ; pages:1669-1671 ; extent:3

Katalog-ID:	OLC1628946008

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title_sort	oxygen reaction-diffusion in metalorganic chemical vapor deposition hfo2 films annealed in o2
title_auth	Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2
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container_issue	9
title_short	Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2
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author2	Morais, J. Miotti, L. Pezzi, R.P. Soares, G.V. Baumvol, I.J.R. Hegde, R.I. Tseng, H.H. Tobin, P.J.
author2Str	Morais, J. Miotti, L. Pezzi, R.P. Soares, G.V. Baumvol, I.J.R. Hegde, R.I. Tseng, H.H. Tobin, P.J.
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up_date	2024-07-03T21:05:39.582Z
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