Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography

Gespeichert in:

Autor*in:	Sun, X. [verfasserIn] Ding, Z.J. Pu, Q.R. Li, H.M. Wu, Z.Q. Gu, W.Q. Peng, K.W. Wu, G.J. Zhang, F.A. Kang, N.K.

Format:	Artikel

Erschienen:	2002

Umfang:	6

Übergeordnetes Werk:	Enthalten in: Journal of applied physics - Melville, NY : AIP, 1937, 92(2002), 7, Seite 3641-3646
Übergeordnetes Werk:	volume:92 ; year:2002 ; number:7 ; pages:3641-3646 ; extent:6

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spelling	SW020923 (DE-627)OLC1630596728 (DE-599)GBVOLC1630596728 DE-627 ger DE-627 rakwb 530 Sun, X. verfasserin aut Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography 2002 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Ding, Z.J. oth Pu, Q.R. oth Li, H.M. oth Wu, Z.Q. oth Gu, W.Q. oth Peng, K.W. oth Wu, G.J. oth Zhang, F.A. oth Kang, N.K. oth Enthalten in Journal of applied physics Melville, NY : AIP, 1937 92(2002), 7, Seite 3641-3646 (DE-627)129079030 (DE-600)3112-4 (DE-576)014411652 0021-8979 nnns volume:92 year:2002 number:7 pages:3641-3646 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_59 GBV_ILN_62 GBV_ILN_70 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_2185 GBV_ILN_2279 GBV_ILN_2409 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4310 GBV_ILN_4313 GBV_ILN_4318 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 92 2002 7 3641-3646 6
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title_short	Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography
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author2	Ding, Z.J. Pu, Q.R. Li, H.M. Wu, Z.Q. Gu, W.Q. Peng, K.W. Wu, G.J. Zhang, F.A. Kang, N.K.
author2Str	Ding, Z.J. Pu, Q.R. Li, H.M. Wu, Z.Q. Gu, W.Q. Peng, K.W. Wu, G.J. Zhang, F.A. Kang, N.K.
ppnlink	129079030
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author2_role	oth oth oth oth oth oth oth oth oth
up_date	2024-07-04T01:13:42.316Z
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Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography

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