Fluorescence microscopy for quality control in nanoimprint lithography

Gespeichert in:

Autor*in:	Finder, Ch [verfasserIn] Beck, M. Seekamp, J. Pfeiffer, K. Carlberg, P. Maximov, I. Reuther, F. Sarwe, E.-L. Zankovich, S.

Format:	Artikel

Erschienen:	2003

Umfang:	6

Übergeordnetes Werk:	Enthalten in: Microelectronic engineering - Amsterdam [u.a.] : Elsevier, 1983, 67(2003), Seite 623-628
Übergeordnetes Werk:	volume:67 ; year:2003 ; pages:623-628 ; extent:6

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