PAPERS FROM THE 49TH INTERNATIONAL SYMPOSIUM OF THE AVS - Thin Films - Thermal behavior of hafnium-based ultrathin films on silicon

Gespeichert in:

Autor*in:	Pezzi, R.P. [verfasserIn] Morais, J. Dahmen, S.R. Bastos, K.P. Miotti, L. Soares, G.V. Baumvol, I.J.R. Freire Jr, F.L.

Format:	Artikel

Erschienen:	2003

Systematik:	UA 4921

Umfang:	7

Übergeordnetes Werk:	Enthalten in: Journal of vacuum science and technology / A - New York, NY : Inst., 1983, 21(2003), 4, Seite 1424-1430
Übergeordnetes Werk:	volume:21 ; year:2003 ; number:4 ; pages:1424-1430 ; extent:7

Katalog-ID:	OLC1647790808

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spelling	sw030806 (DE-627)OLC1647790808 (DE-599)GBVOLC1647790808 DE-627 ger DE-627 rakwb 530 UA 4921 AVZ rvk Pezzi, R.P. verfasserin aut PAPERS FROM THE 49TH INTERNATIONAL SYMPOSIUM OF THE AVS - Thin Films - Thermal behavior of hafnium-based ultrathin films on silicon 2003 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Morais, J. oth Dahmen, S.R. oth Bastos, K.P. oth Miotti, L. oth Soares, G.V. oth Baumvol, I.J.R. oth Freire Jr, F.L. oth Enthalten in Journal of vacuum science and technology / A New York, NY : Inst., 1983 21(2003), 4, Seite 1424-1430 (DE-627)130628336 (DE-600)797704-9 (DE-576)01613432X 0734-2101 nnns volume:21 year:2003 number:4 pages:1424-1430 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_32 GBV_ILN_40 GBV_ILN_59 GBV_ILN_69 GBV_ILN_70 GBV_ILN_105 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4126 GBV_ILN_4266 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4310 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4318 GBV_ILN_4700 UA 4921 AR 21 2003 4 1424-1430 7
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allfieldsSound	sw030806 (DE-627)OLC1647790808 (DE-599)GBVOLC1647790808 DE-627 ger DE-627 rakwb 530 UA 4921 AVZ rvk Pezzi, R.P. verfasserin aut PAPERS FROM THE 49TH INTERNATIONAL SYMPOSIUM OF THE AVS - Thin Films - Thermal behavior of hafnium-based ultrathin films on silicon 2003 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Morais, J. oth Dahmen, S.R. oth Bastos, K.P. oth Miotti, L. oth Soares, G.V. oth Baumvol, I.J.R. oth Freire Jr, F.L. oth Enthalten in Journal of vacuum science and technology / A New York, NY : Inst., 1983 21(2003), 4, Seite 1424-1430 (DE-627)130628336 (DE-600)797704-9 (DE-576)01613432X 0734-2101 nnns volume:21 year:2003 number:4 pages:1424-1430 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_32 GBV_ILN_40 GBV_ILN_59 GBV_ILN_69 GBV_ILN_70 GBV_ILN_105 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4126 GBV_ILN_4266 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4310 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4318 GBV_ILN_4700 UA 4921 AR 21 2003 4 1424-1430 7
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title_sort	papers from the 49th international symposium of the avs - thin films - thermal behavior of hafnium-based ultrathin films on silicon
title_auth	PAPERS FROM THE 49TH INTERNATIONAL SYMPOSIUM OF THE AVS - Thin Films - Thermal behavior of hafnium-based ultrathin films on silicon
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title_short	PAPERS FROM THE 49TH INTERNATIONAL SYMPOSIUM OF THE AVS - Thin Films - Thermal behavior of hafnium-based ultrathin films on silicon
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author2	Morais, J. Dahmen, S.R. Bastos, K.P. Miotti, L. Soares, G.V. Baumvol, I.J.R. Freire Jr, F.L.
author2Str	Morais, J. Dahmen, S.R. Bastos, K.P. Miotti, L. Soares, G.V. Baumvol, I.J.R. Freire Jr, F.L.
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up_date	2024-07-03T15:01:36.639Z
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