Stable TiO2-Pt electrode structure for lead containing ferroelectric thick films on silicon MEMS structures
Autor*in: |
Duval, F.F.C. [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
2003 |
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Umfang: |
6 |
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Übergeordnetes Werk: |
Enthalten in: Thin solid films - Amsterdam [u.a.] Elsevier, 1967, 444(2003), 1, Seite 235-240 |
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Übergeordnetes Werk: |
volume:444 ; year:2003 ; number:1 ; pages:235-240 ; extent:6 |
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sw031022 (DE-627)OLC1651824339 (DE-599)GBVOLC1651824339 DE-627 ger DE-627 rakwb 050 530 530 AVZ Duval, F.F.C. verfasserin aut Stable TiO2-Pt electrode structure for lead containing ferroelectric thick films on silicon MEMS structures 2003 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Dorey, R.A. oth Haigh, R.H. oth Whatmore, R.W. oth Enthalten in Thin solid films Amsterdam [u.a.] Elsevier, 1967 444(2003), 1, Seite 235-240 (DE-627)129522287 (DE-600)212814-7 (DE-576)014938588 0040-6090 nnns volume:444 year:2003 number:1 pages:235-240 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_20 GBV_ILN_21 GBV_ILN_30 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2001 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2020 GBV_ILN_2279 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4700 AR 444 2003 1 235-240 6 |
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sw031022 (DE-627)OLC1651824339 (DE-599)GBVOLC1651824339 DE-627 ger DE-627 rakwb 050 530 530 AVZ Duval, F.F.C. verfasserin aut Stable TiO2-Pt electrode structure for lead containing ferroelectric thick films on silicon MEMS structures 2003 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Dorey, R.A. oth Haigh, R.H. oth Whatmore, R.W. oth Enthalten in Thin solid films Amsterdam [u.a.] Elsevier, 1967 444(2003), 1, Seite 235-240 (DE-627)129522287 (DE-600)212814-7 (DE-576)014938588 0040-6090 nnns volume:444 year:2003 number:1 pages:235-240 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_20 GBV_ILN_21 GBV_ILN_30 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2001 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2020 GBV_ILN_2279 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4700 AR 444 2003 1 235-240 6 |
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sw031022 (DE-627)OLC1651824339 (DE-599)GBVOLC1651824339 DE-627 ger DE-627 rakwb 050 530 530 AVZ Duval, F.F.C. verfasserin aut Stable TiO2-Pt electrode structure for lead containing ferroelectric thick films on silicon MEMS structures 2003 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Dorey, R.A. oth Haigh, R.H. oth Whatmore, R.W. oth Enthalten in Thin solid films Amsterdam [u.a.] Elsevier, 1967 444(2003), 1, Seite 235-240 (DE-627)129522287 (DE-600)212814-7 (DE-576)014938588 0040-6090 nnns volume:444 year:2003 number:1 pages:235-240 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_20 GBV_ILN_21 GBV_ILN_30 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2001 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2020 GBV_ILN_2279 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4700 AR 444 2003 1 235-240 6 |
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