Development of a Deep Silicon Phase Fresnel Lens Using Gray-Scale Lithography and Deep Reactive Ion Etching

Gespeichert in:

Autor*in:	Morgan, B. [verfasserIn] Waits, C.M. Krizmanic, J. Ghodssi, R.

Format:	Artikel

Erschienen:	2004

Umfang:	8

Übergeordnetes Werk:	Enthalten in: Journal of microelectromechanical systems - New York, NY : IEEE, 1992, 13(2004), 1, Seite 113-120
Übergeordnetes Werk:	volume:13 ; year:2004 ; number:1 ; pages:113-120 ; extent:8

Katalog-ID:	OLC1660259800

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