Relevance of phosphorus incorporation and hydrogen removal for Si:P d-doped layers fabricated using phosphine
Autor*in: |
Goh, K.E.J. [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
2005 |
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Umfang: |
7 |
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Übergeordnetes Werk: |
Enthalten in: Physica status solidi. A, Applications and materials science - Berlin : Wiley-VCH, 1970, 202(2005), 6, Seite 1002-1008 |
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Übergeordnetes Werk: |
volume:202 ; year:2005 ; number:6 ; pages:1002-1008 ; extent:7 |
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sw050518 (DE-627)OLC1672590299 (DE-599)GBVOLC1672590299 DE-627 ger DE-627 rakwb 530 33.60 bkl 51.00 bkl Goh, K.E.J. verfasserin aut Relevance of phosphorus incorporation and hydrogen removal for Si:P d-doped layers fabricated using phosphine 2005 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Oberbeck, L. oth Simmons, M.Y. oth Enthalten in Physica status solidi. A, Applications and materials science Berlin : Wiley-VCH, 1970 202(2005), 6, Seite 1002-1008 (DE-627)129503932 (DE-600)208850-2 (DE-576)014907240 1862-6300 nnns volume:202 year:2005 number:6 pages:1002-1008 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_130 GBV_ILN_267 GBV_ILN_2020 GBV_ILN_4277 GBV_ILN_4313 GBV_ILN_4318 33.60 AVZ 51.00 AVZ AR 202 2005 6 1002-1008 7 |
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sw050518 (DE-627)OLC1672590299 (DE-599)GBVOLC1672590299 DE-627 ger DE-627 rakwb 530 33.60 bkl 51.00 bkl Goh, K.E.J. verfasserin aut Relevance of phosphorus incorporation and hydrogen removal for Si:P d-doped layers fabricated using phosphine 2005 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Oberbeck, L. oth Simmons, M.Y. oth Enthalten in Physica status solidi. A, Applications and materials science Berlin : Wiley-VCH, 1970 202(2005), 6, Seite 1002-1008 (DE-627)129503932 (DE-600)208850-2 (DE-576)014907240 1862-6300 nnns volume:202 year:2005 number:6 pages:1002-1008 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_130 GBV_ILN_267 GBV_ILN_2020 GBV_ILN_4277 GBV_ILN_4313 GBV_ILN_4318 33.60 AVZ 51.00 AVZ AR 202 2005 6 1002-1008 7 |
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sw050518 (DE-627)OLC1672590299 (DE-599)GBVOLC1672590299 DE-627 ger DE-627 rakwb 530 33.60 bkl 51.00 bkl Goh, K.E.J. verfasserin aut Relevance of phosphorus incorporation and hydrogen removal for Si:P d-doped layers fabricated using phosphine 2005 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Oberbeck, L. oth Simmons, M.Y. oth Enthalten in Physica status solidi. A, Applications and materials science Berlin : Wiley-VCH, 1970 202(2005), 6, Seite 1002-1008 (DE-627)129503932 (DE-600)208850-2 (DE-576)014907240 1862-6300 nnns volume:202 year:2005 number:6 pages:1002-1008 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_130 GBV_ILN_267 GBV_ILN_2020 GBV_ILN_4277 GBV_ILN_4313 GBV_ILN_4318 33.60 AVZ 51.00 AVZ AR 202 2005 6 1002-1008 7 |
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sw050518 (DE-627)OLC1672590299 (DE-599)GBVOLC1672590299 DE-627 ger DE-627 rakwb 530 33.60 bkl 51.00 bkl Goh, K.E.J. verfasserin aut Relevance of phosphorus incorporation and hydrogen removal for Si:P d-doped layers fabricated using phosphine 2005 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Oberbeck, L. oth Simmons, M.Y. oth Enthalten in Physica status solidi. A, Applications and materials science Berlin : Wiley-VCH, 1970 202(2005), 6, Seite 1002-1008 (DE-627)129503932 (DE-600)208850-2 (DE-576)014907240 1862-6300 nnns volume:202 year:2005 number:6 pages:1002-1008 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_31 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_130 GBV_ILN_267 GBV_ILN_2020 GBV_ILN_4277 GBV_ILN_4313 GBV_ILN_4318 33.60 AVZ 51.00 AVZ AR 202 2005 6 1002-1008 7 |
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