Compositional stability of hafnium aluminates thin films deposited on Si by atomic layer deposition

Gespeichert in:

Autor*in:	Driemeier, C. [verfasserIn] Bastos, K.P. Miotti, L. Baumvol, I.J.R. Nguyen, N.V. Sayan, S. Krug, C.

Format:	Artikel

Erschienen:	2005

Umfang:	1

Übergeordnetes Werk:	Enthalten in: Applied physics letters - Melville, NY : AIP, 1962, 86(2005), 22, Seite 221911
Übergeordnetes Werk:	volume:86 ; year:2005 ; number:22 ; pages:221911 ; extent:1

Katalog-ID:	OLC1673960839

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Compositional stability of hafnium aluminates thin films deposited on Si by atomic layer deposition

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