Papers from the 51st International Symposium of AVS - Thin Films II - Atomic layer deposition of nickel oxide films using Ni(dmamp)2 and water

Gespeichert in:

Autor*in:	Yang, Taek Seung [verfasserIn] Cho, Wontae Kim, Minchan An, Ki-Seok Chung, Taek-Mo Kim, Chang Gyoun Kim, Yunsoo

Format:	Artikel

Erschienen:	2005

Systematik:	UA 4921

Umfang:	6

Übergeordnetes Werk:	Enthalten in: Journal of vacuum science and technology / A - New York, NY : Inst., 1983, 23(2005), 4, Seite 1238-1243
Übergeordnetes Werk:	volume:23 ; year:2005 ; number:4 ; pages:1238-1243 ; extent:6

Katalog-ID:	OLC1678288012

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spelling	sw050829 (DE-627)OLC1678288012 (DE-599)GBVOLC1678288012 DE-627 ger DE-627 rakwb 530 UA 4921 AVZ rvk Yang, Taek Seung verfasserin aut Papers from the 51st International Symposium of AVS - Thin Films II - Atomic layer deposition of nickel oxide films using Ni(dmamp)2 and water 2005 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Cho, Wontae oth Kim, Minchan oth An, Ki-Seok oth Chung, Taek-Mo oth Kim, Chang Gyoun oth Kim, Yunsoo oth Enthalten in Journal of vacuum science and technology / A New York, NY : Inst., 1983 23(2005), 4, Seite 1238-1243 (DE-627)130628336 (DE-600)797704-9 (DE-576)01613432X 0734-2101 nnns volume:23 year:2005 number:4 pages:1238-1243 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_32 GBV_ILN_40 GBV_ILN_59 GBV_ILN_69 GBV_ILN_70 GBV_ILN_105 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4126 GBV_ILN_4305 GBV_ILN_4310 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4700 UA 4921 AR 23 2005 4 1238-1243 6
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