Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography

Gespeichert in:

Autor*in:	Lee, K.Y. [verfasserIn] Huang, W.S.

Format:	Artikel

Erschienen:	1993

Systematik:	UA 4922

Umfang:	5

Übergeordnetes Werk:	Enthalten in: Journal of vacuum science and technology / B - New York, NY : Inst., 1983, 11(1993), 6, Seite 2807-2811
Übergeordnetes Werk:	volume:11 ; year:1993 ; number:6 ; pages:2807-2811 ; extent:5

Katalog-ID:	OLC1700399608

Internformat


LEADER	01000caa a22002652 4500
001	OLC1700399608
003	DE-627
005	20230708085108.0
007	tu
008	050916s1993 xx \|\|\|\|\| 00\| \|\|und c
035			\|a (DE-627)OLC1700399608
035			\|a (DE-599)GBVOLC1700399608
040			\|a DE-627 \|b ger \|c DE-627 \|e rakwb
082	0	4	\|a 530
084			\|a UA 4922 \|q AVZ \|2 rvk
100	1		\|a Lee, K.Y. \|e verfasserin \|4 aut
245	1	0	\|a Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography
264		1	\|c 1993
300			\|a 5
336			\|a Text \|b txt \|2 rdacontent
337			\|a ohne Hilfsmittel zu benutzen \|b n \|2 rdamedia
338			\|a Band \|b nc \|2 rdacarrier
700	1		\|a Huang, W.S. \|4 oth
773	0	8	\|i Enthalten in \|t Journal of vacuum science and technology / B \|d New York, NY : Inst., 1983 \|g 11(1993), 6, Seite 2807-2811 \|w (DE-627)13062845X \|w (DE-600)797726-8 \|w (DE-576)016134419 \|x 2166-2746 \|7 nnns
773	1	8	\|g volume:11 \|g year:1993 \|g number:6 \|g pages:2807-2811 \|g extent:5
912			\|a GBV_USEFLAG_A
912			\|a SYSFLAG_A
912			\|a GBV_OLC
912			\|a SSG-OLC-TEC
912			\|a SSG-OLC-PHY
912			\|a GBV_ILN_11
912			\|a GBV_ILN_20
912			\|a GBV_ILN_22
912			\|a GBV_ILN_24
912			\|a GBV_ILN_30
912			\|a GBV_ILN_32
912			\|a GBV_ILN_40
912			\|a GBV_ILN_70
912			\|a GBV_ILN_105
912			\|a GBV_ILN_130
912			\|a GBV_ILN_170
912			\|a GBV_ILN_2002
912			\|a GBV_ILN_2004
912			\|a GBV_ILN_2006
912			\|a GBV_ILN_2007
912			\|a GBV_ILN_2010
912			\|a GBV_ILN_2014
912			\|a GBV_ILN_2015
912			\|a GBV_ILN_2016
912			\|a GBV_ILN_2020
912			\|a GBV_ILN_2021
912			\|a GBV_ILN_4027
912			\|a GBV_ILN_4036
912			\|a GBV_ILN_4046
912			\|a GBV_ILN_4116
912			\|a GBV_ILN_4126
912			\|a GBV_ILN_4266
912			\|a GBV_ILN_4305
912			\|a GBV_ILN_4306
912			\|a GBV_ILN_4307
912			\|a GBV_ILN_4309
912			\|a GBV_ILN_4313
912			\|a GBV_ILN_4314
912			\|a GBV_ILN_4315
912			\|a GBV_ILN_4316
912			\|a GBV_ILN_4317
912			\|a GBV_ILN_4318
912			\|a GBV_ILN_4319
912			\|a GBV_ILN_4323
912			\|a GBV_ILN_4700
936	r	v	\|a UA 4922
951			\|a AR
952			\|d 11 \|j 1993 \|e 6 \|h 2807-2811 \|g 5

Indexfelder

author_variant	k l kl
matchkey_str	article:21662746:1993----::vlainnapiainfvrhgpromnehmclymlferssf
hierarchy_sort_str	1993
publishDate	1993
allfields	(DE-627)OLC1700399608 (DE-599)GBVOLC1700399608 DE-627 ger DE-627 rakwb 530 UA 4922 AVZ rvk Lee, K.Y. verfasserin aut Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography 1993 5 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Huang, W.S. oth Enthalten in Journal of vacuum science and technology / B New York, NY : Inst., 1983 11(1993), 6, Seite 2807-2811 (DE-627)13062845X (DE-600)797726-8 (DE-576)016134419 2166-2746 nnns volume:11 year:1993 number:6 pages:2807-2811 extent:5 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_105 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2016 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4266 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4309 GBV_ILN_4313 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4317 GBV_ILN_4318 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 UA 4922 AR 11 1993 6 2807-2811 5
spelling	(DE-627)OLC1700399608 (DE-599)GBVOLC1700399608 DE-627 ger DE-627 rakwb 530 UA 4922 AVZ rvk Lee, K.Y. verfasserin aut Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography 1993 5 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Huang, W.S. oth Enthalten in Journal of vacuum science and technology / B New York, NY : Inst., 1983 11(1993), 6, Seite 2807-2811 (DE-627)13062845X (DE-600)797726-8 (DE-576)016134419 2166-2746 nnns volume:11 year:1993 number:6 pages:2807-2811 extent:5 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_105 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2016 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4266 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4309 GBV_ILN_4313 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4317 GBV_ILN_4318 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 UA 4922 AR 11 1993 6 2807-2811 5
allfields_unstemmed	(DE-627)OLC1700399608 (DE-599)GBVOLC1700399608 DE-627 ger DE-627 rakwb 530 UA 4922 AVZ rvk Lee, K.Y. verfasserin aut Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography 1993 5 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Huang, W.S. oth Enthalten in Journal of vacuum science and technology / B New York, NY : Inst., 1983 11(1993), 6, Seite 2807-2811 (DE-627)13062845X (DE-600)797726-8 (DE-576)016134419 2166-2746 nnns volume:11 year:1993 number:6 pages:2807-2811 extent:5 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_105 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2016 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4266 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4309 GBV_ILN_4313 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4317 GBV_ILN_4318 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 UA 4922 AR 11 1993 6 2807-2811 5
allfieldsGer	(DE-627)OLC1700399608 (DE-599)GBVOLC1700399608 DE-627 ger DE-627 rakwb 530 UA 4922 AVZ rvk Lee, K.Y. verfasserin aut Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography 1993 5 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Huang, W.S. oth Enthalten in Journal of vacuum science and technology / B New York, NY : Inst., 1983 11(1993), 6, Seite 2807-2811 (DE-627)13062845X (DE-600)797726-8 (DE-576)016134419 2166-2746 nnns volume:11 year:1993 number:6 pages:2807-2811 extent:5 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_105 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2016 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4266 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4309 GBV_ILN_4313 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4317 GBV_ILN_4318 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 UA 4922 AR 11 1993 6 2807-2811 5
allfieldsSound	(DE-627)OLC1700399608 (DE-599)GBVOLC1700399608 DE-627 ger DE-627 rakwb 530 UA 4922 AVZ rvk Lee, K.Y. verfasserin aut Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography 1993 5 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Huang, W.S. oth Enthalten in Journal of vacuum science and technology / B New York, NY : Inst., 1983 11(1993), 6, Seite 2807-2811 (DE-627)13062845X (DE-600)797726-8 (DE-576)016134419 2166-2746 nnns volume:11 year:1993 number:6 pages:2807-2811 extent:5 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_105 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2016 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4266 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4309 GBV_ILN_4313 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4317 GBV_ILN_4318 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 UA 4922 AR 11 1993 6 2807-2811 5
source	Enthalten in Journal of vacuum science and technology / B 11(1993), 6, Seite 2807-2811 volume:11 year:1993 number:6 pages:2807-2811 extent:5
sourceStr	Enthalten in Journal of vacuum science and technology / B 11(1993), 6, Seite 2807-2811 volume:11 year:1993 number:6 pages:2807-2811 extent:5
format_phy_str_mv	Article
institution	findex.gbv.de
dewey-raw	530
isfreeaccess_bool	false
container_title	Journal of vacuum science and technology / B
authorswithroles_txt_mv	Lee, K.Y. @@aut@@ Huang, W.S. @@oth@@
publishDateDaySort_date	1993-01-01T00:00:00Z
hierarchy_top_id	13062845X
dewey-sort	3530
id	OLC1700399608
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC1700399608</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230708085108.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">050916s1993 xx \|\|\|\|\| 00\| \|\|und c</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC1700399608</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVOLC1700399608</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">530</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UA 4922</subfield><subfield code="q">AVZ</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Lee, K.Y.</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1993</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">5</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Huang, W.S.</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Journal of vacuum science and technology / B</subfield><subfield code="d">New York, NY : Inst., 1983</subfield><subfield code="g">11(1993), 6, Seite 2807-2811</subfield><subfield code="w">(DE-627)13062845X</subfield><subfield code="w">(DE-600)797726-8</subfield><subfield code="w">(DE-576)016134419</subfield><subfield code="x">2166-2746</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:11</subfield><subfield code="g">year:1993</subfield><subfield code="g">number:6</subfield><subfield code="g">pages:2807-2811</subfield><subfield code="g">extent:5</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_11</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_20</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_22</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_24</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_30</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_32</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_40</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_105</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_130</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_170</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2002</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2006</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2007</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2010</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2014</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2015</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2016</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2020</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2021</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4027</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4036</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4046</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4116</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4126</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4266</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4305</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4306</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4307</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4309</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4313</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4314</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4315</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4316</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4317</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4318</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4319</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4323</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4700</subfield></datafield><datafield tag="936" ind1="r" ind2="v"><subfield code="a">UA 4922</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">11</subfield><subfield code="j">1993</subfield><subfield code="e">6</subfield><subfield code="h">2807-2811</subfield><subfield code="g">5</subfield></datafield></record></collection>
author	Lee, K.Y.
spellingShingle	Lee, K.Y. ddc 530 rvk UA 4922 Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography
authorStr	Lee, K.Y.
ppnlink_with_tag_str_mv	@@773@@(DE-627)13062845X
format	Article
dewey-ones	530 - Physics
delete_txt_mv	keep
author_role	aut
collection	OLC
remote_str	false
illustrated	Not Illustrated
issn	2166-2746
topic_title	530 UA 4922 AVZ rvk Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography
topic	ddc 530 rvk UA 4922
topic_unstemmed	ddc 530 rvk UA 4922
topic_browse	ddc 530 rvk UA 4922
format_facet	Aufsätze Gedruckte Aufsätze
format_main_str_mv	Text Zeitschrift/Artikel
carriertype_str_mv	nc
author2_variant	w h wh
hierarchy_parent_title	Journal of vacuum science and technology / B
hierarchy_parent_id	13062845X
dewey-tens	530 - Physics
hierarchy_top_title	Journal of vacuum science and technology / B
isfreeaccess_txt	false
familylinks_str_mv	(DE-627)13062845X (DE-600)797726-8 (DE-576)016134419
title	Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography
ctrlnum	(DE-627)OLC1700399608 (DE-599)GBVOLC1700399608
title_full	Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography
author_sort	Lee, K.Y.
journal	Journal of vacuum science and technology / B
journalStr	Journal of vacuum science and technology / B
isOA_bool	false
dewey-hundreds	500 - Science
recordtype	marc
publishDateSort	1993
contenttype_str_mv	txt
container_start_page	2807
author_browse	Lee, K.Y.
container_volume	11
physical	5
class	530 UA 4922 AVZ rvk
format_se	Aufsätze
author-letter	Lee, K.Y.
dewey-full	530
title_sort	evaluation and application of a very high performance chemically amplified resist for electron-beam lithography
title_auth	Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography
collection_details	GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_105 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2002 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2016 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_4027 GBV_ILN_4036 GBV_ILN_4046 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4266 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4309 GBV_ILN_4313 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4316 GBV_ILN_4317 GBV_ILN_4318 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700
container_issue	6
title_short	Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography
remote_bool	false
author2	Huang, W.S.
author2Str	Huang, W.S.
ppnlink	13062845X
mediatype_str_mv	n
isOA_txt	false
hochschulschrift_bool	false
author2_role	oth
up_date	2024-07-03T14:37:39.331Z
_version_	1803569027433365504
fullrecord_marcxml	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC1700399608</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230708085108.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">050916s1993 xx \|\|\|\|\| 00\| \|\|und c</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC1700399608</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVOLC1700399608</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">530</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UA 4922</subfield><subfield code="q">AVZ</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Lee, K.Y.</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1993</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">5</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Huang, W.S.</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Journal of vacuum science and technology / B</subfield><subfield code="d">New York, NY : Inst., 1983</subfield><subfield code="g">11(1993), 6, Seite 2807-2811</subfield><subfield code="w">(DE-627)13062845X</subfield><subfield code="w">(DE-600)797726-8</subfield><subfield code="w">(DE-576)016134419</subfield><subfield code="x">2166-2746</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:11</subfield><subfield code="g">year:1993</subfield><subfield code="g">number:6</subfield><subfield code="g">pages:2807-2811</subfield><subfield code="g">extent:5</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_11</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_20</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_22</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_24</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_30</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_32</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_40</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_105</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_130</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_170</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2002</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2006</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2007</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2010</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2014</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2015</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2016</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2020</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2021</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4027</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4036</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4046</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4116</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4126</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4266</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4305</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4306</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4307</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4309</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4313</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4314</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4315</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4316</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4317</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4318</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4319</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4323</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4700</subfield></datafield><datafield tag="936" ind1="r" ind2="v"><subfield code="a">UA 4922</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">11</subfield><subfield code="j">1993</subfield><subfield code="e">6</subfield><subfield code="h">2807-2811</subfield><subfield code="g">5</subfield></datafield></record></collection>
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Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography

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