Reactive deposition of diamond and Si carbide films by hydrogen plasma etching of graphite and Si in the r.f. plasma jet

Gespeichert in:

Autor*in:	Bárdos, L. [verfasserIn] Berg, S. Baránková, H. Carlsson, J.-O.

Format:	Artikel

Erschienen:	1993

Umfang:	5

Übergeordnetes Werk:	Enthalten in: Thin solid films - Amsterdam [u.a.] Elsevier, 1967, 223(1993), 2, Seite 218-222
Übergeordnetes Werk:	volume:223 ; year:1993 ; number:2 ; pages:218-222 ; extent:5

Katalog-ID:	OLC1704719380

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Reactive deposition of diamond and Si carbide films by hydrogen plasma etching of graphite and Si in the r.f. plasma jet

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