Reactive deposition of diamond and Si carbide films by hydrogen plasma etching of graphite and Si in the r.f. plasma jet
Autor*in: |
Bárdos, L. [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
1993 |
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Umfang: |
5 |
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Übergeordnetes Werk: |
Enthalten in: Thin solid films - Amsterdam [u.a.] Elsevier, 1967, 223(1993), 2, Seite 218-222 |
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Übergeordnetes Werk: |
volume:223 ; year:1993 ; number:2 ; pages:218-222 ; extent:5 |
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OLC1704719380 |
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