Direct Growth of AlGaAs-GaAs Single Quantum Wells on GaAs Substrates Cleaned by Electron Cyclotron Resonance (ECR) Hydrogen Plasma

Gespeichert in:

Autor*in:	Kondo, Naoto [verfasserIn] Nanishi, Yasushi Fujimoto, Masatomo

Format:	Artikel

Erschienen:	1994

Systematik:	UA 4210.

Übergeordnetes Werk:	Enthalten in: Japanese journal of applied physics. Part 2, Letters & express letters - Tokyo : Ōyō Butsuri Gakkai, 1982, 33(1994), 1, B, Seite L91
Übergeordnetes Werk:	volume:33 ; year:1994 ; number:1 ; supplement:B ; pages:L91

Katalog-ID:	OLC1715952693

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spelling	(DE-627)OLC1715952693 (DE-599)GBVOLC1715952693 DE-627 ger DE-627 rakwb 530 UA 4210. AVZ rvk Kondo, Naoto verfasserin aut Direct Growth of AlGaAs-GaAs Single Quantum Wells on GaAs Substrates Cleaned by Electron Cyclotron Resonance (ECR) Hydrogen Plasma 1994 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Nanishi, Yasushi oth Fujimoto, Masatomo oth Enthalten in Japanese journal of applied physics. Part 2, Letters & express letters Tokyo : Ōyō Butsuri Gakkai, 1982 33(1994), 1, B, Seite L91 (DE-627)130626945 (DE-600)797295-7 (DE-576)016133277 0021-4922 nnns volume:33 year:1994 number:1 supplement:B pages:L91 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_70 GBV_ILN_100 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2001 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2185 GBV_ILN_4036 GBV_ILN_4037 GBV_ILN_4082 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4317 GBV_ILN_4319 GBV_ILN_4700 UA 4210. AR 33 1994 1 B L91
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allfieldsSound	(DE-627)OLC1715952693 (DE-599)GBVOLC1715952693 DE-627 ger DE-627 rakwb 530 UA 4210. AVZ rvk Kondo, Naoto verfasserin aut Direct Growth of AlGaAs-GaAs Single Quantum Wells on GaAs Substrates Cleaned by Electron Cyclotron Resonance (ECR) Hydrogen Plasma 1994 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Nanishi, Yasushi oth Fujimoto, Masatomo oth Enthalten in Japanese journal of applied physics. Part 2, Letters & express letters Tokyo : Ōyō Butsuri Gakkai, 1982 33(1994), 1, B, Seite L91 (DE-627)130626945 (DE-600)797295-7 (DE-576)016133277 0021-4922 nnns volume:33 year:1994 number:1 supplement:B pages:L91 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_70 GBV_ILN_100 GBV_ILN_130 GBV_ILN_170 GBV_ILN_2001 GBV_ILN_2004 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2010 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2185 GBV_ILN_4036 GBV_ILN_4037 GBV_ILN_4082 GBV_ILN_4116 GBV_ILN_4126 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4314 GBV_ILN_4315 GBV_ILN_4317 GBV_ILN_4319 GBV_ILN_4700 UA 4210. AR 33 1994 1 B L91
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title_sort	direct growth of algaas-gaas single quantum wells on gaas substrates cleaned by electron cyclotron resonance (ecr) hydrogen plasma
title_auth	Direct Growth of AlGaAs-GaAs Single Quantum Wells on GaAs Substrates Cleaned by Electron Cyclotron Resonance (ECR) Hydrogen Plasma
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Direct Growth of AlGaAs-GaAs Single Quantum Wells on GaAs Substrates Cleaned by Electron Cyclotron Resonance (ECR) Hydrogen Plasma

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